Image forming apparatus and image forming method to form an image based on image data including a pattern

US9817330B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9817330-B2
Application numberUS-201514730428-A
CountryUS
Kind codeB2
Filing dateJun 4, 2015
Priority dateJun 5, 2014
Publication dateNov 14, 2017
Grant dateNov 14, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An image forming apparatus forms an image by exposing an image bearer on the basis of image data including at least one predetermined pattern. The image forming apparatus includes a processing device that sets an exposure amount of a plurality of exposure pixels. The predetermined pattern is constituted by the plurality of exposure pixels, and a peripheral region of the predetermined pattern in the image data is constituted by a plurality of non-exposure pixels. The processing device sets an exposure amount of an exposure pixel in a specific region that is adjacent to a boundary between the predetermined pattern and the peripheral region and is constituted by at least one exposure pixel in the predetermined pattern, and an exposure amount of an exposure pixel in a region other than the specific region in the predetermined pattern to values different from each other.

First claim

Opening claim text (preview).

What is claimed is: 1. An image forming apparatus that forms an image by exposing an image bearer based on image data including a predetermined pattern, comprising: circuitry configured to: set an exposure amount of a plurality of exposure pixels, the predetermined pattern being constituted by the plurality of exposure pixels, and a peripheral region in the image data being constituted by a plurality of non-exposure pixels; set a first exposure amount of a first exposure pixel in a specific region that is adjacent to a boundary between the predetermined pattern and the peripheral region and is constituted by at least one exposure pixel of the predetermined pattern, and a second exposure amount of a second exposure pixel in a region other than the specific region in the predetermined pattern to values different from each other; and set the first exposure amount of the first exposure pixel in the specific region to be greater than the second exposure amount of the second exposure pixel in the region other than the specific region, wherein another predetermined pattern is arranged in a direction adjacent to the predetermined pattern at an apex of one exposure pixel of each of the predetermined pattern and the another predetermined pattern, and another region, which is constituted by the one exposure pixel of each of the predetermined pattern and the another predetermined pattern, is included in the specific region in the predetermined pattern. 2. The image forming apparatus according to claim 1 , wherein the specific region is a region that surrounds an entire perimeter of the region other than the specific region. 3. The image forming apparatus according to claim 1 , wherein when a total area of the predetermined pattern is equal to or less than a first reference area, the circuitry is configured to change a total exposure amount of the specific region to monotonically increase with respect to an increase in the total area. 4. The image forming apparatus according to claim 3 , wherein when the total area is equal to or less than a second reference area that is less than the first reference area, the circuitry is configured to set the total exposure amount of the specific region to be two or more times a total exposure amount of the region other than the specific region. 5. The image forming apparatus according to claim 1 , wherein a corner portion, which is constituted by at least one exposure pixel of each of the predetermined pattern and the another predetermined pattern, is included in the specific region in the predetermined pattern, and the circuitry is configured to set an exposure amount of an exposure pixel at the corner portion to be less than an exposure amount of an exposure pixel in the region other than the specific region. 6. The image forming apparatus according to claim 1 , wherein a width of the specific region equals a width of at least one pixel. 7. The image forming apparatus according to claim 1 , wherein a shape of the predetermined pattern is a square. 8. The image forming apparatus according to claim 1 , wherein the circuitry is configured to set, for the first exposure pixel in the specific region, a light amount exposing the image bearer to be greater and an exposure time exposing the image bearer to be shorter, compared to a case of exposing the second exposure pixel in the region other than the specific region. 