Hydrophobic nanostructured thin films

Patent metadata

Field	Value
Publication number	US-9845409-B2
Application number	US-201615219925-A
Country	US
Kind code	B2
Filing date	Jul 26, 2016
Priority date	Apr 28, 2008
Publication date	Dec 19, 2017
Grant date	Dec 19, 2017

Abstract

Provided herein are the polymers shown below. The value n is a positive integer. R 1 is an organic group, and each R 2 is H or a chemisorbed group, with at least one R 2 being a chemisorbed group. The polymer may be a nanostructured film. Also provided herein is a method of: converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers; depositing the reactive vapor onto a substrate held at an angle relative to the vapor flux to form nanostructured poly(p-xylylene) film; reacting the film with an agent to form hydrogen atoms that are reactive with a precursor of a chemisorbed group, if the film does not contain the hydrogen atoms; and reacting the hydrogen atoms with the precursor. Also provided herein is a device having a nanostructured poly(p-xylylene) film on a pivotable substrate. The film has directional hydrophobic or oleophobic properties and directional adhesive properties.

First claim

What is claimed is:

1. A method comprising:
converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers, the reactive vapor having a flux;
depositing the reactive vapor under vacuum onto a substrate held fixed in a specific angle of orientation relative to the vapor flux to form nanostructured poly(p-xylylene) film;
reacting the nanostructured poly(p-xylylene) film with an agent to form hydrogen atoms attached to the poly(p-xylylene) film that are reactive with a precursor of a chemisorbed group, if the deposited film does not contain the hydrogen atoms; and
reacting the hydrogen atoms with the precursor of the chemisorbed group.

2. The method of claim 1 ;
wherein the di-p-xylylene paracyclophane dimer is trifluoroacetyl-di-p-xylylene paracyclophane dimer;
wherein the agent is lithium aluminum hydride; and
wherein reacting with lithium aluminum hydride produces —CHOH—CF 3 groups.

3. The method of claim 2 , wherein the precursor is a fluoroalkyltrichlorosilane.

4. The method of claim 3 , wherein the fluoroalkyltrichlorosilane is heptadecafluoro-1,1,2,2-tetrahydrodecyltrichlorosilane.

5. The method of claim 2 , wherein the precursor is trimethoxyallylsilane.

6. The method of claim 5 , further comprising:
copolymerizing the product of the poly(p-xylylene) film-trimethoxyallylsilane reaction with N-isopropylacrylamide.

7. The method of claim 2 , wherein the precursor is a polyisocyanate.

8. The method of claim 7 , further comprising:
reacting the product of the poly(p-xylylene) film-polyisocyanate reaction with a polyethylene glycol.

Assignees

• Us Navy

Inventors

• Dressick Walter J
• Demirel Melik C

Classifications

• B05D5/10

  to obtain an adhesive surface · CPC title

• Y10T428/31504

  Composite [nonstructural laminate] · CPC title

• C08G2261/3424

  non-conjugated, e.g. paracyclophanes or xylenes · CPC title

• C08G81/00

  Macromolecular compounds obtained by interreacting polymers in the absence of monomers, e.g. block polymers (involving only carbon-to-carbon unsaturated bond reactions C08F299/00 {; polyester-amides C08G69/44; polyester-imides C08G73/16; polyamides-imides C08G73/14; block- or graft polymers containing polysiloxane sequences C08G77/42}) · CPC title

• B05D1/60

  Deposition of organic layers from vapour phase (vapour phase deposition in general C23C14/00, C23C16/00) · CPC title