Charged particle source

Patent metadata

Field	Value
Publication number	US-9812283-B2
Application number	US-201715404440-A
Country	US
Kind code	B2
Filing date	Jan 12, 2017
Priority date	Dec 9, 2014
Publication date	Nov 7, 2017
Grant date	Nov 7, 2017

Abstract

This invention provides a charged particle source, which comprises an emitter and means of generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

First claim

What is claimed is:

1. An electron source, comprising:
an emitter, providing an electron beam along an optical axis;
an upper magnetic field generator, generating a first magnetic field;
a lower magnetic field generator, generating a second magnetic field; and
an anode, extracting the electron beam from the emitter,
wherein the first magnetic field superposed with the second magnetic field provides a magnetic field strength, wherein said magnetic field strength is zero at a tip of the emitter and increases along the optical axis to a local maximum immediately away from the tip between the tip and the anode.

2. The electron source according to claim 1 , further comprising a suppressing electrode around the emitter.

3. The electron source according to claim 2 , wherein the upper magnetic field generator is a permanent magnet attached to the suppressing electrode.

4. The electron source according to claim 2 , wherein the upper magnetic field generator is a first permanent magnet attached to the suppressing electrode and the lower magnetic field generator is a second permanent magnet below the emitter.

5. The electron source according to claim 3 , wherein the lower magnetic field generator comprises:
an excitation coil; and
a yoke, encompassing the excitation coil.

6. The electron source according to claim 1 , wherein the lower magnetic field generator is a permanent magnet below the emitter.

7. A method for providing an electron source, comprising:
emitting an electron beam along an optical axis from a tip of an emitter;
generating an upper magnetic field; and
generating a lower magnetic field, wherein the upper magnetic field superposed with the lower magnetic field has a magnetic field strength, wherein said magnetic field strength is zero at the tip and increases to a local maximum between the tip and an anode extracting the electron beam from the tip.

8. The electron source according to claim 6 , wherein the upper magnetic field generator comprises:
an excitation coil; and
a yoke, encompassing the excitation coil.

9. The electron source according to claim 1 , wherein the upper magnetic field generator comprises:
an excitation coil; and
a yoke, encompassing the excitation coil.

10. The electron source according to claim 1 , wherein the lower magnetic field generator comprises:
an excitation coil; and
a yoke, encompassing the excitation coil.

11. The electron source according to claim 1 , wherein
the upper magnetic field generator comprises:
a first excitation coil; and
a yoke, encompassing the first excitation coil, and

the lower magnetic field generator comprises:
a second excitation coil; and
a second yoke, encompassing the second excitation coil.

12. The method for providing an electron source according to claim 7 , wherein said step of generating an upper magnetic field is performed with a permanent magnet attached to a suppressing electrode around said emitter.

13. The method for providing an electron source according to claim 12 , wherein said step of generating a lower magnetic field is performed with an excitation coil.

14. The method for providing an electron source according to claim 7 , wherein said step of generating an upper magnetic field is performed with an excitation coil.

15. The method for providing an electron source according to claim 14 , wherein said step of generating a lower magnetic field is performed with a permanent magnet.

16. The method for providing an electron source according to claim 7 , wherein said step of generating an upper magnetic field is performed with a first permanent magnet attached to a suppressing electrode around said emitter, and said step of generating a lower magnetic field is performed with a second permanent magnet.

17. The method for providing an electron source according to claim 7 , wherein said step of generating an upper magnetic field is performed with a first excitation coil, and said step of generating a lower magnetic field is performed with a second excitation coil.

18. The method for providing an electron source according to claim 7 , wherein said step of generating a lower magnetic field is performed with a permanent magnet.

19. The method for providing an electron source according to claim 7 , wherein said step of generating a lower magnetic field is performed with an excitation coil.

Assignees

• Hermes Microvision Inc
• Hermes Microvision Inc

Inventors

• Li Shuai

Classifications

• H01J37/063

  Geometrical arrangement of electrodes for beam-forming · CPC title

• H01J2237/0653

  Intensity · CPC title

• H01J2237/2817

  Pattern inspection · CPC title

• H01J2237/141

  Coils · CPC title

• H01J2237/06308

  Thermionic sources · CPC title