Antireflection film, lens, and imaging device

Patent metadata

Field	Value
Publication number	US-9841535-B2
Application number	US-201715468863-A
Country	US
Kind code	B2
Filing date	Mar 24, 2017
Priority date	Sep 30, 2014
Publication date	Dec 12, 2017
Grant date	Dec 12, 2017

Abstract

Provided is an antireflection film having excellent abrasion resistance.
In the antireflection film, a hydrogenated carbon film as a first layer is formed on a surface of an optical substrate. A MgF 2 film as a second layer having a lower refractive index than the first layer is formed on the first layer. Likewise, a third layer formed of the hydrogenated carbon film, a fourth layer formed of the MgF 2 film, and a fifth layer formed of the hydrogenated carbon film are formed. During the formation of the hydrogenated carbon film, a mixed gas of argon and hydrogen is supplied to a vacuum chamber such that some of C—C bonds in the film are replaced with C—H bonds. Due to the C—H bonds, an antireflection film having excellent abrasion resistance and adhesiveness and having a low refractive index can be obtained.

First claim

What is claimed is:

1. An antireflection film comprising:
a substrate formed of chalcogenide glass in which the sum of a composition ratio of germanium and a composition ratio of selenium is 60% or higher;
a multiple layer structure formed on the substrate, and including first to fifth layers in order from the substrate;
wherein the first, third and fifth layers are high refractive index layers formed of hydrogenated carbon films, and have a refractive index of 1.7 to 2.25 at a wavelength of 10.5 μm,
the second and fourth layers are low refractive index layers formed of MgF 2 films, and have a lower refractive index than the high refractive index layers,
the first layer has an optical thickness in a range of 2700 nm to 3100 nm,
the second layer has an optical thickness in a range of 600 nm to 2100 nm,
the third layer has an optical thickness in a range of 300 nm to 1700 nm,
the fourth layer has an optical thickness in a range of 2200 nm to 3500 nm, and
the fifth layer has an optical thickness in a range of 100 nm to 300 nm, and has a hydrogen content ch in a range of 0 [at. %]<ch≦7.5 [at. %].

2. The antireflection film according to claim 1 ,
wherein the substrate has a refractive index of 2.4 to 2.6 at a wavelength of 10.5 μm and has a reflectance of 0.5% or lower in a wavelength range of 8 μm to 14 μm.

3. A chalcogenide glass lens comprising
the antireflection film according to claim 1 .

4. An imaging device comprising
at least one chalcogenide glass lens including the antireflection film according to claim 1 .

Assignees

• Fujifilm Corp

Inventors

• Takahashi Hiroki
• Iida Takeshi

Classifications

• G02B1/14

  Protective coatings, e.g. hard coatings · CPC title

• C03C17/3441

  comprising carbon, a carbide or oxycarbide · CPC title

• C03C17/3452

  comprising a fluoride · CPC title

• G02B1/111 Primary

  using layers comprising organic materials · CPC title

• C03C2218/154

  by sputtering · CPC title