Porous electrode active material and secondary battery including the same

Patent metadata

Field	Value
Publication number	US-9831500-B2
Application number	US-201615341472-A
Country	US
Kind code	B2
Filing date	Nov 2, 2016
Priority date	Apr 19, 2012
Publication date	Nov 28, 2017
Grant date	Nov 28, 2017

Abstract

Provided are an electrode active material having a plurality of pores and a secondary battery including the same, and more particularly, a porous electrode active material including silicon-based oxide expressed by SiO x (0.5≦x≦1.2) and having a Brunauer, Emmett, and Teller (BET) specific surface area ranging from 2 m 2 /g to 100 m 2 /g, and a secondary battery including a cathode including a cathode active material, a separator, an anode including an anode active material, and an electrolyte, in which the anode active material includes a porous electrode active material including silicon-based oxide expressed by SiO x (0.5≦x≦1.2) and having a BET specific surface area ranging from 2 m 2 /g to 100 m 2 /g.

First claim

What is claimed is:

1. A method of preparing a porous electrode active material comprising silicon-based oxide expressed by SiO x (0.5≦x≦1.2) and having a Brunauer, Emmett, and Teller (BET) specific surface area ranging from 42.8 m 2 /g to 100 m 2 /g, wherein porosity is in a range of from 38% to 90%, and wherein pores in a honeycomb shape are included at least on a surface of the porous electrode active material, the method comprising:
electrodepositing metal particles on surfaces of the SiO x (0.5≦x≦1.2) particles in a mixed solution of a fluorine-based solution and a metal precursor solution, wherein an amount of the SiO x particles is present in a range of 0.001 to 50 parts by weight based on 100 parts by weight of the mixed solution;
etching the surface of the SiO x particles under the metal particles electrodeposited thereon in an etching solution for a period ranging from 2 hours to 5 hours, wherein the etching solution includes hydrogen fluoride (HF) and hydrogen peroxide (H 2 O 2 ) mixed at a volume ratio ranging from 10:90 to 90:10; and
removing the metal particles from the etched SiO x particles in a metal removing solution.

2. The method of claim 1 , wherein the fluorine-based solution includes one or more selected from the group consisting of hydrogen fluoride (HF), silicon fluoride (H 2 SiF 6 ), and ammonium fluoride (NH 4 F).

3. The method of claim 1 , wherein the metal precursor solution comprises one or more selected from the group consisting of silver (Ag), gold (Au), platinum (Pt), and copper (Cu).

4. The method of claim 1 , wherein the fluorine-based solution and the metal precursor solution are present in the mixed solution at a volume ratio ranging from 10:90 to 90:10.

5. The method of claim 1 , wherein the metal removing solution is one or more selected from the group consisting of nitric acid (HNO 3 ), sulfuric acid (H 2 SO 4 ), and hydrochloric acid (HCl).

Assignees

• Lg Chemical Ltd
• Unist (Ulsan Nat Institute Of Science And Technology)

Inventors

• Lee Yong Ju
• Park Soo Jin
• Jung Dong Sub
• Jung Hye Ran
• Lee Jung In
• Kim Je Young
• Cho Jae Phil

Classifications

• H01M4/625

  Carbon or graphite · CPC title

• C23C18/54 Primary

  Contact plating, i.e. electroless electrochemical plating · CPC title

• Y02E60/122

  Cross-Sectional Technologies · mapped topic

• H01M4/483 Primary

  for non-aqueous cells (H01M4/485 takes precedence) · CPC title

• H01M4/485

  of mixed oxides or hydroxides for inserting or intercalating light metals, e.g. LiTi2O4 or LiTi2OxFy (H01M4/505, H01M4/525 take precedence) · CPC title