Ni ball, Ni nuclear ball, solder joint, foam solder and solder paste

US9816160B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9816160-B2
Application numberUS-201315022320-A
CountryUS
Kind codeB2
Filing dateSep 19, 2013
Priority dateSep 19, 2013
Publication dateNov 14, 2017
Grant dateNov 14, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

To provide a Ni ball having a low α dose and high sphericity even when it contains impurity elements other than Ni in certain amounts. The Ni ball contains an element U, a content thereof being 5 ppb or less, and an element Th, a content thereof being 5 ppb or less, wherein a purity of the Ni ball is 99.9% or more but 99.995% or less, an α dose thereof is 0.0200 cph/cm 2 or less, a content of either Pb or Bi, or a total content of both Pb and Bi is 1 ppm or more, and a sphericity thereof is 0.90 or more, in order to prevent any software errors and reduce connection failure.

First claim

Opening claim text (preview).

The invention claimed is: 1. An Ni ball comprising: an element U, a content thereof being 5 ppb or less; and an element Th, a content thereof being 5 ppb or less; wherein a purity of the Ni ball is 99.9% by mass or more but 99.995% by mass or less, an α dose thereof is 0.0200 cph/cm 2 or less, a content of either Pb or Bi, or a total content of both Pb and Bi is 1 ppm or more, and a sphericity thereof is 0.90 or more. 2. The Ni ball of claim 1 , wherein the α dose is 0.0020 cph/cm 2 or less. 3. The Ni ball of claim 1 , wherein the α dose is 0.0010 cph/cm 2 or less. 4. The Ni ball of claim 1 , wherein the diameter thereof is from 1 to 1000 μm. 5. Foam solder including the Ni ball of claim 1 , the Ni ball being dispersed in the solder. 6. Solder paste including the Ni ball of claim 1 . 7. An Ni core ball including the Ni ball of claim 1 , and solder plating coating the Ni ball. 8. The Ni core ball of claim 7 , wherein the α dose is 0.0200 cph/cm 2 or less. 9. The Ni core ball of claim 7 , wherein the α dose is 0.0020 cph/cm 2 or less. 10. The Ni core ball of claim 7 , wherein the α dose is 0.0010 cph/cm 2 or less. 11. Foam solder including the Ni core ball of claim 7 , the Ni core ball being dispersed in the solder. 12. Solder paste including the Ni core ball of claim 7 . 13. A solder joint including the Ni ball of claim 1 . 14. A solder joint including the Ni core ball of claim 7 . 15. The Ni ball of claim 2 , wherein the diameter thereof is from 1 to 1000 μm. 16. The Ni ball of claim 3 , wherein the diameter thereof is from 1 to 1000 μm. 17. Foam solder including the Ni ball of claim 2 , the Ni ball being dispersed in the solder. 18. Foam solder including the Ni ball of claim 3 , the Ni ball being dispersed in the solder. 19. Foam solder including the Ni core ball of claim 8 , the Ni core ball being dispersed in the solder. 20. Foam solder including the Ni core ball of claim 9 , the Ni core ball being dispersed in the solder.

Assignees

Inventors

Classifications

  • Spherical particles · CPC title

  • Metallic particles coated with metal · CPC title

  • Metallic powder characterised by the size or surface area of the particles · CPC title

  • Low melting point metals, i.e. Zn, Pb, Sn, Cd, In, Ga · CPC title

  • Ni as the principal constituent · CPC title

Patent family

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Frequently asked questions

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What does patent US9816160B2 cover?
To provide a Ni ball having a low α dose and high sphericity even when it contains impurity elements other than Ni in certain amounts. The Ni ball contains an element U, a content thereof being 5 ppb or less, and an element Th, a content thereof being 5 ppb or less, wherein a purity of the Ni ball is 99.9% or more but 99.995% or less, an α dose thereof is 0.0200 cph/cm 2 or less, a content of …
Who is the assignee on this patent?
Senju Metal Industry Co
What technology area does this patent fall under?
Primary CPC classification C22C19/03. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Nov 14 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).