Compound, resin, resist composition and method for producing resist pattern

Patent metadata

Field	Value
Publication number	US-9822060-B2
Application number	US-201514835383-A
Country	US
Kind code	B2
Filing date	Aug 25, 2015
Priority date	Aug 25, 2014
Publication date	Nov 21, 2017
Grant date	Nov 21, 2017

Abstract

A compound having a group represented by the formula (Ia):

wherein R 1 represents a C 1 to C 8 fluorinated alkyl group, R 2 represents a group having an optionally substituted C 5 to C 18 alicyclic hydrocarbon group, and * represents a binding site.

First claim

What is claimed is:

1. A resist composition comprising:
a resin having a structural unit derived from a compound having a group represented by formula (Ia):

wherein R 1 represents a C 1 to C 8 fluorinated alkyl group,
R 2 represents a group having an optionally substituted C 5 to C 18 alicyclic hydrocarbon group, and
* represents a binding site;
a resin having an acid-labile group; and
an acid generator.

2. A method for producing a resist pattern comprising steps (1) to (5);
(1) applying the resist composition according to claim 1 onto a substrate;
(2) drying the applied composition to form a composition layer;
(3) exposing the composition layer;
(4) heating the exposed composition layer, and
(5) developing the heated composition layer.

Assignees

• Sumitomo Chemical Co

Inventors

• Masuyama Tatsuro
• Yamamoto Satoshi
• Ichikawa Koji

Classifications

• C08F14/18

  Monomers containing fluorine · CPC title

• C07C2603/74

  Adamantanes · CPC title

• C07C2601/08

  the ring being saturated · CPC title

• C07C2601/14

  The ring being saturated · CPC title

• G03F7/2041

  in the presence of a fluid, e.g. immersion; using fluid cooling means · CPC title