Method and apparatus for controlling topographical variation on a milled cross-section of a structure

US9852750B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9852750-B2
Application numberUS-201213449835-A
CountryUS
Kind codeB2
Filing dateApr 18, 2012
Priority dateNov 18, 2003
Publication dateDec 26, 2017
Grant dateDec 26, 2017

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

An improved method of controlling topographical variations when milling a cross-section of a structure, which can be used to reduce topographical variation on a cross-section of a write-head in order to improve the accuracy of metrology applications. Topographical variation is reduced by using a protective layer that comprises a material having mill rates at higher incidence angles that closely approximate the mill rates of the structure at those higher incidence angles. Topographical variation can be intentionally introduced by using a protective layer that comprises a material having mill rates at higher incidence angles that do not closely approximate the mill rates of the structure at those higher incidence angles.

First claim

Opening claim text (preview).

We claim as follows: 1. A method of exposing a non-planar cross-section of a write-head pole structure composed of a first material, the method comprising: depositing a protective overcoat layer of a second material on said write-head pole structure, said protective overcoat layer coating the exterior of the write-head pole structure, said second material having ion beam mill rates at higher incidence angles that do not closely approximate the ion beam mill rates of the first material at the same incidence angles, the difference in the ion beam mill rates of the first material and the second material being due to different material properties of the first material and second material; directing an ion beam at the write-head pole structure; exposing, by means of milling the write-head pole structure using the ion beam, a cross-section of the write-head pole structure; and producing, by means of milling the write-head pole structure using the ion beam, a non-planar face on said exposed cross-section; in which the second material is elemental tungsten. 2. The method of claim 1 , in which the first material is an alloy of nickel and iron. 3. The method of claim 2 , in which the first material is permalloy. 4. The method of claim 1 , further comprising measuring one or more dimensions of a feature on the exposed non-planar face of the cross-section. 5. The method of claim 1 in which said second material has mill rates at incidence angles greater than 75 degrees that do not closely approximate the mill rates of the first material at incidence angles greater than 75 degrees. 6. The method of claim 5 in which said second material has mill rates at incidence angles greater than 75 degrees that are substantially lower than the mill rates of the first material at incidence angles greater than 75 degrees. 7. The method of claim 1 in which said second material has mill rates at incidence angles greater than 45 degrees that do not closely approximate the mill rates of the first material at incidence angles greater than 45 degrees. 8. The method of claim 7 in which said second material has mill rates at incidence angles greater than 45 degrees that are substantially lower than the mill rates of the first material at incidence angles greater than 45 degrees. 9. The method of claim 1 in which exposing a non-planar cross-section of the write-head pole structure comprises exposing a recessed cross-section face.

Assignees

Inventors

Classifications

  • G11B5/3163Primary

    Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers · CPC title

  • Machining · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US9852750B2 cover?
An improved method of controlling topographical variations when milling a cross-section of a structure, which can be used to reduce topographical variation on a cross-section of a write-head in order to improve the accuracy of metrology applications. Topographical variation is reduced by using a protective layer that comprises a material having mill rates at higher incidence angles that closely…
Who is the assignee on this patent?
Nadeau James P, Zou Pei, Arjavac Jason H, and 1 more
What technology area does this patent fall under?
Primary CPC classification G11B5/3163. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Dec 26 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).