Microfluidic devices with integrated resistive heater electrodes including systems and methods for controlling and measuring the temperatures of such heater electrodes
US-9492826-B2 · Nov 15, 2016 · US
US9827761B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9827761-B2 |
| Application number | US-201414486919-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 15, 2014 |
| Priority date | Sep 17, 2013 |
| Publication date | Nov 28, 2017 |
| Grant date | Nov 28, 2017 |
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A processing target reforming apparatus includes: a conveying unit that conveys a processing target along a conveyance path; a discharge unit including a plurality of discharge electrodes aligned along the conveyance path, a counter electrode with the conveyance path interposed therebetween, and a power source that applies a voltage waveform to the discharge electrodes; and a control unit that controls the discharge unit such that a phase of the voltage waveform applied to a first discharge electrode of the discharge electrodes at a timing when a certain point of the processing target passes between the first discharge electrode and the counter electrode is shifted with respect to a phase of the voltage waveform applied by the power source to a second discharge electrode of the discharge electrodes at a timing when the certain point of the processing target passes between the second discharge electrode and the counter electrode.
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What is claimed is: 1. A processing target reforming apparatus comprising: a conveying unit that conveys a processing target along a conveyance path; a discharge unit including a plurality of discharge electrodes aligned along the conveyance path, a counter electrode arranged facing the discharge electrodes with the conveyance path interposed therebetween, and a power source that applies a voltage waveform to the discharge electrodes; and a control unit that controls the discharge unit such that a phase of the voltage waveform applied to a first discharge electrode of the discharge electrodes at a timing when a certain point of the processing target passes between the first discharge electrode and the counter electrode is shifted with respect to a phase of the voltage waveform applied by the power source to a second discharge electrode of the discharge electrodes at a timing when the certain point of the processing target passes between the second discharge electrode and the counter electrode; wherein the control unit controls the discharge unit such that the phase of the voltage waveform applied to the first discharge electrode is shifted with respect to the phase of the voltage waveform applied to the second discharge electrode based on a value read from memory indicating a distance between the first discharge electrode and the second discharge electrode and on a conveyance speed of the processing target conveyed by the conveying unit. 2. The processing target reforming apparatus according to claim 1 , wherein the power source applies the voltage waveform of a same period to the discharge electrodes, and the control unit controls the discharge unit such that the phase of the voltage waveform applied to the first discharge electrode is shifted with respect to the phase of the voltage waveform applied to the second discharge electrode by a period obtained by dividing one period of the voltage waveform by number of the discharge electrodes. 3. The processing target reforming apparatus according to claim 1 , wherein the control unit controls at least one of the phase of the voltage waveform applied to the first discharge electrode and the phase of the voltage waveform applied to the second discharge electrode, thereby controlling the discharge unit such that the phase of the voltage waveform applied to the first discharge electrode is shifted with respect to the phase of the voltage waveform applied to the second discharge electrode. 4. The processing target reforming apparatus according to claim 1 , wherein the discharge unit further includes a moving mechanism that adjusts a distance between the discharge electrodes, and the control unit adjusts the distance between the first discharge electrode and the second discharge electrode by driving the moving mechanism, thereby controlling the discharge unit such that the phase of the voltage waveform applied to the first discharge electrode is shifted with respect to the phase of the voltage waveform applied to the second discharge electrode. 5. A printing apparatus including at least a plasma processing unit that performs plasma processing on a processing target and a recording unit that performs inkjet recording on a surface of the processing target on which plasma processing is performed by the plasma processing unit, wherein the processing target reforming apparatus according to claim 1 is used as the plasma processing unit. 6. A printing system including at least a plasma processing apparatus that performs plasma processing on a processing target and a recording apparatus that performs inkjet recording on a surface of the processing target on which plasma processing is performed by the plasma processing apparatus, the printing system comprising: a conveying unit that conveys the processing target along a conveyance path; a discharge unit including a plurality of discharge electrodes aligned along the conveyance path, a counter electrode arranged facing the discharge electrodes with the conveyance path interposed therebetween, and a power source that applies a voltage waveform to the discharge electrodes; and a control unit that controls the discharge unit such that a phase of the voltage waveform applied to a first discharge electrode of the discharge electrodes at a timing when a certain point of the processing target passes between the first discharge electrode and the counter electrode is shifted with respect to a phase of the voltage waveform applied by the power source to a second discharge electrode of the discharge electrodes at a timing when the certain point of the processing target passes between the second discharge electrode and the counter electrode; wherein the control unit controls the discharge unit such that the phase of the voltage waveform applied to the first discharge electrode is shifted with respect to the phase of the voltage waveform applied to the second discharge electrode based on a value read from memory indicating a distance between the first discharge electrode and the second discharge electrode and on a conveyance speed of the processing target conveyed by the conveying unit. 7. A method using a printing apparatus including at least a plasma processing unit that performs plasma processing on a processing target and a recording unit that performs inkjet recording on a surface of the processing target on which plasma processing is performed by the plasma processing unit, the plasma processing unit including a conveying unit that conveys the processing target along a conveyance path and a discharge unit including a plurality of discharge electrodes aligned along the conveyance path, a counter electrode arranged facing the discharge electrodes with the conveyance path interposed therebetween, and a power source that applies a voltage waveform to the discharge electrodes, the method comprising: performing plasma processing on the processing target with the plasma processing unit; controlling the discharge unit such that a phase of the voltage waveform applied to a first discharge electrode of the discharge electrodes at a timing when a certain point of the processing target passes between the first discharge electrode and the counter electrode is shifted with respect to a phase of the voltage waveform applied by the power source to a second discharge electrode of the discharge electrodes at a timing when the certain point of the processing target passes between the second discharge electrode and the counter electrode; and performing inkjet recording on the surface of the processing target with the recording unit; wherein the discharge unit is controlled such that the phase of the voltage waveform applied to the first discharge electrode is shifted with respect to the phase of the voltage waveform applied to the second discharge electrode based on a value read from memory indicating a distance between the first discharge electrode and the second discharge electrode and on a conveyance speed of the processing target conveyed by the conveying unit.
using applied electromagnetic fields, e.g. high frequency or microwave energy (H05H1/26 takes precedence) · CPC title
for treating before, during or after printing or for uniform coating or laminating the copy material before or after printing (selective coating B41J2/2114) · CPC title
by electric or magnetic field · CPC title
Pre-treatment or treatment during printing of the recording material, e.g. heating, irradiating (after-treatment of prints B41M7/00; printers for treating or overcoating copy materials before, during or after printing B41J11/0015) · CPC title
DC, AC or pulsed generators · CPC title
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