Low density ethylene-based polymer compositions with high melt strength and mid-high density control

US9828496B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9828496-B2
Application numberUS-201414889221-A
CountryUS
Kind codeB2
Filing dateMay 21, 2014
Priority dateMay 22, 2013
Publication dateNov 28, 2017
Grant dateNov 28, 2017

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

The invention provides a composition comprising a first ethylene-based polymer, formed by a high pressure, free-radical polymerization process, and a second ethylene-based polymer, formed by a high pressure, free-radical polymerization process, such composition comprising the following properties: a) a melt index (12) from 2.0 to 10 dg/min; b) a density from 0.922 to 0.935 g/cc; and wherein the second ethylene-based polymer is present in an amount from 60 to 95 weight percent, based on the sum of the weight of the first polymer and the second polymer; and wherein the second ethylene-based polymer has a density greater than, or equal to, 0.924 g/cc; and wherein the first ethylene-based polymer has a melt index less than 2.5 dg/min.

First claim

Opening claim text (preview).

The invention claimed is: 1. A composition comprising a first ethylene-based polymer, formed by a high pressure, free-radical polymerization process, and a second ethylene-based polymer, formed by a high pressure, free-radical polymerization process, such composition comprising the following properties: a) a melt index (I2) from 2.0 to 10 dg/min; b) a density from 0.922 to 0.935 g/cc; and wherein the second ethylene-based polymer is present in an amount from 60 to 95 weight percent, based on the sum of the weight of the first ethylene-based polymer and the second ethylene-based polymer; and wherein the second ethylene-based polymer has a density greater than, or equal to, 0.924 g/cc; and wherein the first ethylene-based polymer has a melt index less than 1.5 dg/min. 2. The composition of claim 1 , wherein the first ethylene-based polymer has a Melt Strength greater than, or equal to, 15 cN. 3. The composition of claim 1 , wherein the second ethylene-based polymer has a melt index from 2.0 to 50 dg/min. 4. The composition of claim 1 , wherein the second ethylene-based polymer has a melt index from 3.0 to 30 dg/min. 5. The composition of claim 1 , wherein the composition has a hexane extractable content less than 5.5 wt %. 6. The composition of claim 1 , wherein the composition has a hexane extractable content less than 2.6 wt %. 7. The composition of claim 1 , wherein the first ethylene-based polymer and the second ethylene-based polymer each independently has a hexane extractable content less than, or equal to, 2.6 wt %. 8. The composition of claim 1 , wherein each polymer component of the composition independently has a hexane extractable content less than, or equal to, 2.6 wt %. 9. An article comprising at least one component formed from the composition of claim 1 . 10. The article of claim 9 , wherein the article is a coating, a film, a foam, a laminate, a fiber, or a tape. 11. A method for forming the composition of claim 1 , said method comprising mixing the first ethylene-based polymer and the second ethylene-based polymer. 12. A method for forming the composition of claim 1 , said method comprising separately feeding the first ethylene-based polymer and the second ethylene-based polymer into an extrusion system.

Assignees

Inventors

Classifications

  • Polyethylene · CPC title

  • used for films · CPC title

  • characterized by the use of several polymeric components · CPC title

  • C08L23/06Primary

    Polyethylene · CPC title

  • containing two or more polymers of the same hierarchy C08L, and differing only in parameters such as density, comonomer content, molecular weight, structure · CPC title

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What does patent US9828496B2 cover?
The invention provides a composition comprising a first ethylene-based polymer, formed by a high pressure, free-radical polymerization process, and a second ethylene-based polymer, formed by a high pressure, free-radical polymerization process, such composition comprising the following properties: a) a melt index (12) from 2.0 to 10 dg/min; b) a density from 0.922 to 0.935 g/cc; and wherein the…
Who is the assignee on this patent?
Dow Global Technologies Llc
What technology area does this patent fall under?
Primary CPC classification C08L23/06. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Nov 28 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 7 related publications on this page (citations in our corpus or others sharing the same primary CPC).