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Method and apparatus for processing particulate material
US9840775B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9840775-B2 |
| Application number | US-201314762563-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 23, 2013 |
| Priority date | Jan 23, 2013 |
| Publication date | Dec 12, 2017 |
| Grant date | Dec 12, 2017 |
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- Title
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Abstract
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An apparatus and method for arranging a precursor vapor flow through a vertical atomic layer deposition (ALD) cartridge along a top-to-bottom vertical channel in a central area of the cartridge, and for moving particulate material to be ALD processed in the cartridge upwards, upon rotation, by a threaded area substantially extending from the vertical channel to a side wall of the cartridge, and downwards along the vertical channel to cause the particulate material to cycle during ALD processing.
First claim
Opening claim text (preview).
The invention claimed is: 1. A method comprising: arranging a precursor vapor flow through a vertical atomic layer deposition (ALD) cartridge along a top-to-bottom vertical channel in a central area of the cartridge; and moving particulate material to be ALD processed in the cartridge upwards, upon rotation, by a threaded area substantially extending from the vertical channel to a side wall of the cartridge, and downwards along the vertical channel to cause the particulate material to cycle during ALD processing. 2. The method of claim 1 , comprising: moving the particulate material upwards by a combined movement of rotation and shaking. 3. The method of claim 2 , wherein the combined movement of rotation and shaking comprises consecutive movements consisting of lifting, rotating, and lowering. 4. The method of claim 1 , wherein the rotating movement, or rotating and shaking movement, is transmitted to the cartridge along a gas exhaust line. 5. The method of claim 1 , comprising: exposing the particulate material to temporally separated precursor pulses in the cartridge to deposit material on the surface of the particulate material by sequential self-saturating surface reactions.
Assignees
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Classifications
applied in non-semiconductor technology · CPC title
- C23C16/45544Primary
characterized by the apparatus · CPC title
Methods specially adapted for coating powder · CPC title
characterised by the method used for supporting substrates in the reaction chamber · CPC title
Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps · CPC title
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- What does patent US9840775B2 cover?
- An apparatus and method for arranging a precursor vapor flow through a vertical atomic layer deposition (ALD) cartridge along a top-to-bottom vertical channel in a central area of the cartridge, and for moving particulate material to be ALD processed in the cartridge upwards, upon rotation, by a threaded area substantially extending from the vertical channel to a side wall of the cartridge, and…
- Who is the assignee on this patent?
- Picosun Oy
- What technology area does this patent fall under?
- Primary CPC classification C23C16/45544. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Dec 12 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).