Electroless metallization of through-holes and vias of substrates with tin-free ionic silver containing catalysts
US-2017342567-A1 · Nov 30, 2017 · US
US9822034B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9822034-B2 |
| Application number | US-201214116810-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 17, 2012 |
| Priority date | May 17, 2011 |
| Publication date | Nov 21, 2017 |
| Grant date | Nov 21, 2017 |
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The present invention discloses a method for electroless plating of a metal or metal alloy onto a metal or a metal alloy structure comprising a metal such as molybdenum or titanium and alloys containing such metals. The method comprises the steps of activation, treatment in an aqueous solution comprising at least one nitrogen-containing compound or a hydroxy carboxylic acid and electroless plating of a metal or metal alloy.
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The invention claimed is: 1. A method for electroless plating comprising in this order the steps of (i) providing a non-conductive substrate having on at least one side attached thereto a metal or metal alloy structure selected from the group consisting of molybdenum, titanium, zirconium, aluminium, chromium, tungsten, niobium, tantalum and alloys thereof, (ii) contacting said substrate with an activator comprising palladium ions, (iii) contacting said substrate with an aqueou…
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
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