Method for producing a fiber having a pattern on the surface thereof

Patent metadata

Field	Value
Publication number	US-9810985-B2
Application number	US-201615167039-A
Country	US
Kind code	B2
Filing date	May 27, 2016
Priority date	Jun 4, 2015
Publication date	Nov 7, 2017
Grant date	Nov 7, 2017

Abstract

A method for producing a fiber having a pattern on a surface thereof. The fiber is produced by a method including forming a photosensitive composition layer on a template layer having a pattern, bonding a film including an adhesive layer on a principal plane onto the photosensitive composition layer, linearly exposing the photosensitive composition layer to light, separating an exposed laminate comprising the photosensitive composition layer, the adhesive layer, and the film from the template layer, and developing the photosensitive composition layer in the separated laminate.

First claim

What is claimed is:

1. A method for producing a fiber having a pattern on a surface thereof, the method comprising:
forming a photosensitive composition layer on a patterned template layer using a photosensitive composition;
bonding a film comprising an adhesive layer on a principal plane onto the photosensitive composition layer via the adhesive layer;
linearly exposing the photosensitive composition layer to light;
separating exposed laminate comprising the photosensitive composition layer, the adhesive layer, and the film from the patterned template layer; and
developing the photosensitive composition layer in the separated laminate.

2. The method according to claim 1 , wherein the photosensitive composition is a negative-type photosensitive composition.

3. The method according to claim 1 , wherein the patterned template layer is formed from a photosensitive composition.

4. The method according to claim 1 , further comprising separating the developed photosensitive composition layer from the film.

5. The method according to claim 1 , wherein the patterned template layer is on a substrate, and the exposed laminate comprising the photosensitive composition layer, the adhesive layer, and the film is separated from the patterned template layer and the substrate.

6. The method according to claim 1 , wherein the photosensitive composition layer comprises a negative-type photosensitive composition, and unexposed areas of the exposure are removed by the development while exposed areas are the fibers.

7. The method according to claim 1 , wherein the photosensitive composition layer comprises a positive-type photosensitive composition, and exposed areas of the exposure are removed by the development while unexposed areas are the fibers.

8. The method according to claim 1 , wherein the photosensitive composition layer is formed by applying a liquid photosensitive composition onto the patterned template layer.

9. The method according to claim 1 , further comprising forming the patterned template layer by a method selected from the group consisting of methods (a) to (e) below:
(a) applying the photosensitive composition onto the substrate to form a coating film that is processed by photolithography to obtain the patterned template layer;
(b) applying the photosensitive composition onto the substrate to form a coating film, pressing a pressing mold having a shape corresponding to a pattern shape of the patterned template layer against the coating film, followed by exposing the coating film pressed by the pressing mold to light to cure the coating film to obtain the patterned template layer;
(c) forming a thin film of a material having a glass transition temperature on the substrate, pressing a pressing mold having a shape corresponding to a pattern shape of the patterned template layer against the thin film in such a state that the formed thin film has been heated at or above the glass transition temperature, thereby deforming the thin film, followed by cooling the deformed thin film to obtain the patterned template layer;
(d) forming an etching mask having a shape corresponding to a pattern shape of the patterned template layer on the substrate, followed by engraving a pattern on a surface of the substrate by etching to obtain the substrate having a patterned surface as the template layer; and
(e) forming a thin film of a block copolymer composed of at least two block chains different from each other in surface free energy on the substrate, and obtaining the patterned template layer by self-organizing lithography in which the block copolymer is subjected to microphase separation.

Assignees

• Tokyo Ohka Kogyo Co Ltd

Inventors

• Senzaki Takahiro

Classifications

• D01D5/253 Primary

  with a non-circular cross section; Spinnerette packs therefor (D01D5/38 takes precedence) · CPC title

• G03F7/32

  Liquid compositions therefor, e.g. developers · CPC title

• B82Y10/00

  Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic · CPC title

• B82Y40/00

  Manufacture or treatment of nanostructures · CPC title

• G03F7/20

  Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) · CPC title