Liquid feeding device and substrate treating device

US9811096B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9811096-B2
Application numberUS-201514939008-A
CountryUS
Kind codeB2
Filing dateNov 12, 2015
Priority dateMay 14, 2013
Publication dateNov 7, 2017
Grant dateNov 7, 2017

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A liquid feeding device that feeds a treatment liquid to a treating device and also recovers the treatment liquid for re-feeding, include feeding tanks having an exhaust passage and an overflow line, and can be switched to one of a feeding mode in which the treatment liquid is fed and a standby mode in which the feeding tank is on standby while accommodating the treatment liquid; a feeding mechanism that feeds the treatment liquid to the treating device from the feeding tank in the feeding mode among the plurality of feeding tanks; a recovery mechanism that recovers and returns the treatment liquid excessive in the treatment device to the feeding tank in the feeding mode; and an on-off mechanism provided in each of the plurality of feeding tanks to block the exhaust passage and the overflow line is provided.

First claim

Opening claim text (preview).

The invention claimed is: 1. A liquid feeding device that feeds a treatment liquid to a treating section and also recovers the treatment liquid for re-feeding, the device comprising: a plurality of feeding tanks that accommodate the treatment liquid, each including a closed container having an upper portion to which an exhaust passage is connected, and each switchable between a feeding mode in which the treatment liquid is fed and a standby mode in which the feeding tank is on standby while accommodating the treatment liquid; a feeding section configured to feed the treatment liquid to the feeding section from any one of the plurality of the feeding tanks in the feeding mode; a recovery section configured to recover and return excess treatment liquid in the treating section to any one of the plurality of the feeding tanks in the feeding mode; and an on-off valve device provided in each of the plurality of feeding tanks to block the exhaust passage, wherein the respective on-off valve device seals the exhaust passage of the respective feeding tank in the standby mode and opens the respective exhaust passage of the respective feeding tank in the feeding mode. 2. The liquid feeding device according to claim 1 , comprising, for at least one feeding tank, an overflow line connected to a side face of the closed container, and a liquid sealing vessel, and the liquid sealing vessel is connected to the overflow line on an entrance side and to an outside air side on an exit side, accommodates the treatment liquid or pure water as a liquid-sealed liquid, and includes a wall that partitions the liquid sealing vessel into the entrance side and the exit side by extending at least to a liquid surface of the liquid-sealed liquid from a ceiling side. 3. The liquid feeding device according to claim 2 , wherein the liquid sealing vessel is provided with a liquid level sensor and includes a liquid-sealed liquid replenishing section that replenishes the liquid-sealed liquid to the liquid vessel when the liquid-sealed liquid detected by the liquid level sensor falls below a predetermined liquid level. 4. The liquid feeding device according to claim 1 , wherein each of the plurality of the feeding tanks comprises a concentration sensor that measures a concentration of the treatment liquid and includes a treatment liquid replenishing section that feeds the treatment liquid to the feeding tank when the concentration thereof detected by the concentration sensor falls below a predetermined concentration. 5. A substrate treating device that treats a substrate with a treatment liquid, the device comprising: a rotation table removably holding the substrate and driven to rotate the substrate; a feeding nozzle arranged above the rotation table to feed the treatment liquid to the substrate; a plurality of feeding tanks that accommodate the treatment liquid, each including a closed container having an upper portion to which an exhaust passage is connected, and switchable between a feeding mode in which the treatment liquid is fed and a standby mode in which the feeding tank is on standby while accommodating the treatment liquid; a feeding section configured to feed the treatment liquid to the feeding nozzle from any one of the plurality of the feeding tanks in the feeding mode; a recovery section configured to recover and return excess treatment liquid fed by the feeding nozzle to the substrate to any one of the plurality of the feeding tanks in the feeding mode; and an on-off valve device provided in each of the plurality of feeding tanks to block the exhaust passage, wherein the respective on-off valve device seals the exhaust passage of the respective feeding tank in the standby mode and opens the respective exhaust passage of the respective feeding tank in the feeding mode. 6. The substrate treating device according to claim 5 , comprising, for at least one of the feeding tanks, an overflow line connected to a side face of the closed container, and a liquid sealing vessel, and the liquid sealing vessel is connected to the overflow line on an entrance side and to an outside air side on an exit side, accommodates the treatment liquid or pure water as a liquid-sealed liquid, and includes a wall that partitions the liquid sealing vessel into the entrance side and the exit side by extending at least to a liquid surface of the liquid-sealed liquid from a ceiling side. 7. The substrate treating device according to claim 6 , wherein the liquid sealing vessel is provided with a liquid level sensor and includes a liquid-sealed liquid replenishing section that replenishes the liquid-sealed liquid to the liquid sealing vessel when the liquid-sealed liquid detected by the liquid level sensor falls below a predetermined liquid level. 8. The substrate treating device according to claim 5 , wherein the recovery section comprises a recovery tank arranged below the rotation table. 9. The substrate treating device according to claim 5 , comprising, for each of the plurality of feeding tanks, a treatment liquid replenishing section that feeds the treatment liquid into the closed container, and a pure water replenishing sections that feeds pure water into the closed container. 10. The substrate treating device according to claim 5 , comprising, for each of the plurality of feeding tanks, a manometer that detects a pressure inside the closed container, and a control section that verifies airtightness inside the closed container based on a pressure value that the manometer detects when the treatment liquid and the pure water are fed under pressure from the treatment liquid replenishing section and the pure water replenishing section to the closed container while the on-off valve device seals the exhaust passage in the standby mode. 11. The substrate treating device according to claim 5 , wherein the recovery section recovers the treatment liquid used in the feeding nozzle to a recovery tank, and returns the treatment liquid to the respective feeding tank in the feeding mode when in the recovery tank a liquid surface of the treatment liquid detected by a liquid level sensor provided in the recovery tank reaches a predetermined level. 12. The substrate treating device according to claim 5 , comprising a feeding line communicating with the closed containers that constitutes the feeding section used when feeding the treatment liquid to the feeding nozzle and anindependent circulation line controllable to circulate the treatment liquid in the closed containers while the exhaust passage is sealed in the standby mode.

Assignees

Inventors

Classifications

  • using mainly spraying means, e.g. nozzles · CPC title

  • Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

  • Pressure or flow rate sensors · CPC title

  • G05D11/13Primary

    characterised by the use of electric means · CPC title

  • characterised by the use of electric means · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US9811096B2 cover?
A liquid feeding device that feeds a treatment liquid to a treating device and also recovers the treatment liquid for re-feeding, include feeding tanks having an exhaust passage and an overflow line, and can be switched to one of a feeding mode in which the treatment liquid is fed and a standby mode in which the feeding tank is on standby while accommodating the treatment liquid; a feeding mech…
Who is the assignee on this patent?
Shibaura Mechatronics Corp
What technology area does this patent fall under?
Primary CPC classification H10P72/0402. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Nov 07 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).