Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structure

Patent metadata

Field	Value
Publication number	US-9828519-B2
Application number	US-201615047520-A
Country	US
Kind code	B2
Filing date	Feb 18, 2016
Priority date	Feb 18, 2016
Publication date	Nov 28, 2017
Grant date	Nov 28, 2017

Abstract

A resin composition for forming a phase-separated structure, including a block copolymer, and an ion liquid containing a compound having a cation moiety and an anion moiety, the anion moiety being represented by general formula (a1), (a2) or (a3), in which X″ represents an alkylene group of 2 to 6 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom; Y″ and Z″ each independently represents an alkyl group of 1 to 10 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom; R″ represents an alkyl group of 1 to 5 carbon atoms in which at least one hydrogen atom is optionally substituted with a fluorine atom, m represents an integer of 1 to 6, and n represents an integer of 0 to 5, provided that m+n=6.

First claim

What is claimed is:

1. A method of producing a structure containing a phase-separated structure, comprising:
dissolving a block copolymer and an ion liquid in an organic solvent to obtain a resin composition comprising the block copolymer and the ion liquid,
applying the resin composition to a support to form a layer containing a block copolymer; and
phase-separating the layer containing the block copolymer block copolymer, wherein the resin composition comprises:
a block copolymer; and
an ion liquid containing a compound (IL) having a cation moiety and an anion moiety,
wherein the amount of the compound (IL) within the resin composition relative to 100 parts by weight of the block copolymer is 0.05 to 50 parts by weight, and
the anion moiety of the compound (IL) is an anion represented by general formula (a1) shown below, an anion represented by general formula (a2) shown below, or an anion represented by general formula (a3) shown below:

wherein, in formula (a1), X″ represents an alkylene group of 2 to 6 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom; in formula (a2), Y″ and Z″ each independently represents an alkyl group of 1 to 10 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom; and in formula (a3), R″ represents an alkyl group of 1 to 5 carbon atoms in which at least one hydrogen atom is optionally substituted with a fluorine atom, m represents an integer of 1 to 6, and n represents an integer of 0 to 5, provided that m+n=6.

2. The method according to claim 1 , wherein the compound (IL) is an imidazolium salt, a pyrrolidinium salt, a piperidinium salt or an ammonium salt.

3. The method according to claim 1 , wherein the ion liquid contains a compound (IL-N1) having an anion moiety represented by general formula (a1) or (a2), and a molecular weight of 400 or greater.

4. The method according to claim 1 , wherein the ion liquid contains a compound (IL-N2) having an anion moiety represented by general formula (a1) or (a2), and a pyrolysis temperature of 300° C. or greater.

5. The method according to claim 1 , wherein the ion liquid contains a compound (IL-P) having an anion moiety represented by general formula (a3).

Assignees

• Tokyo Ohka Kogyo Co Ltd
• Univ Chicago

Inventors

• Kawaue Akiya
• Seshimo Takehiro
• Maehashi Takaya
• Matsumiya Tasuku
• Miyagi Ken
• Yamano Hitoshi
• Chen Xuanxuan
• Nealey Paul Franklin

Classifications

• C09D5/00

  Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced {(electrically insulating plastics, resins or waxes H01B3/30)}; Filling pastes · CPC title

• C09D153/00 Primary

  Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers · CPC title

• C08K5/43

  Compounds containing sulfur bound to nitrogen · CPC title

• G03F7/0002

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title

• B05D3/107

  Post-treatment of applied coatings · CPC title