Method of manufacturing liquid crystal display
US-2015346559-A1 · Dec 3, 2015 · US
US9846332B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9846332-B2 |
| Application number | US-201414307280-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 17, 2014 |
| Priority date | Jun 17, 2013 |
| Publication date | Dec 19, 2017 |
| Grant date | Dec 19, 2017 |
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Provided is a method of manufacturing new liquid crystal display device according to an embodiment of the present invention. Firstly, an alignment film is formed on a substrate. The alignment film is divided into a first alignment film formed using, as a precursor, liquid-state polyimide that contains a photodecomposition substance and a second alignment film formed using, as a precursor, a polyamic acid that does not contain a photodecomposition substance. UV light is irradiated to the alignment film, and decomposed substances formed by irradiation of the UV light is removed by an at least two-step removing process. By the method of manufacturing a liquid crystal display device according to the exemplary embodiment of the present disclosure, bright spots are minimized in pixels and a brightness of black is lowered, so that a liquid crystal display device with a high contrast ratio can be realized.
Opening claim text (preview).
What is claimed is: 1. A method of manufacturing a liquid crystal display device, the method comprising: forming an alignment film on at least one of a pair of substrates, the alignment film having an upper section that is substantially comprised of polyimide with a photo-decomposable material and a lower section that is substantially comprised of polyimide without the photo-decomposable material; irradiating the alignment film with ultra-violet (UV) light; performing a chemical impurity molecule removal (C-IMR) process on the alignment film; performing a thermal impurity molecule removal (T-IMR) process on the alignment film; and sealing a liquid crystal layer between the pair of substrates, wherein forming the alignment film includes: settling a solution of a precursor mixture dispersed in an organic solvent on at least one of the substrates, the precursor mixture including soluble pre-imidized polyimide with the photo-decomposable material, polyamic acid with the photo-decomposable material and polyamic acid without the photo-decomposable material; and heating the settled solution of precursor mixture and the organic solvent on the substrate to cause imidization of polyamic acid with the photo-decomposable material and polyamic acid without the photo-decomposable material included therein such that the pre-imidized polyimide with the photo-decomposable material and the polyamic acid with the photo-decomposable material form the upper section and the polyamic acid without the photo-decomposable material forms the lower section of the alignment film. 2. The method according to claim 1 , wherein the alignment film has a weight average molecular weight of 10,000 Da to 15,000 Da. 3. The method according to claim 2 , wherein the alignment film including a polyimide chain with a molecular weight of 100,000 Da or more. 4. The method according to claim 1 , wherein the C-IMR process includes applying a lactate-based organic solvent on the alignment film to swell the surface of the alignment film. 5. The method according to claim 4 , wherein the lactate-based organic substance includes at least one of methyl lactate, ethyl lactate, n-propyl lactate, n-butyl lactate and a combination thereof. 6. The method according to claim 5 , wherein the lactate-based organic solvent is ethyl lactate. 7. The method according to claim 6 , wherein the application of ethyl lactate on the alignment film is performed by one of a spray method, a dipping method or a puddle method. 8. The method according to claim 1 , wherein the T-IMR process includes baking the alignment film to restructure the surface of the alignment film. 9. The method according to claim 1 , wherein the C-IMR process is performed for a predetermined duration sufficient to remove high-molecular weight impurities from the alignment film. 10. The method according to claim 9 , wherein the C-IMR process is carried out for a range of 10 to 60 seconds. 11. The method according to claim 9 , wherein the high-molecular weight impurities have at least two or more maleimides. 12. The method according to claim 1 , wherein the T-IMR process is carried out for 1,000 seconds or less. 13. The method according to claim 1 , further comprising: rinsing the alignment film with deionized (DI) water. 14. The method according to claim 1 , wherein the polyimide with the photo-decomposable material in the precursor mixture is a compound represented by Chemical Formula 1: wherein, X represents cyclobutane, Y represents an aromatic hydrocarbon group having 2 or more rings, and n represents a natural number. 15. The method according to claim 14 , wherein the polyamic acid without the photo-decomposable material is a compound represented by Chemical Formula 2: wherein X represents an aromatic hydrocarbon group having 2 or more rings, Y represents an aromatic hydrocarbon group having 1 or more rings, and n represents a natural number. 16. The method according to claim 1 , wherein a volume resistance of the upper section is higher than a volume resistance of the lower section. 17. The method according to claim 16 , wherein the volume resistance of the lower section is 1.0·10 13 Ω·cm or less. 18. The method according to claim 1 , wherein a weight average molecular weight of the lower section is higher than a weight average molecular weight of the upper section. 19. The method according to claim 1 , wherein the photo-decomposable material includes a cyclobutane. 20. The method according to claim 1 , wherein the liquid crystal layer includes negative dielectric anisotropy liquid crystal molecules.
for applying an electric field parallel to the substrate, i.e. in-plane switching [IPS] · CPC title
by light irradiation, e.g. linearly polarised light photo-polymerisation · CPC title
Polyimide, polyamide-imide · CPC title
Cross-Sectional Technologies · mapped topic
Cross-Sectional Technologies · mapped topic
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