Process for producing hollow silicon bodies

US9831364B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9831364-B2
Application numberUS-201514950787-A
CountryUS
Kind codeB2
Filing dateNov 24, 2015
Priority dateNov 28, 2014
Publication dateNov 28, 2017
Grant dateNov 28, 2017

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Abstract

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Hollow bodies having a silicon-comprising shell, are produced by, in a gas comprising at least one silane of the general formula Si n H 2n+2−m X m with n=1 to 4, m=0 to 2n+2 and X=halogen, (a) generating a non-thermal plasma by an AC voltage of frequency f, or operating a light arc, or introducing electromagnetic energy in the infrared region into the gas, giving a resulting phase which (b) is dispersed in a wetting agent and distilled, and then (c) the distillate is contacted at least once with a mixture of at least two of the substances hydrofluoric acid, nitric acid, water, giving a solid residue comprising hollow bodies having a silicon-comprising shell after the conversion reaction of the distillate with the mixture has abated or ended.

First claim

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The invention claimed is: 1. A process for producing a hollow body comprising a silicon-comprising shell, said process comprising: in a gas comprising a silane of formula Si n H 2n+2−m X m with n=1 to 4, m=0 to 2n+2 and X=halogen, (a) producing a resultant phase by generating a non-thermal plasma by an AC voltage of frequency f, or operating a light arc, or introducing electromagnetic energy in an infrared region into the gas, (b) dispersing the resultant phase in a wetting a…

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What does patent US9831364B2 cover?
Hollow bodies having a silicon-comprising shell, are produced by, in a gas comprising at least one silane of the general formula Si n H 2n+2−m X m with n=1 to 4, m=0 to 2n+2 and X=halogen, (a) generating a non-thermal plasma by an AC voltage of frequency f, or operating a light arc, or introducing electromagnetic energy in the infrared region into the gas, giving a resulting phase which (b) is…
Who is the assignee on this patent?
Lang Juergen Erwin, Rauleder Hartwig, Lyubina Julia, and 2 more
What technology area does this patent fall under?
Primary CPC classification C01B33/027. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Nov 28 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 7 related publications on this page (citations in our corpus or others sharing the same primary CPC).