Underfill dispensing using funnels

US9852960B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9852960-B2
Application numberUS-201615072957-A
CountryUS
Kind codeB2
Filing dateMar 17, 2016
Priority dateMar 17, 2016
Publication dateDec 26, 2017
Grant dateDec 26, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Arrays of objects on a substrate having void-free underfill as well as methods and systems of forming the same include forming a void-free layer of underfill material between a substrate and an array of multiple objects positioned on the substrate. The void-free layer of underfill material is cured to form a protective cured underfill layer that provides structural support to connections between the objects and the substrate.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for underfilling an array of objects on a substrate, comprising: forming a void-free layer of underfill material between a substrate and an array of multiple objects positioned on the substrate by dispensing underfill material at multiple points on the substrate at substantially the same time; and curing the void-free layer of underfill material to form a protective cured underfill layer that provides structural support to connections between the objects and the substrate. 2. The method of claim 1 , wherein dispensing the underfill material at multiple points comprises filling a funnel reservoir with underfill material at each of the respective multiple points. 3. The method of claim 2 , wherein each funnel comprises a broad head configured to rest on neighboring objects and having a length configured to dispense underfill material to the layer of underfill material. 4. The method of claim 2 , wherein dispensing the underfill material at multiple points comprises filling each funnel reservoir in sequence, such that underfill material continues to dispense from previously filled funnels while subsequent funnel reservoirs are being filled. 5. The method of claim 2 , wherein filling each funnel reservoir comprises dispensing a predetermined volume of underfill material in to the respective funnel reservoir, said predetermined volume being sufficient to underfill neighboring objects without overflowing onto other layers. 6. The method of claim 1 , wherein the substrate is a wafer and the objects are laminates. 7. The method of claim 1 , wherein the substrate is a laminate and the objects are chips. 8. A system for underfilling an array of objects on a substrate, comprising: a plurality of funnels disposed at multiple points of a substrate, each comprising a funnel reservoir; and a dispenser configured to maneuver an underfill dispensing nozzle to each of the funnels in sequence and to dispense underfill material into each respective funnel reservoir. 9. The system of claim 8 , wherein each funnel comprises a broad head configured to rest on neighboring objects and having a length configured to dispense underfill material to the layer of underfill material. 10. The system of claim 8 , wherein the dispenser is configured to maneuver to a next funnel while a previous funnel continues to dispense underfill material. 11. The system of claim 8 , wherein the dispenser is configured to maneuver the underfill dispensing nozzle according to a predetermined pattern. 12. The system of claim 8 , wherein the dispenser is configured to dispense a predetermined volume of underfill material into each respective funnel reservoir, said predetermined volume being sufficient to underfill neighboring chips without overflowing onto other layers. 13. The system of claim 8 , wherein each funnel is placed at an intersection where corners of four objects leave an opening. 14. The system of claim 8 , wherein the underfill material has a glass transition temperature of about 80° C., a coefficient of thermal expansion of about 35 ppm/° C., and a modulus of elasticity of about 7.2 GPa when cured. 15. The system of claim 8 , further comprising a heater configured to cure the underfill material at about 135° C. for about six hours. 16. A multi-laminate wafer, comprising: an array of a plurality of laminates individually bonded to a first layer of a wafer; one or more second circuit layers bonded to the plurality of laminates; and a void-free layer of cured underfill material that completely fills a space between each of the plurality of laminates and the first layer. 17. The multi-chip wafer of claim 16 , wherein the void-free layer of cured underfill material does not extend between the plurality of laminates and the one or more upper circuit layers. 18. The multi-chip wafer of claim 16 , wherein the cured underfill material has a glass transition temperature of about 80° C., a coefficient of thermal expansion of about 35 ppm/° C., and a modulus of elasticity of about 7.2 GPa.

Assignees

Inventors

Classifications

  • between a chip and a stacked insulating package substrate, interposer or RDL · CPC title

  • of bump connectors · CPC title

  • on active surfaces of flip-chip devices, e.g. underfills · CPC title

  • H10W74/012Primary

    of encapsulations on active surfaces of flip-chip devices, e.g. forming underfills · CPC title

  • Electricity · mapped topic

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What does patent US9852960B2 cover?
Arrays of objects on a substrate having void-free underfill as well as methods and systems of forming the same include forming a void-free layer of underfill material between a substrate and an array of multiple objects positioned on the substrate. The void-free layer of underfill material is cured to form a protective cured underfill layer that provides structural support to connections betwee…
Who is the assignee on this patent?
IBM
What technology area does this patent fall under?
Primary CPC classification H10W74/012. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Dec 26 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).