Methods and apparatus for applying adhesives in patterns to an advancing substrate

US9808827B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9808827-B2
Application numberUS-201614993154-A
CountryUS
Kind codeB2
Filing dateJan 12, 2016
Priority dateNov 27, 2012
Publication dateNov 7, 2017
Grant dateNov 7, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Aspects of the methods and apparatuses herein involve applying fluids onto an advancing substrate. The apparatuses and methods herein may provide for the application of viscous fluids, such as adhesives, in pre-determined patterns to an advancing substrate. The fluid application apparatus may include a slot die applicator and a substrate carrier. The slot die applicator may include a slot opening, a first lip, and a second lip, the slot opening located between the first lip and the second lip. And the substrate carrier may be adapted to advance the substrate past the slot die applicator as the slot die applicator discharges adhesive onto the substrate. In operation, when a first surface of the substrate is disposed on the substrate carrier, the substrate carrier advances a second surface of the substrate past the slot opening of the slot die applicator.

First claim

Opening claim text (preview).

What is claimed is: 1. An apparatus for applying a fluid in a pattern to an advancing substrate, the substrate having an unconstrained caliper, Hs, and having a first surface disposed opposite of a second surface, the apparatus comprising: a slot die applicator including a slot opening, a first lip, and a second lip, the slot opening located between the first lip and the second lip; a substrate carrier adapted to advance the substrate past the slot die applicator, wherein when the first surface of the substrate is disposed on the substrate carrier, the substrate carrier is adapted to advance the second surface of the substrate past the slot opening of the slot die applicator, the substrate carrier comprising: a non-compliant support surface; and a compliant pattern element, wherein the compliant pattern element includes a pattern surface, and wherein the compliant pattern element protrudes outward relative to the non-compliant support surface to define a first minimum distance, R 1 , between the pattern surface and the non-compliant support surface; a base surface, wherein the pattern element protrudes outward from the base surface to define a distance Hp between the pattern surface and the base surface; and a compliant layer of material between the pattern element and the non-compliant support surface, and wherein the compliant layer of material defines the base surface; wherein the substrate carrier is positioned adjacent the slot die applicator to define a minimum distance, Hg, between the pattern surface of the pattern element and the first lip and the second lip that is less than the unconstrained caliper, Hs, of the substrate; wherein as the substrate carrier advances the second surface of the substrate past the slot opening, the compliant pattern element is advanced such that the pattern surface repeatedly advances past the first lip, the slot opening, and the second lip of the slot die applicator; and wherein the pattern surface is deflected away from the slot die applicator as the pattern surface advances along the first lip, the slot opening, and the second lip of the slot die applicator to define a second minimum distance, R 2 , between the pattern surface and the non-compliant support surface, such that R 2 is less than R 1 . 2. An apparatus for applying a fluid in a pattern to an advancing substrate, the substrate having an unconstrained caliper, Hs, and having a first surface disposed opposite of a second surface, the apparatus comprising: a slot die applicator including a slot opening, a first lip, and a second lip, the slot opening located between the first lip and the second lip; a substrate carrier adapted to advance the substrate past the slot die applicator, wherein when the first surface of the substrate is disposed on the substrate carrier, the substrate carrier is adapted to advance the second surface of the substrate past the slot opening of the slot die applicator, the substrate carrier comprising: a non-compliant support surface; and a compliant pattern element, wherein the compliant pattern element includes a pattern surface, and wherein the compliant pattern element protrudes outward relative to the non-compliant support surface to define a first minimum distance, R 1 , between the pattern surface and the non-compliant support surface; a base surface, wherein the pattern element protrudes outward from the base surface to define a distance, Hp, between the pattern surface and the base surface; and wherein the base surface comprises a continuous surface and wherein a plurality of discrete pattern elements are separated from each other by the continuous surface; wherein the substrate carrier is positioned adjacent the slot die applicator to define a minimum distance, Hg, between the pattern surface of the pattern element and the first lip and the second lip that is less than the unconstrained caliper, Hs, of the substrate; wherein as the substrate carrier advances the second surface of the substrate past the slot opening, the compliant pattern element is advanced such that the pattern surface repeatedly advances past the first lip, the slot opening, and the second lip of the slot die applicator; and wherein the pattern surface is deflected away from the slot die applicator as the pattern surface advances along the first lip, the slot opening, and the second lip of the slot die applicator to define a second minimum distance, R 2 , between the pattern surface and the non-compliant support surface, such that R 2 is less than R 1 . 3. The apparatus of claim 1 , wherein the substrate carrier comprises a roller. 4. The apparatus of claim 3 , the roller comprises a base roll having an outer circumferential surface that defines the non-compliant support surface, and wherein the base roll is adapted to rotate about an axis of rotation. 5. The apparatus of claim 4 , wherein the compliant pattern element protrudes radially outward from the center of axis of rotation. 6. The apparatus of claim 5 , further comprising a base layer of compliant material extending radially outward from the non-compliant support surface to define a base surface, and wherein the compliant pattern element includes a proximal end portion and a distal end portion, wherein the proximal end portion is connected with base surface, the pattern element extending radially outward from the base surface to the distal end portion. 7. The apparatus of claim 1 , wherein the substrate carrier comprises an endless belt.

Assignees

Inventors

Classifications

  • having elastic ribbons fixed thereto; Devices for applying the ribbons · CPC title

  • Coating heads with slot-shaped outlet (B05C5/0283 takes precedence) · CPC title

  • Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves · CPC title

  • Details thereof, e.g. surface characteristics · CPC title

  • only at particular parts of the articles (at particular part of web, band, strip, belt or ribbon B05C5/025) · CPC title

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What does patent US9808827B2 cover?
Aspects of the methods and apparatuses herein involve applying fluids onto an advancing substrate. The apparatuses and methods herein may provide for the application of viscous fluids, such as adhesives, in pre-determined patterns to an advancing substrate. The fluid application apparatus may include a slot die applicator and a substrate carrier. The slot die applicator may include a slot openi…
Who is the assignee on this patent?
Procter & Gamble
What technology area does this patent fall under?
Primary CPC classification A61F13/531. Mapped technology areas include Human Necessities.
When was this patent published?
Publication date Tue Nov 07 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).