Substrate plating apparatus and substrate plating method

Patent metadata

Field	Value
Publication number	US-9844794-B2
Application number	US-201414257929-A
Country	US
Kind code	B2
Filing date	Apr 21, 2014
Priority date	Apr 23, 2013
Publication date	Dec 19, 2017
Grant date	Dec 19, 2017

Abstract

A substrate plating apparatus is disclosed. The apparatus includes a substrate holder; a plating bath configured to plate a surface of the substrate in a plating solution; a cleaning bath configured to clean the substrate holder and the substrate with a cleaning liquid; an inner shell disposed in the cleaning bath and configured to house the substrate holder holding the substrate therein; and a cleaning liquid supply conduit configured to supply a cleaning liquid into the inner shell to clean the substrate, together with the substrate holder, with the cleaning liquid. The inner shell has an inner surface having an uneven configuration that follows an uneven exterior configuration of the substrate holder holding the substrate.

First claim

What is claimed is:

1. A substrate plating apparatus comprising:
a substrate holder configured to hold a substrate with a sealing member pressing on a peripheral portion of the substrate;
a plating bath configured to plate a surface of the substrate when the substrate, held by the substrate holder, is immersed in a plating solution;
a cleaning bath configured to clean the substrate holder and the substrate with a cleaning liquid;
an inner shell disposed in the cleaning bath and configured to house therein the substrate holder holding the substrate, the inner shell including a shell side plate and shell end plates disposed at both sides of the shell side plate, both of the shell end plates being configured to open and to close and having an inner surface which has an uneven configuration that follows an uneven exterior configuration of the substrate holder holding the substrate, one of the shell end plates having a plurality of through-holes facing a front side of the substrate holder; and
a cleaning liquid supply conduit configured to be in communication with the plurality of through-holes and to supply a cleaning liquid through the plurality of through-holes into the inner shell when the inner shell is in a closed state to clean the substrate, together with the substrate holder, with the cleaning liquid.

2. The substrate plating apparatus according to claim 1 , wherein a gap of 1 mm to 5 mm is formed between the inner surface of the inner shell in the closed state and the substrate holder.

3. The substrate plating apparatus according to claim 1 , further comprising
a gas feed line configured to feed a gas into the cleaning liquid to be supplied into the inner shell in the closed state.

4. The substrate plating apparatus according to claim 1 , further comprising:
a mechanism configured to cause a surface level of the cleaning liquid in the inner shell to fluctuate vertically when the inner shell is in the closed state.

5. The substrate plating apparatus according to claim 4 , wherein the mechanism is one of an oscillation mechanism configured to cause walls of the inner shell to oscillate, a diaphragm drive mechanism configured to vibrate a diaphragm in contact with the cleaning liquid in the inner shell, and a syringe mechanism or pump device configured to repeatedly supply and discharge the cleaning liquid into and from the inner shell.

6. The substrate plating apparatus according to claim 1 , further comprising:
a substrate holder moving mechanism configured to cause the substrate holder to oscillate horizontally.

7. The substrate plating apparatus according to claim 1 further comprising a mechanism coupled to the inner shell, the mechanism configured to cause the shell end plates to move between being opened and being closed.

8. The substrate plating apparatus according to claim 7 wherein the mechanism configured to cause the shell end plates to move between being opened and being closed is configured to cause rotation of the shell end plates away from each other.

9. The substrate plating apparatus according to claim 7 wherein the mechanism configured to cause the shell end plates to move is coupled to a lid.

10. A substrate plating apparatus comprising:
a substrate holder configured to hold a substrate with a sealing member pressing on a peripheral portion of the substrate;
a plating bath configured to plate a surface of the substrate when the substrate, held by the substrate holder, is immersed in a plating solution;
a cleaning bath configured to clean the substrate holder and the substrate with a cleaning liquid;
an inner shell disposed in the cleaning bath and configured to house therein the substrate holder holding the substrate, the inner shell including a shell side plate and shell end plates disposed at both sides of the shell side plate, both of the shell end plates being configured to open and to close and having an inner surface which has an uneven configuration that follows an uneven exterior configuration of the substrate holder holding the substrate, one of the shell end plates having a plurality of peripheral holes and a central hole facing a front side of the substrate holder; and
a cleaning liquid supply conduit configured to be in communication with the plurality of peripheral holes and the central hole and to supply a cleaning liquid through at least one of the plurality of peripheral holes and the central hole into the inner shell when the inner shell is in a closed state to clean the substrate, together with the substrate holder, with the cleaning liquid, the peripheral holes being arranged so as to face a peripheral portion of the substrate, the central hole being arranged so as to face a central portion of the substrate.

11. The substrate plating apparatus according to claim 10 further comprising a mechanism coupled to the inner shell, the mechanism configured to cause the shell end plates to move between being opened and being closed.

12. The substrate plating apparatus according to claim 11 wherein the mechanism configured to cause the shell end plates to move between being opened and being closed is further configured to cause rotation of the shell end plates.

13. The substrate plating apparatus according to claim 11 wherein the mechanism configured to cause the shell end plates to move is coupled to a lid.

Assignees

• Ebara Corp

Inventors

• Minami Yoshio
• Kimura Masaaki

Classifications

• B05C3/04

  with special provision for agitating the work or the liquid or other fluent material · CPC title

• B05C21/00

  Accessories or implements for use in connection with applying liquids or other fluent materials to surfaces, not provided for in groups B05C1/00 - B05C19/00 (accessories or implements for use in connection with painting or artistic drawing and fully provided for in B44D3/02 - B44D3/38, see subgroups of B44D3/00) · CPC title

• B08B3/047

  Containers specially adapted therefor · CPC title

• C25D17/004

  Sealing devices · CPC title

• C25D17/001 Primary

  Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells · CPC title