Excimer laser apparatus and excimer laser system

US9837780B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9837780-B2
Application numberUS-201615150800-A
CountryUS
Kind codeB2
Filing dateMay 10, 2016
Priority dateDec 25, 2013
Publication dateDec 5, 2017
Grant dateDec 5, 2017

How to read this patent

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  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The excimer laser apparatus may include a laser chamber configured to contain gas, a pair of electrodes provided in the laser chamber, a power source unit configured to supply a pulse voltage between the pair of electrodes, a gas supply unit configured to supply gas into the laser chamber, a gas exhaust unit configured to partially exhaust gas from within the laser chamber, and a gas control unit configured to control the gas supply unit and the gas exhaust unit, where a replacement ratio of gas to be replaced from within the laser chamber increases as deterioration of the pair of electrodes progresses, the deterioration being represented by a deterioration parameter of the pair of electrodes.

First claim

Opening claim text (preview).

The invention claimed is: 1. An excimer laser apparatus comprising: a laser chamber configured to contain gas; a pair of electrodes provided in the laser chamber; a power source unit configured to supply a pulse voltage between the pair of electrodes; a gas supply unit configured to supply gas into the laser chamber; a gas exhaust unit configured to partially exhaust gas from within the laser chamber; a gas control unit configured to control the gas supply unit and the gas exhaust unit, where a replacement ratio of gas to be replaced from within the laser chamber increases as deterioration of the pair of electrodes progresses, the deterioration being represented by a deterioration parameter of the pair of electrodes, the deterioration parameter being an integrated value of input energy having been inputted to the pair of electrodes since the pair of electrodes was installed in the laser chamber; an input unit configured to input an initial value of the integrated value of input energy; and a laser control unit configured to add, to the initial value, a value of input energy additionally inputted to the pair of electrodes. 2. The excimer laser apparatus according to claim 1 , wherein the gas control unit is configured to determine a replacement amount of gas to be replaced from within the laser chamber based on the deterioration parameter of the pair of electrodes, and the gas control unit is configured to control the gas supply unit and the gas exhaust unit to replace the replacement amount of gas thus determined from within the laser chamber. 3. The excimer laser apparatus according to claim 1 , wherein the gas control unit is configured to determine a time interval of gas replacement from within the laser chamber based on the deterioration parameter of the pair of electrodes, and the gas control unit is configured to control the gas supply unit and the gas exhaust unit to replace gas at the time interval thus determined. 4. An excimer laser apparatus comprising: a laser chamber configured to contain gas; a pair of electrodes provided in the laser chamber; a power source unit configured to supply a pulse voltage between the pair of electrodes; a gas supply unit configured to supply gas into the laser chamber; a gas exhaust unit configured to partially exhaust gas from within the laser chamber; a gas control unit configured to control the gas supply unit and the gas exhaust unit to replace a first amount of gas corresponding to a first ratio to the total amount of gas in the laser chamber when a deterioration parameter of the pair of electrodes has a first value, control the gas supply unit and the gas exhaust unit to replace a second amount of gas corresponding to a second ratio to the total amount of gas in the laser chamber when the deterioration parameter of the pair of electrodes has a second value, the second ratio being higher than the first ratio, and the second value representing more progressed deterioration of the pair of electrodes than the first value, the deterioration parameter being an integrated value of input energy having been inputted to the pair of electrodes since the pair of electrodes was installed in the laser chamber; an input unit configured to input an initial value of the integrated value of input energy; and a laser control unit configured to add, to the initial value, a value of input energy additionally inputted to the pair of electrodes.

Assignees

Inventors

Classifications

  • comprising an excimer or exciplex · CPC title

  • H01S3/036Primary

    Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube {(H01S3/031 takes precedence)} · CPC title

  • Electrodes, e.g. special shape, configuration or composition · CPC title

  • in gas lasers · CPC title

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Frequently asked questions

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What does patent US9837780B2 cover?
The excimer laser apparatus may include a laser chamber configured to contain gas, a pair of electrodes provided in the laser chamber, a power source unit configured to supply a pulse voltage between the pair of electrodes, a gas supply unit configured to supply gas into the laser chamber, a gas exhaust unit configured to partially exhaust gas from within the laser chamber, and a gas control un…
Who is the assignee on this patent?
Gigaphoton Inc
What technology area does this patent fall under?
Primary CPC classification H01S3/036. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Dec 05 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).