Branched siloxanes and methods for synthesis

Patent metadata

Field	Value
Publication number	US-9802968-B2
Application number	US-201615232138-A
Country	US
Kind code	B2
Filing date	Aug 9, 2016
Priority date	Feb 19, 2010
Publication date	Oct 31, 2017
Grant date	Oct 31, 2017

Abstract

The present invention describes branched and functionalized siloxanes and methods for making such compounds. The compounds have a variety of uses. One preferred application is as novel planarizing material for lithogaphy, in which case functionalized branched siloxane, such as an epoxy-modified branched siloxane is particularly useful.

First claim

The invention claimed is:

1. A method of reverse-tone step and flash imprint lithography comprising:
a) providing a substrate;
b) imprinting features upon said substrate;
c) planarizing using a functionalized branched siloxane having the structure:

to create a layer over the features;
d) etching said layer with fluorine; and
e) etching with O 2 .

2. The method of claim 1 , wherein said features in step b) are imprinted by a quartz template mold.

3. The method of claim 1 , wherein said substrate in step a) is coated with an underlayer prior to step b).

4. The method of claim 1 , wherein said layer created in step c) further includes a photoacid generator.

5. The method of claim 4 , wherein said photoacid generator has the structure:

6. The method of claim 1 , wherein said imprinting of step b) is performed with imprint resist comprising:

7. A method of reverse-tone step and flash imprint lithography comprising:
a) providing a substrate;
b) coating said substrate with an underlayer;
c) applying an imprint resist on said underlayer;
d) imprinting features on said imprint resist with a template mold;
e) planarizing using a branched and functionalized siloxane having the structure:

to create a layer over the features;
f) etching said layer with fluorine; and
g) etching with O 2 .

8. The method of claim 7 , wherein said layer created in step e) further includes a photoacid generator.

9. The method of claim 8 , wherein said photoacid generator has the structure:

10. The A-method of claim 7 , wherein said imprint resist used in step c):

Assignees

• Univ Texas

Inventors

• Willson C Grant
• Ogawa Tsuyoshi
• Jacobsson Michael B

Classifications

• H10P95/064

  the removal being chemical etching · CPC title

• C07F7/0879 Primary

  Hydrosilylation reactions · CPC title

• C07D303/12

  with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms · CPC title

• C07F7/0874

  Reactions involving a bond of the Si-O-Si linkage · CPC title

• C07F7/0896

  Compounds with a Si-H linkage · CPC title