Thin film piezoelectric element and manufacturing method thereof, micro-actuator, head gimbal assembly and disk drive unit with the same
US-9450171-B2 · Sep 20, 2016 · US
US9853203B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9853203-B2 |
| Application number | US-201314419378-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 25, 2013 |
| Priority date | Aug 8, 2012 |
| Publication date | Dec 26, 2017 |
| Grant date | Dec 26, 2017 |
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A piezoelectric element includes, on a base, an underlying layer for controlling crystallinity of a piezoelectric layer, and the piezoelectric layer. The piezoelectric layer includes a crystal with an ABO 3 -type structure having at least Pb at A sites. In the underlying layer, an interface-with-the-base side is configured including at least Pb and another substance with a different composition rate from that of the piezoelectric layer at the A sites, and a substance with a different composition ratio from that of the piezoelectric layer at B sites. In a layer above the interface-with-the-base side in the underlying layer, the composition rate of the other substance included at the A sites of the underlying layer progressively changes and also the composition ratio of the substance included at the B sites progressively changes, from the interface-with-the-base side toward the interface-with-the-piezoelectric-layer side to approach the composition of the piezoelectric layer.
Opening claim text (preview).
The invention claimed is: 1. A piezoelectric element comprising: on a base, an underlying layer for controlling crystallinity of a piezoelectric layer, wherein the piezoelectric layer comprises a crystal with an ABO 3 -type structure comprising at least Pb at A sites of the piezoelectric layer; and the underlying layer comprising: a first layer lying above an interface-with-the-base side of the first layer is configured to have an ABO 3 -type structure and comprises at least Pb and a first substance with a different composition rate from that of the piezoelectric layer at A sites, and a second substance with a different composition rate from that of the piezoelectric layer at B sites, and accordingly has a predetermined crystal structure with a higher degree of crystallinity than the piezoelectric layer; and a second layer sandwiched between the first layer and the piezoelectric layer, wherein the second layer is configured to have an ABO 3 -type structure and approaches a composition of the piezoelectric layer by progressively changing a composition rate of the first substance at A sites of the second layer and also the composition rate of the second substance included at B sites of the second layer, in a direction from the interface-with-the-base side toward an interface-with-the-piezoelectric-layer side. 2. The piezoelectric element according to claim 1 , wherein the piezoelectric layer comprises PZT, and in the underlying layer, the first layer is PLT including Pb and La at A sites of the first layer, and in the second layer, the composition rate of La at the A sites of the second layer progressively decreases and also the composition rate of Zr at the B sites of the second layer progressively increases along the direction to approach the composition of the piezoelectric layer. 3. The piezoelectric element according to claim 1 , wherein the piezoelectric layer is any of PNN-PT, PZN-PT, and PMN-PT, and in the second layer, the total composition rate of Ni and Nb in a case of PNN-PT, the total composition rate of Zn and Nb in a case of PZN-PT, and the total composition rate of Mg and Nb in a case of PMN-PT progressively increase along the direction to approach the composition rate of the piezoelectric layer. 4. The piezoelectric element according to claim 3 , wherein in the underlying layer, the first layer is PLT including La at A sites of the first layer, and in the second layer, the composition rate of La at the A sites of the second layer progressively decreases along the direction. 5. The piezoelectric element according to claim 1 , wherein in the underlying layer, the interface-with-the-piezoelectric-layer side has the same composition as the piezoelectric layer. 6. The piezoelectric element according to claim 1 , wherein a Ti/Zr ratio of the piezoelectric layer is a ratio forming a morphotropic phase boundary. 7. The piezoelectric element according to claim 1 , wherein the base comprises a substrate and a lower electrode located on a substrate side of the piezoelectric layer, and the piezoelectric element further comprises an upper electrode located on a side of the piezoelectric layer, the side being opposite to the lower electrode. 8. The piezoelectric element according to claim 7 , wherein the substrate of the base includes an opening portion formed therein, and the piezoelectric layer is located at least above the opening portion. 9. An inkjet head comprising a nozzle opening causing the opening portion to communicate with the outside, wherein it is configured such that ink in the opening portion is discharged from the nozzle opening by use of the piezoelectric element according to claim 8 . 10. An inkjet printer comprising the inkjet head according to claim 9 . 11. The piezoelectric element according to claim 2 , wherein in the second layer, the interface-with-the-piezoelectric-layer side has the same composition as the piezoelectric layer. 12. The piezoelectric element according to claim 2 , wherein a Ti/Zr ratio of the piezoelectric layer is a ratio forming a morphotropic phase boundary. 13. The piezoelectric element according to claim 2 , wherein the base comprises a substrate and a lower electrode located on a substrate side of the piezoelectric layer, and the piezoelectric element further comprises an upper electrode located on a side of the piezoelectric layer, the side being opposite to the lower electrode. 14. The piezoelectric element according to claim 3 , wherein in the second layer, the interface-with-the-piezoelectric-layer side has the same composition as the piezoelectric layer. 15. The piezoelectric element according to claim 3 , wherein the base comprises a substrate and a lower electrode located on a substrate side of the piezoelectric layer, and the piezoelectric element further comprises an upper electrode located on a side of the piezoelectric layer, the side being opposite to the lower electrode. 16. The piezoelectric element according to claim 4 , wherein in the second layer, the interface-with-the-piezoelectric-layer side has the same composition as the piezoelectric layer. 17. The piezoelectric element according to claim 4 , wherein the base comprises a substrate and a lower electrode located on a substrate side of the piezoelectric layer, and the piezoelectric element further comprises an upper electrode located on a side of the piezoelectric layer, the side being opposite to the lower electrode. 18. The piezoelectric element according to claim 5 , wherein the base comprises a substrate and a lower electrode located on a substrate side of the piezoelectric layer, and the piezoelectric element further comprises an upper electrode located on a side of the piezoelectric layer, the side being opposite to the lower electrode. 19. The piezoelectric element according to claim 6 , wherein the base comprises a substrate and a lower electrode located on a substrate side of the piezoelectric layer, and the piezoelectric element further comprises an upper electrode located on a side of the piezoelectric layer, the side being opposite to the lower electrode. 20. The piezoelectric element according to claim 2 , wherein the composition rate of La in the PLT of the first layer is 5 to 15%. 21. The piezoelectric element according to claim 4 , wherein the composition rate of La in the PLT of the first layer is 5 to 15%.
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