Wiring substrate

US9826639B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9826639-B2
Application numberUS-201615351814-A
CountryUS
Kind codeB2
Filing dateNov 15, 2016
Priority dateDec 8, 2015
Publication dateNov 21, 2017
Grant dateNov 21, 2017

How to read this patent

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A wiring substrate includes an insulating layer, a first wiring layer and a second wiring layer on opposite sides of the insulating layer, and a via piercing through the first wiring layer and the insulating layer to electrically connect to the second wiring layer. The via includes an end portion projecting from a first surface of the first wiring layer facing away from the insulating layer. A surface of the end portion facing in the same direction as the first surface of the first wiring layer is depressed to be deeper in the center than in the periphery.

First claim

Opening claim text (preview).

What is claimed is: 1. A wiring substrate, comprising: an insulating layer; a first wiring layer and a second wiring layer on opposite sides of the insulating layer; and a via piercing through the first wiring layer and the insulating layer to electrically connect to the second wiring layer, the via including an end portion projecting from a first surface of the first wiring layer facing away from the insulating layer, wherein a surface of the end portion facing in a same direction as the first surface of the first wiring layer is depressed to be deeper in a center than in a periphery thereof. 2. The wiring substrate as claimed in claim 1 , wherein the via fills in a through hole piercing through the first wiring layer and the insulating layer, and the end portion extends onto the first surface of the first wiring layer around the through hole. 3. The wiring substrate as claimed in claim 1 , further comprising: a solder resist layer provided on the first surface of the first wiring layer, and including a plurality of openings that expose the first wiring layer and the end portion, wherein the first wiring layer and the end portion exposed in the plurality of openings define external connection pads. 4. The wiring substrate as claimed in claim 1 , further comprising: a solder resist layer provided on the first surface of the first wiring layer, and including an opening that exposes the first wiring layer, the solder resist layer covering the surface of the end portion, wherein the first wiring layer exposed in the opening defines an external connection pad. 5. The wiring substrate as claimed in claim 1 , wherein an edge of a part of the first wiring layer that contacts a sidewall of the via at a second surface of the first wiring layer opposite to the first surface projects toward the insulating layer relative to the second surface. 6. The wiring substrate as claimed in claim 1 , wherein an edge of a part of the first wiring layer that contacts a sidewall of the via at the first surface of the first wiring layer is rounded. 7. The wiring substrate as claimed in claim 1 , wherein the second wiring layer includes an external connection pad, and the via includes another end portion directly joined to the external connection pad. 8. The wiring substrate as claimed in claim 1 , wherein a plurality of mounting regions each for mounting an electronic component are arranged in a grid on the insulating layer, and each of the plurality of mounting regions includes the first wiring layer, a plurality of pads for mounting the electronic component included in the second wiring layer, and the via.

Assignees

Inventors

Classifications

  • Method for plating stud vias, i.e. massive vias formed by plating the bottom of a hole without plating on the walls · CPC title

  • Metallic balls · CPC title

  • Recess in conductor, e.g. in pad or in metallic substrate · CPC title

  • Metal filled via · CPC title

  • initial plating of through-holes in substrates having a metal pattern · CPC title

Patent family

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External sources

Frequently asked questions

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What does patent US9826639B2 cover?
A wiring substrate includes an insulating layer, a first wiring layer and a second wiring layer on opposite sides of the insulating layer, and a via piercing through the first wiring layer and the insulating layer to electrically connect to the second wiring layer. The via includes an end portion projecting from a first surface of the first wiring layer facing away from the insulating layer. A …
Who is the assignee on this patent?
Shinko Electric Ind Co
What technology area does this patent fall under?
Primary CPC classification H05K1/113. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Nov 21 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).