Flow measuring device, as well as use of such device and method for ascertaining flow velocity
US-2015377691-A1 · Dec 31, 2015 · US
US9851233B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9851233-B2 |
| Application number | US-201314652487-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 15, 2013 |
| Priority date | Dec 17, 2012 |
| Publication date | Dec 26, 2017 |
| Grant date | Dec 26, 2017 |
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Official abstract text for this publication.
A thermal type sensor molded from a mold resin having an opening has a problem in that the residual stress of the mold resin in the opening causes peeling at the interface having poor adhesion. A physical quantity sensor has a construction having a semiconductor chip having a detector unit 3 , a frame 8 a on which the semiconductor chip is mounted, a mold resin portion 10 which encapsulates the semiconductor chip and the frame and has an opening through which the detector unit is exposed to the outside, and a stress absorbing layer 6 which is formed between an end of the opening in the mold resin portion and a wiring layer formed in the detector unit, and which is formed from a metal material that absorbs a stress from the end.
Opening claim text (preview).
The invention claimed is: 1. A physical quantity sensor, characterized by having: a semiconductor chip having a detector unit, a frame on which the semiconductor chip is mounted, a mold resin portion which encapsulates the semiconductor chip and the frame and has an opening through which the detector unit is exposed to outside of the physical quantity sensor, and a stress absorbing layer being formed between ends of the opening in the mold resin portion and above a wiring layer formed in the detector unit, and the stress absorbing layer contains a metal material which absorbs a stress from the ends of the opening, wherein a first portion of the stress absorbing layer protrudes beyond a first edge of the opening to be exposed from the mold resin portion and inside of an edge of the semiconductor chip, and a second portion of the stress absorbing layer protrudes beyond a second edge of the opening to be exposed from the mold resin portion and above only a central portion of the wiring layer, and wherein the detector unit has a diaphragm, and a width of an upper end of the diaphragm is smaller than a distance between the first and second portions of the stress absorbing layer. 2. The physical quantity sensor according to claim 1 , characterized in that the metal material is a material having a Young's modulus smaller than that of the wiring layer. 3. The physical quantity sensor according to claim 2 , characterized in that the metal material is any one of elements included in a metal group consisting of aluminum, copper, gold, nickel, platinum, and silver, an alloy containing any one of elements included in the metal group, or a compound of any one of elements included in the metal group and silicon. 4. The physical quantity sensor according to claim 1 , characterized in that the stress absorbing layer has a stacked structure having a metal film formed from the metal material, and at least one of a titanium nitride film, a titanium tungsten film, and a titanium film. 5. The physical quantity sensor according to claim 1 , characterized in that, in the plane parallel to a substrate surface of the semiconductor chip, the stress absorbing layer is formed outside the outer periphery of the diaphragm. 6. The physical quantity sensor according to claim 1 , characterized in that the stress absorbing layer is grounded. 7. The physical quantity sensor according to claim 1 , characterized by further having a cover layer which is formed between the mold resin portion and the stress absorbing layer, and formed from an insulating film. 8. The physical quantity sensor according to claim 7 , characterized in that the cover layer is a silicon oxide film, a silicon nitride film, an aluminum nitride film, a silicon carbide film, or a stacked film thereof. 9. The physical quantity sensor according to claim 7 , characterized in that the cover layer is formed at a position excluding the upper end of the diaphragm. 10. The physical quantity sensor according to claim 7 , characterized by further having a protective film which covers a region of the stress absorbing layer that is not covered with the cover layer, and is formed from an insulating film. 11. The physical quantity sensor according to claim 10 , characterized in that, in the plane parallel to a substrate surface of the semiconductor chip, the protective film is positioned inside the opening. 12. The physical quantity sensor according to claim 1 , characterized in that the physical quantity sensor is a thermal type fluid flow sensor, the detector unit contains a heating resistance element and a temperature-sensing resistance element, and the wiring layer is a layer constituting the heating resistance element or the temperature-sensing resistance element.
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characterised by their shape or disposition · CPC title
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protecting against mechanical damage (H10W76/00, H10W74/00 take precedence) · CPC title
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