Arc evaporation source

Patent metadata

Field	Value
Publication number	US-9818586-B2
Application number	US-201314397550-A
Country	US
Kind code	B2
Filing date	Jun 11, 2013
Priority date	Jun 20, 2012
Publication date	Nov 14, 2017
Grant date	Nov 14, 2017

Abstract

Provided is an arc evaporation source equipped with a target, a ring-shaped magnetic field guide magnet and a back side magnetic field generation source. The magnetic field guide magnet is aligned in a direction perpendicular to the evaporation face of the target and has a polarity that is the magnetization direction facing forward or backward. The back side magnetic field generation source is disposed at the rear of the magnetic field guide magnet, which is at the side of the back side of the target, and forms magnetic force lines running in the direction of magnetization of the magnetic field guide magnet. The target is disposed such that the evaporation face is positioned in front of the magnetic field guide magnet.

First claim

The invention claimed is:

1. An arc evaporation source in a film deposition device having means for supporting a substrate, comprising:
a disk shaped target having a front side evaporation face facing a substrate supported by the substrate supporting means at a front side of the target, the target further having a back side that is opposite and to the rear of the evaporation face in a direction perpendicular to the evaporation face,
a ring-shaped magnetic field guide magnet arranged entirely to the rear of the front side evaporation face of the target and having a polarity with a magnetization direction extending along the direction perpendicular to the evaporation face of the target, wherein an inner diameter of the ring-shaped magnetic field guide magnet is larger than an outer peripheral diameter of the disk shaped target, and
a back side magnetic field generation source arranged to the rear of the ring-shaped magnetic field guide magnet, and forming magnetic force lines extending along the magnetization direction of the ring-shaped magnetic field guide magnet,
wherein the back side magnetic field generation source includes a ring-shaped back side magnet having polarities at a radially inner peripheral face and a radially outer peripheral face, wherein a magnetization direction of the back side magnet by the polarities of the inner peripheral face and the outer peripheral face of the ring-shaped back side magnet is radially inward, and the magnetization direction of the ring-shaped magnetic field guide magnet faces the front side.

2. The arc evaporation source according to claim 1 , wherein a magnetization direction of the back side magnetic field generation source is the same as the magnetization direction of the ring-shaped magnetic field guide magnet.

3. The arc evaporation source according to claim 1 ,
wherein the back side magnetic field generation source forms magnetic force lines passing through a tunnel part or a duct part formed by an inner peripheral face of the ring-shaped magnetic field guide magnet, along the magnetization direction of the ring-shaped magnetic field guide magnet, and
wherein the target is arranged at a position so that the magnetic force lines passing through the evaporation face become parallel to an axis of the ring-shaped magnetic field guide magnet or inclined toward the axis.

4. The arc evaporation source according to claim 1 , wherein the back side magnetic field generation source includes a plurality of the ring-shaped back side magnets, and the plurality of ring-shaped back side magnets have polarities with the same magnetization direction and are coaxially arranged.

5. The arc evaporation source according to claim 4 , wherein a magnetic material penetrating through each back side magnet is provided at a radially inner side of the plurality of ring-shaped back side magnets, and an outer periphery of the magnetic material contacts the inner peripheral face of each back side magnet.

6. An arc evaporation source in a film deposition device having means for supporting a substrate, comprising:
a disk shaped target having a front side evaporation face facing a substrate supported by the substrate supporting means at a front side of the target, the target further having a back side that is opposite and to the rear of the evaporation face in a direction perpendicular to the evaporation face,
a ring-shaped magnetic field guide magnet arranged entirely to the rear of the front side evaporation face of the target and having a polarity with a magnetization direction extending along the direction perpendicular to the evaporation face of the target, wherein an inner diameter of the ring-shaped magnetic field guide magnet is larger than an outer peripheral diameter of the disk shaped target, and
a back side magnetic field generation source arranged to the rear of the ring-shaped magnetic field guide magnet, and forming magnetic force lines extending along the magnetization direction of the ring-shaped magnetic field guide magnet,
wherein the back side magnetic field generation source includes a first disk-shaped magnet and a second disk-shaped magnet having disk shapes and arranged at an interval, the first disk-shaped magnet and the second disk-shaped magnet each have polarities at disk-shaped faces with a magnetization direction from one of the disk-shaped faces to the other disk-shaped face and are arranged to have the same magnetization direction, the magnetization direction by the first disk-shaped magnet and the second disk-shaped magnet faces the front side and the magnetization direction of the ring-shaped magnetic field guide magnet faces the front side.

7. The arc evaporation source according to claim 6 , wherein a magnetic material is provided between the first disk-shaped magnet and the second disk-shaped magnet, the magnetic material contacting each disk-shaped magnet.

8. The arc evaporation source according to claim 1 , wherein the back side magnetic field generation source is an air-cored electro-magnetic coil, and the electro-magnetic coil has a polarity in the same direction as the direction of the polarity of the ring-shaped magnetic field guide magnet.

9. The arc evaporation source according to claim 8 , wherein a magnetic material is arranged in an air core portion of the electro-magnetic coil.

10. An arc evaporation source in a film deposition device having means for supporting a substrate, comprising:
a disk shaped target having a front side evaporation face facing a substrate supported by the substrate supporting means at a front side of the target, the target further having a back side that is opposite and to the rear of the evaporation face in a direction perpendicular to the evaporation face,
a ring-shaped magnetic field guide magnet arranged entirely to the rear of the front side evaporation face of the target and having a polarity with a magnetization direction extending along the direction perpendicular to the evaporation face of the target, wherein an inner diameter of the ring-shaped magnetic field guide magnet is larger than an outer peripheral diameter of the disk shaped target, and
a back side magnetic field generation source arranged to the rear of the ring-shaped magnetic field guide magnet, and forming magnetic force lines extending along the magnetization direction of the ring-shaped magnetic field guide magnet,
wherein the back side magnetic field generation source includes a ring-shaped back side magnet having polarities at a radially inner peripheral face and a radially outer peripheral face, wherein a magnetization direction of the back side magnet by the polarities of the inner peripheral face and the outer peripheral face of the ring-shaped back side magnet is radially outward, and the magnetization direction of the ring-shaped magnetic field guide magnet faces a rear side which is a side opposite the front side in the direction perpendicular to the evaporation face.

11. An arc evaporation source in a film deposition device having means for supporting a substrate, comprising:
a disk shaped target having a front side evaporation face facing a substrate supported by the substrate supporting means at a front side of the target, the target further having a back side that is opposite and to the rear of the evaporation face in a direction perpendicular to the evaporation face,
a ring-shaped magnetic field guide magnet arranged entirely to the rear of the front side evaporation face of the target and having a polarity with a magnetization direction extending along the direction perpendicular to the evaporation face of the target, wherein an inner diameter of the ring-shaped magnetic field guide magnet is larger than an outer peripheral

Assignees

• Kobe Steel Ltd

Inventors

• Tanifuji Shinichi
• Yamamoto Kenji

Classifications

• H01J37/34

  operating with cathodic sputtering (H01J37/36 takes precedence {; methods of cathodic sputtering C23C14/34}) · CPC title

• C23C14/24

  Vacuum evaporation · CPC title

• H01J37/345 Primary

  Magnet arrangements in particular for cathodic sputtering apparatus (material of magnets or magnets in general H01F1/00, H01F7/00) · CPC title

• C23C14/325

  Electric arc evaporation · CPC title

• H01J37/32055

  Arc discharge · CPC title