Resist composition, method of forming resist pattern, compound, and acid diffusion control agent

Patent metadata

Field	Value
Publication number	US-9851637-B2
Application number	US-201615284721-A
Country	US
Kind code	B2
Filing date	Oct 4, 2016
Priority date	Oct 6, 2015
Publication date	Dec 26, 2017
Grant date	Dec 26, 2017

Abstract

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, and a compound (D1) represented by general formula (d1), wherein Z − represents an anion having an aromatic ring containing a hydroxybenzoic acid skeleton, provided that at least one hydrogen atom of the aromatic ring has been substituted with a halogen atom; m represents an integer of 1 or more; and M m+ represents an organic cation having a valency of m.

Z − (M m+ ) 1/m   (d1)

First claim

What is claimed is:

1. A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, and a compound (D1) represented by general formula (d1) shown below:
Z − (M m+ ) 1/m   (d1)

wherein Z − represents an anion having an aromatic ring containing a hydroxybenzoic acid skeleton, provided that at least one hydrogen atom of the aromatic ring has been substituted with a halogen atom; m represents an integer of 1 or more; and M m+ represents an organic cation having a valency of m.

2. The resist composition according to claim 1 , wherein the acid dissociation constant pKa of the conjugate acid of the compound (D1) is less than 3.

3. The resist composition according to claim 1 , wherein the octanol/water partition coefficient (log P ow ) of the compound (D1) is 1.5 or more.

4. The resist composition according to claim 1 , wherein Z − is an anion represented by formula (d1-a) shown below:

wherein Rh represents a halogen atom; and d0 represents an integer of 1 to 4.

5. The resist composition according to claim 4 , wherein Rh represents a fluorine atom.

6. The resist composition according to claim 1 , wherein the compound (D1) is represented by general formula (d1-10) shown below:

wherein R 201 to R 203 each independently represents an aryl group, an alkyl group or an alkenyl group, provided that two of R 201 to R 203 may be mutually bonded to form a ring with the sulfur atom; Rh represents a halogen atom; and d0 represents an integer of 1 to 4.

7. The resist composition according to claim 6 , wherein Rh represents a fluorine atom.

8. The resist composition according to claim 1 , further comprising an acid generator component (B) which generates acid upon exposure, provided that the acid generator component (B) excludes the compound (D1).

9. The resist composition according to claim 1 , wherein the base component (A) comprises a polymeric compound (A1), and
the polymeric compound (A1) comprises a structural unit (a1) containing an acid decomposable group that exhibits increased polarity by the action of acid.

10. A method of forming a resist pattern, comprising:
using a resist composition of claim 1 to form a resist film,
exposing the resist film, and
developing the exposed resist film to form a resist pattern.

Assignees

• Tokyo Ohka Kogyo Co Ltd

Inventors

• Nagamine Takashi
• Endo Kotaro
• Nito Hideto

Classifications

• G03F7/0045 Primary

  with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors · CPC title

• C07C63/08

  Salts thereof · CPC title

• G03F7/0382

  the macromolecular compound being present in a chemically amplified negative photoresist composition · CPC title

• C07C321/28

  Sulfides, hydropolysulfides, or polysulfides having thio groups bound to carbon atoms of six-membered aromatic rings · CPC title

• C07C65/05

  o-Hydroxy carboxylic acids · CPC title