Methods and apparatus for pulsed-DC dielectric barrier discharge plasma actuator and circuit

US9848485B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9848485-B2
Application numberUS-201615374707-A
CountryUS
Kind codeB2
Filing dateDec 9, 2016
Priority dateDec 16, 2015
Publication dateDec 19, 2017
Grant dateDec 19, 2017

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A plasma generating device intended to induce a flow in a fluid via plasma generation includes a dielectric separating two electrodes and a power supply. The first electrode is exposed to a fluid flow while the second electrode is positioned under the dielectric. The power supply is electrically coupled to a switch and the first and second electrodes. When the power supply is energized by repeated action of the switch, it causes a pulsed DC current between the electrodes which causes the fluid to ionize generating a plasma. The generation of the plasma induces a force with a velocity component in the fluid.

First claim

Opening claim text (preview).

We claim: 1. A plasma generating device comprising: a dielectric; a first electrode exposed to a fluid flow; a second electrode separated from the fluid flow by the dielectric; a direct current power supply providing a first voltage to the first electrode and a second voltage to the second electrode; and a switch electrically coupled to the first and second electrodes and to the direct current power supply such that energization of the direct current power supply by action of the switch causes the fluid to generate a plasma between the first electrode and the second electrode and the plasma induces a velocity component in the fluid; wherein the energization caused by the switch creates a repetitive pulse having a length of time by momentarily connecting one of the first or second electrodes to a ground, such that, for the majority of the pulse, the voltages of the first and second electrodes are the first and second voltages, respectively. 2. The plasma generating device of claim 1 , wherein for the majority of the pulse, the first and second voltages are approximately equal. 3. The plasma generating device of claim 1 , wherein the repetitive pulse is regularly repeated such that the length of time of the repetitive pulse is approximately 1 millisecond. 4. The plasma generating device of claim 1 , where the repetitive pulse is subject to frequency modulation varying the length of time between the repetitive pulses. 5. The plasma generating device of claim 1 , wherein the switch is a fast acting solid state switch. 6. The plasma generating device of claim 5 , wherein the switch is a stacked MOSFET circuit. 7. The plasma generating device of claim 1 , wherein the direct current power supply is an alternating current device adapted to provide direct current to the plasma generating device. 8. The plasma generating device of claim 1 , wherein the dielectric comprises a minimally conductive material. 9. The plasma generating device of claim 1 , wherein the first electrode is the positive electrode. 10. The plasma generating device of claim 1 , wherein the plasma generating device is adapted to reduce drag of the fluid on a surface upon which the plasma generating device is placed. 11. The plasma generating device of claim 1 , wherein the plasma generating device is adapted to control flow separation of the fluid over a surface upon which the plasma generating device is placed. 12. The plasma generating device of claim 1 , wherein the plasma generating device is adapted to modify the velocity distribution over a surface upon which the plasma generating device is placed. 13. The plasma generating device of claim 1 , wherein the plasma generating device is adapted to induce a force on a surface upon which the plasma generating device is placed. 14. A method for generating plasma comprising: coupling a plasma generating device to a surface, wherein the plasma generating device comprises: a dielectric; a first electrode exposed to a fluid flow; a second electrode separated from the fluid flow by the dielectric; coupling the first and second electrodes to a power supply, which supplies the first electrode with a first voltage and the second electrode with a second voltage; energizing the power supply by the action of a switch which delivers a direct current flow generating a plasma between the first electrode and the second electrode; inducing a velocity component in the fluid; wherein the direct current flow creates a repetitive pulse having a length of time by momentarily connecting one of the first or second electrodes to a ground such that, for the majority of the pulse, the voltages of the first and second electrodes are the first and second voltages, respectively. 15. The method of claim 14 , wherein the repetitive pulse is regularly repeated such that the length of time of the repetitive pulse is approximately 1 millisecond. 16. The method of claim 14 , wherein the repetitive pulse is subject to frequency modulation varying the length of time between the repetitive pulses. 17. The method of claim 14 , wherein the switch is a fast acting, solid state switch. 18. The method of claim 14 , wherein the direct current power supply is an alternating current device adapted to provide direct current to the plasma generating device. 19. The method of claim 14 , wherein the dielectric comprises a minimally conductive material. 20. The method of claim 14 , wherein the first electrode is the positive electrode.

Assignees

Inventors

Classifications

  • H05H1/2439Primary

    Surface discharges, e.g. air flow control · CPC title

  • H05H1/2406Primary

    using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes · CPC title

  • Electricity · mapped topic

  • Generating plasma {(nuclear fusion reactors G21B1/00; gas-filled discharge reactors H01J37/32)} · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US9848485B2 cover?
A plasma generating device intended to induce a flow in a fluid via plasma generation includes a dielectric separating two electrodes and a power supply. The first electrode is exposed to a fluid flow while the second electrode is positioned under the dielectric. The power supply is electrically coupled to a switch and the first and second electrodes. When the power supply is energized by repea…
Who is the assignee on this patent?
Univ Notre Dame Du Lac, Creare Llc
What technology area does this patent fall under?
Primary CPC classification H05H1/2439. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Dec 19 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).