Plasma generator with at least one non-metallic component

Patent metadata

Field	Value
Publication number	US-9865422-B2
Application number	US-201514961021-A
Country	US
Kind code	B2
Filing date	Dec 7, 2015
Priority date	Mar 15, 2013
Publication date	Jan 9, 2018
Grant date	Jan 9, 2018

Abstract

A plasma generator for an ion implanter is provided. The plasma generator includes an ionization chamber for forming a plasma that is adapted to generate a plurality of ions and a plurality of electrons. An interior surface of the ionization chamber is exposed to the plasma and constructed from a first non-metallic material. The plasma generator also includes a thermionic emitter including at least one surface exposed to the plasma. The thermionic emitter is constructed from a second non-metallic material. The plasma generator further includes an exit aperture for extracting at least one of the plurality of ions or the plurality of electrons from the ionization chamber to form at least one of an ion beam or an electron flux. The ion beam or the electron flux comprises substantially no metal. The first and second non-metallic materials can be the same or different from each other.

First claim

What is claimed is:

1. A plasma generator for an ion implanter, the plasma generator comprising:
at least one electron gun including:
an electron source for generating a beam of electrons; and
a plasma region for generating a secondary plasma by electron impact using at least an anode and a ground element, the secondary plasma being sustained by at least a portion of the beam of electrons; and

an ionization chamber comprising:
two ends disposed along a longitudinal axis, one of the two ends comprising an aperture coupled to an outlet of the electron gun and configured to receive from the electron gun at least a portion of the beam of electrons, wherein the ionization chamber is adapted to generate a primary plasma based on the at least a portion of the beam of electrons received from the electron gun; and
an interior surface of the ionization chamber being exposed to the primary plasma and constructed from a non-metallic material,
wherein the at least one electron gun, including the at least one anode and the ground element, is positioned external to the ionization chamber and configured to introduce the at least a portion of the beam of electrons to the ionization chamber in a direction along the longitudinal axis of the ionization chamber.

2. The plasma generator of claim 1 , wherein the primary plasma is adapted to generate a plurality of ions and a plurality of electrons.

3. The plasma generator of claim 1 , further comprising an exit aperture for extracting at least one of the plurality of ions or the plurality of electrons from the ionization chamber to form at least one of an ion beam or an electron flux, wherein the ion beam or the electron flux comprises no metal.

4. The plasma generator of claim 1 , wherein the electron gun includes a thermionic emitter including at least one surface exposed to the primary plasma or the secondary plasma.

5. The plasma generator of claim 4 , wherein the thermionic emitter is constructed from a second non-metallic material same as or different from the non-metallic material.

6. The plasma generator of claim 4 , wherein the thermionic emitter is constructed from a refractory metal.

7. The plasma generator of claim 1 , wherein the secondary plasma in the electron gun is adapted to generate a second plurality of ions supplied from the outlet of the electron gun to the ionization chamber via the aperture.

8. The plasma generator of claim 1 , wherein the non-metallic material comprises one of silicon carbide (SiC), silicon nitride (Si 3 N 4 ), graphite, diamond, graphene, or vitreous carbon.

9. The plasma generator of claim 1 , wherein a voltage of the anode of the at least one electron gun is adjustable by a control circuit to turn off the secondary plasma in the electron gun.

Assignees

• Nissin Ion Equipment Co Ltd

Inventors

• Horsky Thomas N
• Hahto Sami K

Classifications

• H01J37/00

  Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (H01J33/00, H01J40/00, H01J41/00, H01J47/00, H01J49/00 take precedence) · CPC title

• H01J27/205 Primary

  with electrons, e.g. electron impact ionisation, electron attachment · CPC title

• H01J27/022

  Details · CPC title

• C23C14/48

  Ion implantation · CPC title

• H01J2237/082

  Electron beam · CPC title