9. The image forming apparatus according to claim 1 , wherein, when a total area of the predetermined pattern is equal to or less than a first reference area and greater than a second reference area, the circuitry is configured to change a total exposure amount of the specific region at a first rate with respect to an increase in the total area of the predetermined pattern, wherein, when the total area of the predetermined pattern is equal to or less than the second reference area, the circuitry is configured to change the total exposure amount of the specific region at a second rate with respect to the increase in the total area of the predetermined pattern, wherein the first rate is smaller than the second rate. 10. An image forming apparatus that forms an image by exposing an image bearer based on image data including a predetermined pattern, comprising: circuitry configured to: set an exposure amount of a plurality of exposure pixels, a peripheral region in the image data being constituted by the plurality of exposure pixels, and the predetermined pattern being constituted by a plurality of non-exposure pixels; set a first exposure amount of a first exposure pixel in a specific region that is adjacent to a boundary between the predetermined pattern and the peripheral region and is constituted by at least one exposure pixel of the peripheral region, and a second exposure amount of a second exposure pixel in a region other than the specific region in the peripheral region to values different from each other; and set the first exposure amount of the first exposure pixel in the specific region to be less than the second exposure amount of the second exposure pixel in the region other than the specific region, wherein another predetermined pattern is arranged in a direction adjacent to the predetermined pattern at an apex of one non-exposure pixel of each of the predetermined pattern and the another predetermined pattern, and another region, which is adjacent to the one non-exposure pixel of each of the predetermined pattern and the another predetermined pattern and which is constituted by the at least one exposure pixel of the peripheral region, is included in the specific region in the peripheral region. 11. The image forming apparatus according to claim 10 , wherein the specific region is a region that surrounds an entire perimeter of the predetermined pattern. 12. The image forming apparatus according to claim 10 , wherein when a total area of the predetermined pattern is equal to or less than a first reference area, the circuitry is configured to change a total exposure amount of the specific region to monotonically increase with respect to an increase in the total area. 13. The image forming apparatus according to claim 12 , wherein when the total area is equal to or less than a second reference area that is less than the first reference area, the circuitry is configured to set the total exposure amount of the specific region to be 0.8 or less times a total exposure amount of the region other than the specific region. 14. The image forming apparatus according to claim 10 , wherein an adjacent region, which is adjacent to a non-exposure pixel of a corner portion constituted by at least one non-exposure pixel of each of the predetermined pattern and the another predetermined pattern and is constituted by the at least one exposure pixel of the peripheral region, is included in the specific region, and the circuitry is configured to set an exposure amount of an exposure pixel in the adjacent region to be greater than an exposure amount of an exposure pixel in the region other than the specific region. 15. The image forming apparatus according to claim 10 , wherein a width of the specific region equals a width of at least one pixel. 16. The image forming apparatus according to claim 10 , wherein a shape of the predetermined pattern is a square. 17. The image forming apparatus according to claim 10 , wherein, when a total area of the predetermined pattern is equal to or less than a first reference area and greater than a second reference area, the circuitry is configured to change a total exposure amount of the specific region at a

Assignees

Inventors

Classifications

  • Charging or discharging distinct portions of the charge pattern on the recording material, e.g. discharging non-image areas or contrast enhancement (G03G13/34, G03G21/06 take precedence) · CPC title

  • characterised by selective application of radiation to a printing material or impression-transfer material · CPC title

  • and forming half-tone image · CPC title

  • with means for charging or discharging distinct portions of the charge pattern on the recording material, e.g. for contrast enhancement or discharging non-image areas (G03G15/36, G03G21/06 take precedence) · CPC title

  • G03G15/043Primary

    with means for controlling illumination or exposure (G03G15/041 takes precedence) · CPC title

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What does patent US9817330B2 cover?
An image forming apparatus forms an image by exposing an image bearer on the basis of image data including at least one predetermined pattern. The image forming apparatus includes a processing device that sets an exposure amount of a plurality of exposure pixels. The predetermined pattern is constituted by the plurality of exposure pixels, and a peripheral region of the predetermined pattern in…
Who is the assignee on this patent?
Tachibana Hiroto, Suhara Hiroyuki, Iio Masato, and 1 more
What technology area does this patent fall under?
Primary CPC classification G03G15/043. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Nov 14 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).