Chlorosilane production method

US9840421B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9840421-B2
Application numberUS-200913132956-A
CountryUS
Kind codeB2
Filing dateDec 22, 2009
Priority dateDec 25, 2008
Publication dateDec 12, 2017
Grant dateDec 12, 2017

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

When a disproportionated chlorosilane is to be produced by causing a starting material chlorosilane liquid to flow through a catalyst-packed layer which is packed with a weakly basic anion exchange resin as a disproportionation reaction catalyst to carry out a disproportionation reaction, before the disproportionation reaction is carried out, the disproportionation reaction catalyst is brought into contact with a processing gas obtained by diluting a chlorosilane with an inert gas to prevent the deterioration of the disproportionation reaction catalyst at the start of the reaction so as to carry out the disproportionation of the chlorosilane efficiently.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method of producing a trichloromonosilane, which comprises flowing a starting material chlorosilane liquid comprising dichloromonosilane and silicon tetrachloride through a catalyst-packed layer which is packed with a weakly basic anion exchange resin as a reaction catalyst to react dichloromonosilane and silicon tetrachloride to form trichloromonosilane, wherein a step of bringing the reaction catalyst contained in the catalyst-packed layer into contact with a processing gas obtained by diluting a silicon tetrachloride with an inert gas until a temperature rise in the catalyst-packed layer comes to an end and a step of cleaning the reaction catalyst that has been brought into contact with the processing gas by flowing a silicon tetrachloride liquid through the catalyst-packed layer to remove solid matter are carried out before flowing the starting material chlorosilane liquid through the catalyst-packed layer. 2. The production method according to claim 1 , wherein the reaction mixture obtained after the reaction is carried out has a higher content of trichlorosilane than the starting material chlorosilane. 3. The production method according to claim 1 , wherein solid matter is separated from the silicon tetrachloride liquid after the cleaning step and then the silicon tetrachloride liquid is reused to clean the catalyst-packed layer. 4. A method of producing a trichloromonosilane, which comprises contacting a catalyst-packed layer which is packed with a weakly basic anion exchanger resin as a reaction catalyst for a reaction between dichloromonosilane and silicon tetrachloride with a processing gas obtained by diluting a silicon tetrachloride with an inert gas until a temperature rise in the catalyst-packed layer comes to an end, cleaning the reaction catalyst that has been brought into contact with the processing gas by flowing a silicon tetrachloride liquid to flow through the catalyst packed layer, and after the cleaning step, flowing a starting material chlorosilane liquid comprising dichloromonosilane and silicon tetrachloride through the catalyst-packed layer to react dichloromonosilane and silicon tetrachloride to form trichloromonosilane. 5. The production method according to claim 1 , wherein the starting material chlorosilane liquid further comprises trichloromonosilane. 6. The production method according to claim 4 , wherein the starting material chlorosilane liquid further comprises trichloromonosilane.

Assignees

Inventors

Classifications

  • Halogenated silanes obtained by disproportionation and molecular rearrangement of halogenated silanes · CPC title

  • Ion-exchange resins · CPC title

  • C01B33/107Primary

    Halogenated silanes · CPC title

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What does patent US9840421B2 cover?
When a disproportionated chlorosilane is to be produced by causing a starting material chlorosilane liquid to flow through a catalyst-packed layer which is packed with a weakly basic anion exchange resin as a disproportionation reaction catalyst to carry out a disproportionation reaction, before the disproportionation reaction is carried out, the disproportionation reaction catalyst is brought …
Who is the assignee on this patent?
Iiyama Shouji, Yamamoto Tomohiro, Takata Yukihiro, and 3 more
What technology area does this patent fall under?
Primary CPC classification C01B33/10773. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Dec 12 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).