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Patent metadata

Field	Value
Publication number	US-9827209-B2
Application number	US-201514617683-A
Country	US
Kind code	B2
Filing date	Feb 9, 2015
Priority date	Feb 9, 2015
Publication date	Nov 28, 2017
Grant date	Nov 28, 2017

Abstract

In making an optical component, one or more portions of a substrate's surface are patterned. At least a region of the substrate's surface is coated in negative photoresist, the region encompassing said portions. The negative photoresist becomes undevelopable when exposed to light. Light which forms a grating structure is projected over each of the portions. Light of substantially uniform intensity over the entirety of the region but for the portions, thereby leaving the negative photoresist outside of the portions undevelopable. The negative photoresist is developed so as to embody the grating structure in the photoresist covering the portions. The substrate's surface is patterned to impose the grating structure on the substrate's surface from the developed photoresist; the undevelopable photoresist inhibits patterning of the surface region outside of the portions. The optical component comprises the patterned substrate.

First claim

The invention claimed is:

1. A microfabrication process for making an optical component, the process comprising a patterning stage in which one or more first portions of a substrate's surface are patterned by at least:
coating at least a region of the substrate's surface in negative photoresist, said region encompassing said first portions, whereby the negative photoresist becomes undevelopable when exposed to light;
projecting light which forms a first grating structure over each of said first portions;
projecting light of substantially uniform intensity over the entirety of said region but for said first portions, thereby leaving the negative photoresist outside of said first portions undevelopable;
developing the negative photoresist so as to embody the grating structure in the photoresist covering said first portions;
patterning the substrate's surface to impose the grating structure on the substrate's surface from the developed photoresist, the undevelopable photoresist inhibiting patterning of the surface region outside of said first portions, wherein the optical component comprises the patterned substrate; and
following a first such patterning stage that forms the first grating structure with a second such patterning stage that patterns one or more second portions to form a second grating structure, the first grating structure and the second grating structure being separated by 50 to 100 micrometers along an entire common arcuate border between the first grating structure and the second grating structure.

2. A microfabrication process according to claim 1 , wherein the second grating structure imposed on the substrate's surface at the second stage is offset from the first grating structure imposed on the substrate's surface at the first stage by a non-zero angle.

3. A microfabrication process according to claim 2 , wherein the projecting steps of the first stage are performed with the substrate supported in a first orientation in an exposure system, and wherein the second stage comprises:
prior to the projecting steps of the second stage, rotating the substrate relative to the exposure system to a second orientation before performing the projecting steps of the second stage, wherein the second orientation is offset from the first orientation by said non-zero angle.

4. A microfabrication process according to claim 3 wherein the substrate is removed from the exposure system following the projecting steps of the first stage and re-loaded in the exposure system prior to performing the projecting steps of the second stage, wherein the second stage comprises:
after re-loading the substrate but before rotating the substrate to the second orientation, creating a fringe pattern by projecting light which forms a grating structure onto a portion of the substrate's surface already patterned at the first stage, wherein the fringe pattern is used when rotating the substrate to the second orientation to account for any unintended rotation of the substrate away from the first orientation caused by removing and re-loading the substrate.

5. A microfabrication process according to claim 2 wherein the first grating structure has a period different from the second grating structure.

6. A microfabrication process according to claim 2 wherein at the first stage a first shadow mask is used to restrict light which forms the first grating structure to a first area larger than and encompassing that first portion, wherein at the second stage a second shadow mask is used to restrict light which forms the second grating structure onto a second area larger than and encompassing that second portion, and wherein the first and second areas are large enough that those first and second portions are free from edge distortion created by the first and second mask respectively at least in the vicinity of the common border.

7. A microfabrication process according to claim 1 , wherein, for at least one of said first portions, a shadow mask is used in the first projecting step to restrict the light which forms the first grating structure to an area larger than and encompassing that portion, the area sufficiently large for that portion to be entirely free from edge distortion created by the mask.

8. A microfabrication process according to claim 1 , wherein the substrate initially comprises a master plate on which a metallic film is deposited, wherein the metallic film is patterned in the patterning step of claim 1 to impose the first and second grating structures on the metallic film from the photoresist.

9. A microfabrication process according to claim 8 , comprising patterning the plate to impose the first and second grating structures on the plate from the metallic film, and subsequently removing the metallic film, wherein the optical component comprises the patterned plate with the metallic film removed.

10. A microfabrication process according to claim 1 wherein one of said first and second grating structures is substantially circular.

11. A microfabrication process according to claim 1 wherein one of said first and second grating structures has a height that increases in a direction along its width and away from the other of said first and second grating structures.

12. A microfabrication process according to claim 1 wherein the projecting the light of substantially uniform intensity removes a record of edge distortion including non-uniformity of the first grating structure outside said first portions.

13. A microfabrication process according to claim 1 wherein first grating structure and the second grating structure are separated along the entire common arcuate border by a constant width.

14. A microfabrication process according to claim 1 wherein the first grating structure and the second grating structure are separated along the entire common arcuate border by 50 micrometers when the patterned substrate thickness is 0.6 millimeters and by 100 micrometers when the patterned substrate thickness is 1 millimeter.

15. A manufacturing process comprising using an optical component to make at least one further optical component, the optical component made using a microfabrication process comprising a patterning stage in which one or more first portions of a substrate's surface are patterned by at least:
coating at least a region of the substrate's surface in negative photoresist, said region encompassing said first portions, whereby the negative photoresist becomes undevelopable when exposed to light;
projecting light which forms a first grating structure over each of said first portions;
projecting light of substantially uniform intensity over the entirety of said region but for said first portions, thereby leaving the negative photoresist outside of said first portions undevelopable;
developing the negative photoresist so as to embody the first grating structure in the photoresist covering said first portions;
patterning the substrate's surface to impose the first grating structure on the substrate's surface from the developed photoresist, the undevelopable photoresist inhibiting patterning of the surface region outside of said first portions, wherein the optical component comprises the patterned substrate; and
following a first such patterning stage that forms the first grating structure with a second such patterning stage that patterns one or more second portions to form a second grating structure, the first grating structure and the second grating structure being separated by 50 to 100 micrometers along an entire common arcuate border between the first grating structure and the second grating structure.

16. A manufac

Assignees

• Microsoft Technology Licensing Llc

Inventors

• Kostamo Pasi

Classifications

• G01N33/60

  involving radioactive labelled substances · CPC title

• A61K51/04

  Organic compounds · CPC title

• A61K31/047 Primary

  having two or more hydroxy groups, e.g. sorbitol · CPC title

• A61K51/0491

  Sugars, nucleosides, nucleotides, oligonucleotides, nucleic acids, e.g. DNA, RNA, nucleic acid aptamers · CPC title

• G01N33/6896

  Neurological disorders, e.g. Alzheimer's disease · CPC title