High current cyclotron

Patent metadata

Field	Value
Publication number	US-9848487-B2
Application number	US-201514946530-A
Country	US
Kind code	B2
Filing date	Nov 19, 2015
Priority date	Nov 19, 2014
Publication date	Dec 19, 2017
Grant date	Dec 19, 2017

Abstract

Cyclotron for accelerating charged particles around an axis, comprising an electromagnet with an upper pole and a lower pole, producing a magnetic field in the direction of said axis; a Dee electrode assembly and a counter Dee electrode assembly separated from each other by a gap for accelerating said charged particles and a pair of ion sources located in a central region of the cyclotron. Said ion sources are located at a distance of said axis such that the particles emitted from the first ion source pass between said first and second ion sources after a path of half a turn, and radially outwards of the second ion source after a path of three half-turns, and reciprocally.

First claim

What is claimed is:

1. A cyclotron for accelerating charged particles around an axis, comprising:
an electromagnet, including an upper pole and a lower pole, that is configured to produce a first magnetic field in the direction of said axis;
a Dee electrode assembly and a counter Dee electrode assembly separated from each other by a gap and configured to accelerating said charged particles responsive to a predefined accelerating voltage; and
a first ion source and a second ion source that form a pair of ion sources located in a central region of said cyclotron at a distance of said axis resulting in said charged particles emitted from said first ion source passing between said first and second ion sources after a path of half a turn, and radially outwards of the second ion source after a path of three half-turns, and the particles emitted from the second ion source pass between said second and said first ion source after a path of half a turn, and radially outwards of the first ion source after a path of three half turns,
wherein said electromagnet, said Dee electrode assembly, and said pair of ion sources are configured to produce charged particles along paths in said cyclotron.

2. A cyclotron according to claim 1 , wherein said upper pole and lower pole, said Dee electrode assembly, said counter Dee electrode assembly, and said pair of ion sources have a two-fold axis of symmetry.

3. A cyclotron according to claim 1 , wherein
the upper pole and lower pole each include a short hill sector and an extended hill sector, the extended hill sectors having a larger radial extent than the short hill sectors and having a groove or plateau at an extended region, the groove or plateau following the shape of the path of charged particles resulting in the magnetic field decreasing at a shorter radial distance in the extended hill sectors than in the short hill sectors.

4. A cyclotron according to claim 3 , wherein
a gap exists between the hill sectors of the upper pole and the lower pole, and
in the hill sectors, said upper and lower poles are shaped to make said gap constant along a path of said charged particles.

5. A cyclotron according to claim 3 , further comprising:
a beam separator that is located radially inwards of a path of said charged particles having passed along said groove or plateau.

6. A cyclotron according to claim 3 , wherein at least one of said short hill sectors or said long hill sectors have an azimuthal extent between 40° and 50°.

7. A cyclotron according to claim 6 , wherein at least one of said short hill sectors or said long hill sectors have an azimuthal extent equal to 45°.

8. A cyclotron according to claim 3 , wherein said ion sources are located at a radius and an azimuthal angle and oriented to cause the beam emitted therefrom to enter one of said long hill sectors at a radial distance of said groove or plateau.

9. A cyclotron according to claim 1 , wherein the cyclotron is configured to:
produce two particle beams from said pair of ion sources simultaneously, and
direct said two beams to two targets.

10. A cyclotron according to claim 1 , wherein the cyclotron is configured to:
produce one particle beam from one of said pair of ion sources, and
responsive to one of said pair of ion sources defaulting, produce one particle beam from the other of said pair of ion sources.

Assignees

• Ion Beam Appl Sa

Inventors

• Kleeven Willem
• Forton Eric

Classifications

• H05H7/08

  Arrangements for injecting particles into orbits · CPC title

• H05H7/10

  Arrangements for ejecting particles from orbits · CPC title

• H05H2007/082

  Ion sources, e.g. ECR, duoplasmatron, PIG, laser sources · CPC title

• H05H13/005 Primary

  Cyclotrons · CPC title

• G06F30/00

  Computer-aided design [CAD] · CPC title