Underlayer composition and method of manufacturing a semiconductor device
US-2024369932-A1 · Nov 7, 2024 · US
Photoimageable compositions containing photobase generators
US9823565B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9823565-B2 |
| Application number | US-201615042220-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 12, 2016 |
| Priority date | Feb 18, 2015 |
| Publication date | Nov 21, 2017 |
| Grant date | Nov 21, 2017 |
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- Title
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- Abstract
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Abstract
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Embodiments in accordance with the present invention encompass negative-tone, solvent developable, self-imageable polymer compositions containing photobase generators which are useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays.
First claim
Opening claim text (preview).
What is claimed is: 1. A photoimageable solvent developable negative tone composition comprising: a) a polymer selected from the group consisting of: a copolymer containing repeating units derived from 5-phenethylbicyclo[2.2.1]hept-2-ene (PENB) and 2-(6-(bicyclo[2.2.1]hept-5-en-2-yl)hexyl)oxirane (EONB); a copolymer containing repeating units derived from 5-phenethylbicyclo[2.2.1]hept-2-ene (PENB) and 2-(4-(bicyclo[2.2.1]hept-5-en-2-yl)butyl)oxirane (EHNB); a copolymer containing repeating units derived from 5-benzylbicyclo[2.2.1]hept-2-ene (BenNB) and 2-(6-(bicyclo[2.2.1]hept-5-en-2-yl)hexyl)oxirane (EONB); and a copolymer containing repeating units derived from 5-benzylbicyclo[2.2.1]hept-2-ene (BenNB) and 2-(4-(bicyclo[2.2.1]hept-5-en-2-yl)butyl)oxirane (EHNB); b) a photobase generator of formula (II): where R 3 is (C 6 -C 10 )aryl(C 1 -C 6 )alkyl; and c) a carrier solvent. 2. The composition of claim 1 , wherein the polymer is selected from the group consisting of: a copolymer containing repeating units derived from 5-phenethylbicyclo[2.2.1]hept-2-ene (PENB) and 2-(6-(bicyclo[2.2.1]hept-5-en-2-yl)hexyl)oxirane (EONB); and a copolymer containing repeating units derived from 5-phenethylbicyclo[2.2.1]hept-2-ene (PENB) and 2-(4-(bicyclo[2.2.1]hept-5-en-2-yl)butyl)oxirane (EHNB). 3. The composition of claim 1 , wherein the polymer is selected from the group consisting of: a copolymer containing repeating units derived from 5-phenethylbicyclo[2.2.1]hept-2-ene (PENB) and 2-(6-(bicyclo[2.2.1]hept-5-en-2-yl)hexyl)oxirane (EONB); a copolymer containing repeating units derived from 5-phenethylbicyclo[2.2.1]hept-2-ene (PENB) and 2-(4-(bicyclo[2.2.1]hept-5-en-2-yl)butyl)oxirane (EHNB); and a copolymer containing repeating units derived from 5-benzylbicyclo[2.2.1]hept-2-ene (BenNB) and 2-(4-(bicyclo[2.2.1]hept-5-en-2-yl)butyl)oxirane (EHNB). 4. The composition of claim 1 , wherein the photobase generator is 1-(1-phenylethyl)octahydropyrrolo[1,2-a]pyrimidine. 5. A photoimageable solvent developable negative tone composition comprising: a) a copolymer containing repeating units derived from 5-phenethylbicyclo[2.2.1]hept-2-ene (PENB) and 2-(6-(bicyclo[2.2.1]hept-5-en-2-yl)hexyl)oxirane (EONB); b)1-(1-phenylethyl)octahydropyrrolo[1,2-a]pyrimidine; and c) a carrier solvent.
Assignees
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Classifications
with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors · CPC title
with perfluoro compounds, e.g. for dry lithography (G03F7/0048 takes precedence) · CPC title
the macromolecular compound being present in a chemically amplified negative photoresist composition · CPC title
- G03F7/038Primary
Macromolecular compounds which are rendered insoluble or differentially wettable (G03F7/075 takes precedence; macromolecular azides G03F7/012; macromolecular diazonium compounds G03F7/021) · CPC title
used as adhesion-promoting additives or as means to improve adhesion · CPC title
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Frequently asked questions
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- What does patent US9823565B2 cover?
- Embodiments in accordance with the present invention encompass negative-tone, solvent developable, self-imageable polymer compositions containing photobase generators which are useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays.
- Who is the assignee on this patent?
- Promerus Llc
- What technology area does this patent fall under?
- Primary CPC classification G03F7/038. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Nov 21 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).