Method and system for imaging of a photomask through a pellicle

Patent metadata

Field	Value
Publication number	US-9842724-B2
Application number	US-201615012599-A
Country	US
Kind code	B2
Filing date	Feb 1, 2016
Priority date	Feb 3, 2015
Publication date	Dec 12, 2017
Grant date	Dec 12, 2017

Abstract

A system for imaging a sample through a protective pellicle is disclosed. The system includes an electron beam source configured to generate an electron beam and a sample stage configured to secure a sample and a pellicle, wherein the pellicle is disposed above the sample. The system also includes an electron-optical column including a set of electron-optical elements to direct at least a portion of the electron beam through the pellicle and onto a portion of the sample. In addition, the system includes a detector assembly positioned above the pellicle and configured to detect electrons emanating from the surface of the sample.

First claim

What is claimed:

1. A scanning electron microscopy apparatus comprising:
an electron beam source configured to generate an electron beam;
a sample stage configured to secure a sample and a pellicle, wherein the pellicle is disposed above the sample and the sample is negatively biased relative to the pellicle;
an electron-optical column including a set of electron-optical elements to direct at least a portion of the electron beam through the pellicle and onto a portion of the sample; and
a detector assembly positioned above the pellicle and configured to detect electrons emanating from the surface of the sample.

2. The apparatus of claim 1 , wherein the electron beam source comprises:
one or more electron guns.

3. The apparatus of claim 1 , wherein the sample comprises:
a photomask.

4. The apparatus of claim 3 , wherein the sample comprises:
at least one of an extreme ultraviolet photomask or an X-ray photomask.

5. The apparatus of claim 1 , wherein at least one of the pellicle or sample is conductive.

6. The apparatus of claim 1 , wherein the detector assembly comprises:
one or more backscattered electron detectors.

7. The apparatus of claim 6 , wherein the detector assembly comprises:
an array of backscattered electron detectors.

8. The apparatus of claim 1 , wherein the detector assembly comprises:
one or more secondary electron detectors.

9. The apparatus of claim 8 , wherein the detector assembly comprises:
an Everhart-Thornley secondary electron detector.

10. The apparatus of claim 8 , wherein the detector assembly comprises:
a secondary electron detector disposed within the electron-optical column.

11. The apparatus of claim 8 , wherein the detector assembly comprises:
a multi-channel electron multiplier detector.

12. The apparatus of claim 1 , further comprising:
bias control circuitry to control the potential on at least one of the pellicle or sample.

13. The apparatus of claim 12 , wherein the bias control circuitry establishes the negative bias on the sample relative to the pellicle.

14. The apparatus of claim 12 , wherein the bias control circuitry is integrated with the sample stage to establish one or more electrical connections between the sample stage and at least one of the pellicle or the sample in order to ground at least one of the pellicle or the sample.

15. The apparatus of claim 1 , further comprising:
a controller communicatively coupled to the detector assembly and configured to form one or more images of the surface of the sample based on one or more signals from the detector assembly.

16. A scanning electron microscopy apparatus comprising:
an electron beam source configured to generate an electron beam;
a sample stage configured to secure a sample and a pellicle, wherein the pellicle is disposed above the sample, wherein a selected gas is contained within the volume between the pellicle and the sample at a selected pressure; and
an electron-optical column including a set of electron-optical elements to direct at least a portion of the electron beam through the pellicle and onto a portion of the sample,
wherein the selected gas amplifies electrons emanating from the surface of the sample.

17. The apparatus of claim 16 , wherein the selected gas comprises:
at least one of H 2 O, O 2 , H 2 , O 3 or N 2 .

18. The apparatus of claim 16 , wherein the selected pressure is between 0.1 to 10 Torr.

19. The apparatus of claim 16 , further comprising:
bias control circuitry to control the potential on at least one of the pellicle or sample.

20. The apparatus of claim 19 , wherein the bias control circuitry establishes a positive bias on the pellicle relative to the sample.

21. The apparatus of claim 19 , wherein the bias control circuitry is integrated with the sample stage to establish one or more electrical connections between the sample stage and at least one of the pellicle or the sample in order to ground at least one of the pellicle or the sample.

22. The apparatus of claim 16 , further comprising:
a controller electrically coupled to at least one of the pellicle or the sample and configured to receive a current output from at least one of the pellicle or the sample representative of the electrons absorbed by at least one of the pellicle or the sample.

23. The apparatus of claim 22 , further comprising:
one or more light detectors disposed above the pellicle and configured to detect photons emitted from the gas contained within the volume between the pellicle and the photomask.

24. The apparatus of claim 23 , wherein the controller is configured to receive one or more signals from the one or more light detectors indicative of the detected photons from the gas contained within the volume between the pellicle and the photomask.

25. The apparatus of claim 24 , wherein the controller is configured to image one or more portions of the sample based on at least one of the received current output from at least one of the pellicle or the sample or the one or more received signals from the one or more light detectors.

26. A method for imaging a sample through a pellicle comprising:
generating an electron beam;
directing the electron beam through a pellicle onto a surface of a sample, wherein the sample is negatively biased relative to the pellicle; and
detecting at least one of backscattered electrons scattered from the surface of the sample, secondary electrons emitted from the surface of the sample, or photons emitted by electron-gas interactions within a pressurized gas between the pellicle and the sample.

Assignees

• Kla Tencor Corp

Inventors

• Schultz William G
• Delgado Gildardo
• Rose Garry A

Classifications

• H01J37/244

  Detectors; Associated components or circuits therefor · CPC title

• G03F1/62

  Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof · CPC title

• H01J2237/2448

  Secondary particle detectors · CPC title

• H01J37/28 Primary

  with scanning beams {(H01J37/268, H01J37/292, H01J37/2955 take precedence)} · CPC title

• H01J2237/24475

  Scattered electron detectors · CPC title