Production method for deposition mask and deposition mask

Patent metadata

Field	Value
Publication number	US-9844835-B2
Application number	US-201514713519-A
Country	US
Kind code	B2
Filing date	May 15, 2015
Priority date	Nov 15, 2012
Publication date	Dec 19, 2017
Grant date	Dec 19, 2017

Abstract

To provide a production method including: a first step of forming a mask member in which a resin film and a magnetic metal member, which has first through-holes and second through-holes, are brought into close contact; a second step in which a peripheral edge of the magnetic metal member is bonded to one end face of a frame; and a third step in which a portion of the film in each first through-hole is irradiated with laser light to form an opening pattern, and a portion of the film in each second through-hole is irradiated with laser light to form a mask-side alignment mark.

First claim

What is claimed is:

1. A production method for a deposition mask for forming a plurality of thin-film patterns on a substrate, the production method comprising:
a first step of forming a mask member in which a resin film and a magnetic metal member, which has a plurality of first and second through-holes formed at positions respectively corresponding to the plurality of thin-film patterns and a plurality of substrate-side alignment marks preliminarily formed on the substrate, are brought into close contact with each other, each of the first and second through-holes having a shape and dimension greater those that of the thin-film pattern, and each of the second through-holes having a shape and dimension greater than those of the substrate-side alignment mark;
a second step in which the mask member is stretched on one end face of a frame having an opening enclosing the plurality of first and second through-holes of the magnetic metal member, and a peripheral edge of the magnetic metal member is bonded to the end face of the frame; and
a third step in which a portion of the film at the position corresponding to the thin-film pattern in each of the first through-holes is irradiated with laser light to form an opening pattern having a shape and dimension the same as those of the thin-film pattern, and a portion of the film at the position corresponding to the substrate-side alignment mark in each of the second through-holes is irradiated with laser light to form a mask-side alignment mark.

2. The production method for a deposition mask according to claim 1 , wherein the third step comprises the steps of:
forming each of the opening patterns at the portion of the film in the corresponding first through-hole by moving an irradiated position of the laser light by a predetermined distance in a stepwise manner, and reading and storing a coordinate of each opening pattern in an X-Y plane;
reading the stored coordinates of the opening patterns to calculate an average value, and calculating a coordinate at a center of an opening-pattern formation region in which the plurality of opening patterns is formed; and
forming each of the mask-side alignment marks at the position in the corresponding second through-hole, the position being apart from the calculated coordinates at the center, serving as a reference, by a particular distance.

3. The production method for a deposition mask according to claim 1 , wherein the third step comprises the steps of:
forming the mask-side alignment mark at the portion of the film in a second through-hole selected from the plurality of second through-holes; and
forming each of the opening patterns at the portion of the film in the corresponding first through-hole by moving an irradiated position of the laser light by a predetermined distance in a stepwise manner with the formed mask-side alignment mark being used as a reference, and forming the mask-side alignment marks other than the mask-side alignment mark in the selected second through-hole at the portions of the film in the second through-holes other than the selected second through-hole.

4. The production method for a deposition mask according to claim 1 , wherein the plurality of first through-holes has a rectangular shape and is disposed on the magnetic metal member in a matrix at regular intervals, and each of the plurality of opening patterns is formed in the corresponding first through-hole.

5. The production method for a deposition mask according to claim 1 , wherein the plurality of first through-holes has a stripe shape and is disposed on the magnetic metal member in parallel at regular intervals, and each of the plurality of opening patterns has a stripe shape and is formed in the corresponding first through-hole.

Assignees

• V Tech Co Ltd

Inventors

• Mizumura Michinobu

Classifications

• B23K2203/42

  Operations & Transport · mapped topic

• B23K26/402

  involving non-metallic material, e.g. isolators · CPC title

• B23K2203/172

  Operations & Transport · mapped topic

• B23K2203/50

  Operations & Transport · mapped topic

• B23K26/03

  Observing, e.g. monitoring, the workpiece · CPC title