Nano imprinting with reusable polymer template with metallic or oxide coating

Patent metadata

Field	Value
Publication number	US-9816186-B2
Application number	US-201514922953-A
Country	US
Kind code	B2
Filing date	Oct 26, 2015
Priority date	Mar 15, 2013
Publication date	Nov 14, 2017
Grant date	Nov 14, 2017

Abstract

Methods and systems are provided for fabricating polymer-based imprint lithography templates having thin metallic or oxide coated patterning surfaces. Such templates show enhanced fluid spreading and filling (even in absence of purging gases), good release properties, and longevity of use. Methods and systems for fabricating oxide coated versions, in particular, can be performed under atmospheric pressure conditions, allowing for lower cost processing and enhanced throughput.

First claim

What is claimed is:

1. A system for forming an imprint lithography template comprising:
(a) a substrate support system configured to retain a flexible film substrate in a flat configuration and subsequently translate such retained flexible film substrate from a first position to a second position and from a third position to a fourth position;
(b) a fluid dispense system positioned proximate to the first position, the fluid dispense system configured to dispense polymerizable material onto the retained flexible substrate;
(c) a motion stage having a template chuck, the template chuck configured to retain a master template, the motion stage moveable between the first and second positions and further configured to translate a master template retained by the template chuck into superimposition with the retained flexible film substrate as the retained flexible film is translated from the first position to the second position;
(d) an imprint head configured to vary a distance between the master template and the retained flexible film substrate to define a volume therebetween that is filled by the polymerizable material;
(e) an energy source configured to provide curing energy to solidify the polymerizable material when the polymerizable material fills the volume between the master template and the retained flexible film substrate to define a patterned layer; and
(f) an atmospheric pressure plasma chemical vapor deposition (AP-CVD) system located between the third and fourth positions, the AP-CVD system including a power control unit, a plasma generation unit including opposing electrodes connected to the power control unit, the electrodes positioned in parallel with the substrate along a first direction, the AP-CVD configured to generate and deposit an oxide layer having a particular thickness onto the patterned layer as the retained flexible film substrate is translated from the third position to the fourth position, the retained flexible film substrate positioned between the opposing electrodes, the particular thickness of the oxide layer based on i) a type of material of the oxide layer and ii) a pattern of the patterned layer.

2. The system of claim 1 wherein the AP-CVD system further comprises an atmospheric pressure plasma dielectric barrier discharge (APDBD) system.

Assignees

• Molecular Imprints Inc

Inventors

• Ahn Se Hyun
• Choi Byung-Jin
• Xu Frank Y

Classifications

• B82Y40/00

  Manufacture or treatment of nanostructures · CPC title

• B82Y10/00

  Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic · CPC title

• B29C59/046

  for layered or coated substantially flat surfaces · CPC title

• C23C16/402

  Silicon dioxide · CPC title

• B29C59/14

  by plasma treatment {(plasma tubes per se H01J)} · CPC title