Directional treatment for multi-dimensional device processing
US-2015325411-A1 · Nov 12, 2015 · US
Plasma chamber having an upper electrode having controllable valves and a method of using the same
US9840778B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9840778-B2 |
| Application number | US-201213486374-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 1, 2012 |
| Priority date | Jun 1, 2012 |
| Publication date | Dec 12, 2017 |
| Grant date | Dec 12, 2017 |
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- Title
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Abstract
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This description relates to a plasma treatment apparatus including a vapor chamber, a gas supply and an upper electrode assembly. The upper electrode assembly includes a gas distribution plate having a plurality of holes in a bottom surface thereof and an upper electrode having at least one gas nozzle and at least one controllable valve connected to the at least one gas nozzle. The plasma treatment apparatus further includes a controller configured to generate a control signal. The at least one controllable valve is configured to be adjusted based on the control signal. A control system and a method of controlling a controllable valve are also described.
First claim
Opening claim text (preview).
What is claimed is: 1. A plasma treatment apparatus comprising: a vapor chamber; an upper electrode assembly comprising: a gas distribution plate having a plurality of holes in a bottom surface thereof; and an upper electrode having at least one gas nozzle and at least one controllable valve connected to the at least one gas nozzle for controlling a flow of gas from a gas supply to the holes via the at least one gas nozzle, the at least one gas nozzle is an adjustable nozzle,…
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Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Electricity · mapped topic
Chemistry & Metallurgy · mapped topic
Electricity · mapped topic
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- What does patent US9840778B2 cover?
- This description relates to a plasma treatment apparatus including a vapor chamber, a gas supply and an upper electrode assembly. The upper electrode assembly includes a gas distribution plate having a plurality of holes in a bottom surface thereof and an upper electrode having at least one gas nozzle and at least one controllable valve connected to the at least one gas nozzle. The plasma treat…
- Who is the assignee on this patent?
- Su Yen-Shuo, Xiao Ying, Lin Chin-Hsiang, and 1 more
- What technology area does this patent fall under?
- Primary CPC classification C23C16/50. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Dec 12 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).