Ceramic electronic device, powder material, paste material, and manufacturing method of ceramic electronic device
US-12073996-B2 · Aug 27, 2024 · US
US9816160B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9816160-B2 |
| Application number | US-201315022320-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 19, 2013 |
| Priority date | Sep 19, 2013 |
| Publication date | Nov 14, 2017 |
| Grant date | Nov 14, 2017 |
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To provide a Ni ball having a low α dose and high sphericity even when it contains impurity elements other than Ni in certain amounts. The Ni ball contains an element U, a content thereof being 5 ppb or less, and an element Th, a content thereof being 5 ppb or less, wherein a purity of the Ni ball is 99.9% or more but 99.995% or less, an α dose thereof is 0.0200 cph/cm 2 or less, a content of either Pb or Bi, or a total content of both Pb and Bi is 1 ppm or more, and a sphericity thereof is 0.90 or more, in order to prevent any software errors and reduce connection failure.
Opening claim text (preview).
The invention claimed is: 1. An Ni ball comprising: an element U, a content thereof being 5 ppb or less; and an element Th, a content thereof being 5 ppb or less; wherein a purity of the Ni ball is 99.9% by mass or more but 99.995% by mass or less, an α dose thereof is 0.0200 cph/cm 2 or less, a content of either Pb or Bi, or a total content of both Pb and Bi is 1 ppm or more, and a sphericity thereof is 0.90 or more. 2. The Ni ball of claim 1 , wherein the α dose is 0.0020 cph/cm 2 or less. 3. The Ni ball of claim 1 , wherein the α dose is 0.0010 cph/cm 2 or less. 4. The Ni ball of claim 1 , wherein the diameter thereof is from 1 to 1000 μm. 5. Foam solder including the Ni ball of claim 1 , the Ni ball being dispersed in the solder. 6. Solder paste including the Ni ball of claim 1 . 7. An Ni core ball including the Ni ball of claim 1 , and solder plating coating the Ni ball. 8. The Ni core ball of claim 7 , wherein the α dose is 0.0200 cph/cm 2 or less. 9. The Ni core ball of claim 7 , wherein the α dose is 0.0020 cph/cm 2 or less. 10. The Ni core ball of claim 7 , wherein the α dose is 0.0010 cph/cm 2 or less. 11. Foam solder including the Ni core ball of claim 7 , the Ni core ball being dispersed in the solder. 12. Solder paste including the Ni core ball of claim 7 . 13. A solder joint including the Ni ball of claim 1 . 14. A solder joint including the Ni core ball of claim 7 . 15. The Ni ball of claim 2 , wherein the diameter thereof is from 1 to 1000 μm. 16. The Ni ball of claim 3 , wherein the diameter thereof is from 1 to 1000 μm. 17. Foam solder including the Ni ball of claim 2 , the Ni ball being dispersed in the solder. 18. Foam solder including the Ni ball of claim 3 , the Ni ball being dispersed in the solder. 19. Foam solder including the Ni core ball of claim 8 , the Ni core ball being dispersed in the solder. 20. Foam solder including the Ni core ball of claim 9 , the Ni core ball being dispersed in the solder.
Spherical particles · CPC title
Metallic particles coated with metal · CPC title
Metallic powder characterised by the size or surface area of the particles · CPC title
Low melting point metals, i.e. Zn, Pb, Sn, Cd, In, Ga · CPC title
Ni as the principal constituent · CPC title
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