Monolithic mems platform for integrated pressure, temperature, and gas sensor
US-2016266061-A1 · Sep 15, 2016 · US
US9862600B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9862600-B2 |
| Application number | US-201514718152-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 21, 2015 |
| Priority date | May 21, 2015 |
| Publication date | Jan 9, 2018 |
| Grant date | Jan 9, 2018 |
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One example discloses an chip, comprising: a substrate; a first side of a passivation layer coupled to the substrate; a device, having a device height and a cavity, wherein a first device surface is coupled to a second side of the passivation layer which is opposite to the first side of the passivation layer; and a set of structures coupled to the second side of the passivation layer and configured to have a structure height greater than or equal to the device height.
Opening claim text (preview).
What is claimed is: 1. A chip, comprising: a substrate; a first side of a passivation layer coupled to the substrate; a device placed on and connected to the substrate, the device having a device height and a cavity, wherein a first device surface is coupled to a second side of the passivation layer which is opposite to the first side of the passivation layer; and a set of structures coupled to the chip, wherein the set of structures is separate from and independent of the device, wherein the set of structures is configured to have a structure height greater than or equal to the device height and configured to reduce at least one of pressure gradients or damage to the device during processing of the chip, wherein the substrate includes an integrated circuit on the first side of the passivation layer, and wherein the integrated circuit is an analog circuit and the structures are decoupling capacitors. 2. The chip of claim 1 , wherein the set of structures is coupled to the substrate. 3. The chip of claim 1 , wherein the set of structures is coupled to the second side of the passivation layer. 4. The chip of claim 1 , wherein the structures are of a same type and are on at least four sides of the device. 5. The chip of claim 1 , wherein the structures completely surround the device. 6. The chip of claim 1 , wherein the set of structures is configured to have a structure height greater than or equal to the device height. 7. The chip of claim 1 , wherein the set of structures include a surface configured to receive an adhesive tape. 8. The chip of claim 1 , wherein the device is at least one of: a membrane, a transducer, a MEMS device, or a pressure sensor. 9. The chip of claim 1 , further comprising a seal layer on top of the device. 10. The chip of claim 1 , wherein the integrated circuit does not include the structures. 11. The chip of claim 4 , wherein the structure types include at least one of: a rigid structure, a closed device, a spacer structure, a support structure, a reference capacitor, a decoupling capacitor, a polyimide, or a structure that does not contain a cavity. 12. The chip of claim 7 , further comprising the adhesive tape, wherein the tape is coupled only to the structures. 13. A method fabricating a chip, wherein the chip comprises: a substrate; a first side of a passivation layer coupled to the substrate; a device placed on and connected to the substrate, the device having a device height and a cavity, wherein a first device surface is coupled to a second side of the passivation layer which is opposite to the first side of the passivation layer; and a set of structures coupled to the second side of the passivation layer, wherein the set of structures is separate from and independent of the device, and wherein the set of structures is configured to have a structure height greater than or equal to the device height, the method comprising: applying tape to a first side of the chip; and grinding a second side of the chip opposite to the first side, wherein the structures are configured to spread a pressure exerted during the grinding process, so as to reduce at least one of pressure gradients or damage to the device during the grinding process, wherein the substrate includes an integrated circuit on the first side of the passivation layer, and wherein the integrated circuit is an analog circuit and the structures are decoupling capacitors. 14. The method of claim 13 , further comprising removing the tape from the chip, wherein the structures are configured to prevent removal of the tape from damaging the device. 15. A chip, comprising: a substrate; a first side of a passivation layer coupled to the substrate; a pressure sensor placed on and connected to the substrate, the pressure sensor having a pressure sensor height and a cavity, wherein a first pressure sensor surface is coupled to a second side of the passivation layer which is opposite to the first side of the passivation layer; and a set of structures coupled to the chip, wherein the set of structures is separate from and independent of the pressure sensor, wherein the set of structures is configured to have a structure height greater than or equal to the pressure sensor height and configured to reduce at least one of pressure gradients or damage to the pressure sensor during processing of the chip, wherein the substrate includes an integrated circuit on the first side of the passivation layer, and wherein the integrated circuit is an analog circuit and the structures are decoupling capacitors.
used to protect an active side of a device or wafer · CPC title
used during dicing or grinding · CPC title
Wafer tapes, e.g. grinding or dicing support tapes · CPC title
Capacitive arrangements (H10W44/20 takes precedence) · CPC title
Diaphragms, i.e. structures separating two media that can control the passage from one medium to another; Membranes, i.e. diaphragms with filtering function · CPC title
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