Transparent vapor-deposited film

Patent metadata

Field	Value
Publication number	US-9822440-B2
Application number	US-201314429899-A
Country	US
Kind code	B2
Filing date	Sep 26, 2013
Priority date	Sep 28, 2012
Publication date	Nov 21, 2017
Grant date	Nov 21, 2017

Abstract

Employed is a roller-type continuous vapor-deposited film forming device in which a film-forming section and a preprocessing section provided with a plasma preprocessing device are arranged in series at a distance from each other. With a substrate transported at a high speed, plasma (P) is supplied to the substrate surface side while set to an electrically positive potential by a plasma preprocessing means for supplying the plasma toward the substrate (S) in a space enclosed in a preprocessing roller, and enclosed in a plasma supply means for supplying a plasma-forming gas and in a magnet ( 21 ), which is a magnetism formation means. An active preprocessed surface is formed on the surface of the substrate (S). An inorganic oxide vapor-deposited film having as a principal component thereof an aluminum oxide containing AL-C covalent bonds is immediately formed at high speed in succession on the preprocessed surface of the substrate to produce a highly adhesive transparent vapor-deposited film.

First claim

The invention claimed is:

1. A transparent laminated film comprising (a) a plastic substrate and (b) an inorganic oxide vapor-deposited film composed mainly of aluminum oxide formed on the surface of the plastic substrate, wherein the interface between the plastic substrate and the inorganic oxide vapor-deposited film comprises Al—C covalent bonds in an amount of between 0.3% and 30% of the total bonds that include C.

2. The transparent laminated film according to claim 1 , further comprising a gas barrier coating film on the surface of the vapor-deposited film, wherein a metal alkoxide hydrolyzable product and a water-soluble polymer mixed solution are coated onto the vapor-deposited film surface and heat-dried to produce the gas barrier coating film.

3. The transparent laminated film according to claim 1 or 2 , wherein the bonding strength between the plastic substrate and the vapor-deposited film is at least 3.0 N/15 millimeters based on measurement of the lamination strength after storage of the transparent laminated film for 500 hours in an environment of 60° C.×90% RH.

4. The transparent laminated film according to claim 1 or 2 , wherein the bonding strength between the plastic substrate and the vapor-deposited film is at least 3 N/15 mm based on measurement of the lamination strength after hot water treatment of the transparent laminated film at 121° C., 60 min.

5. The transparent laminated film according to claim 1 or 2 , wherein the amount of Al—C bonds is measured by X-ray photoelectron spectroscopy under conditions of X-ray source: AlKα, X-ray output: 120 W, and wherein the Al/O ratio of the inorganic oxide vapor-deposited film, measured within 3 nm of the vapor-deposited film from the interface, is no greater than 1.0.

6. The transparent laminated film according to claim 1 or 2 , wherein the transparent laminated film is formed by plasma preprocessing a surface of the plastic substrate in a voltage-applied state, and then continuously forming the inorganic oxide vapor-deposited film on the plasma preprocessed surface of the plastic substrate.

7. The transparent laminated film according to claim 6 , wherein the plasma preprocessing is plasma preprocessing using a roller-type continuous vapor-deposited film forming device comprising a preprocessing chamber, in which the surface of a plastic substrate to be provided with a vapor-deposited film is subjected to plasma processing, and a film-forming chamber in which the vapor-deposited film is formed, which are provided in a continuous manner, the plasma preprocessing being constructed such that there are situated a preprocessing roller and plasma supply means and magnetism forming means facing the preprocessing roller, the supplied plasma source gas is introduced as plasma near the substrate surface, with a gap being formed that traps the plasma, and plasma processing is carried out while holding in a voltage-applied state between the plasma preprocessing roller and the plasma supply means.

8. The transparent laminated film according to claim 6 , wherein the preprocessing by plasma is processing in which the surface of the plastic substrate on which the vapor-deposited film is to be provided is processing using a roller-type continuous vapor-deposited film forming device having a separated plasma preprocessing chamber and vapor-deposited film-forming chamber, under conditions with a plasma strength per unit area of 100-8000 W·sec/m 2 .

9. The transparent laminated film according to claim 6 , wherein the plasma source gas is argon alone, and/or a mixed gas with argon and one or more from among oxygen, nitrogen and carbon dioxide gas.

10. The transparent laminated film according to claim 9 , wherein the preprocessing with plasma is carried out using a plasma source gas comprising a mixed gas of argon and one or more from among oxygen, nitrogen and carbon dioxide gas.

11. The transparent laminated film according to claim 1 or 2 , wherein the means for forming the vapor-deposited film is physical vapor deposition.

12. The transparent laminated film according to claim 1 or 2 , wherein the inorganic oxide composed mainly of aluminum oxide further comprises a nitride or carbide of aluminum oxide, or a mixture thereof.

13. The transparent laminated film according to claim 1 or 2 , wherein the inorganic oxide is an inorganic oxide mixture of aluminum oxide with one or more selected from among silicon oxide, magnesium oxide, tin oxide and zinc oxide.

14. The transparent laminated film according to claim 1 or 2 , wherein an aluminum oxide vapor deposition layer is formed to a thickness of 5-100 nm on at least one surface of the plastic substrate.

15. The transparent laminated film according to claim 1 or 2 , further comprising a heat-sealable thermoplastic resin layered as an innermost layer via an adhesive layer.

16. The transparent laminated film according to claim 2 , wherein after forming a printed layer on the gas barrier coating film, a heat-sealable thermoplastic resin is layered as an innermost layer via an adhesive layer.

17. The transparent laminated film according to claim 15 , wherein the heat-sealable thermoplastic resin has a light-shielding property.

18. A packaging material comprising the transparent laminated film according to claim 15 , wherein the packaging material is subjected to boiling or retort sterilization.

19. A packaging material comprising the transparent laminated film according to claim 15 , wherein the packaging material packages a daily commodity selected from the group consisting of a shampoo, a rinse or rinse-in-shampoo, a cosmetic package, and liquid soup package.

Assignees

• Dainippon Printing Co Ltd

Inventors

• Matsui Shigeki
• Asuma Tatsuo
• Komuro Teruhisa
• Miyama Hiroshi
• Goto Takakazu
• Miyazaki Kaoru
• Matsuzaki Hiroshi

Classifications

• Y10T428/2826

  Synthetic resin or polymer · CPC title

• C23C14/081 Primary

  of aluminium, magnesium or beryllium · CPC title

• C23C14/562

  for coating elongated substrates · CPC title

• C23C14/021

  Cleaning or etching treatments · CPC title

• Y10T428/265

  1 mil or less · CPC title