Ultrashort laser pulse wafer scribing
US-9221124-B2 · Dec 29, 2015 · US
US9802855B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9802855-B2 |
| Application number | US-201514972352-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 17, 2015 |
| Priority date | Nov 30, 2010 |
| Publication date | Oct 31, 2017 |
| Grant date | Oct 31, 2017 |
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A method of fabricating a high-density array of holes in glass is provided, comprising providing a glass piece having a front surface, then irradiating the front surface of the glass piece with a UV laser beam focused to a focal point within +/−100 μm of the front surface of the glass piece most desirably within +/−50 μm of the front surface. The lens focusing the laser has a numerical aperture desirably in the range of from 0.1 to 0.4, more desirably in the range of from 0.1 to 0.15 for glass thickness between 0.3 mm and 0.63 mm, even more desirably in the range of from 0.12 to 0.13, so as to produce open holes extending into the glass piece 100 from the front surface 102 of the glass piece, the holes having an diameter the in range of from 5 to 15 μm, and an aspect ratio of at least 20:1. For thinner glass, in the range of from 0.1-0.3 mm, the numerical aperture is desirably from 0.25 to 0.4, more desirably from 0.25 to 0.3, and the beam is preferably focused to within +/−30 μm of the front surface of the glass. The laser is desirable operated at a repetition rate of about 15 kHz or below. An array of holes thus produced may then be enlarged by etching. The front surface may be polished prior to etching, if desired.
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What is claimed is: 1. A method of fabricating a high-density array of holes in glass, the method comprising: providing a glass piece having a front surface; irradiating the front surface of the glass piece with a UV laser beam, the beam being focused by a lens within +/−100 um of the front surface of the glass piece so as to produce open holes extending into the glass piece from the front surface of the glass piece, the holes having an diameter the in range of from 5 to 15 μm, and an aspect ratio of at least 20:1. 2. The method according to claim 1 , wherein irradiating comprises using a laser beam with a wavelength in the range of from 200-400 nm. 3. The method according to claim 1 , wherein irradiating comprises using a laser beam with a wavelength in the range of from 300-400 nm. 4. The method according to claim 3 , wherein the near-UV laser used in the irradiating step is operated at 355 micrometer wavelength, plus or minus 5 micrometers. 5. The method according to claim 1 , wherein a numerical aperture of the lens used in the irradiating step is within the range of from 0.1 to 0.15 for glass having a thickness in the range of 0.3 to 0.63 mm. 6. The method according to claim 1 , wherein a numerical aperture of the lens is within the range of from 0.25 to 0.4 for glass having a thickness in the range of 0.1-0.3 mm. 7. The method according claim 1 , wherein the laser is operated during the irradiating step at repetition rate in the range of from 5 to 50 kHz. 8. The method according to claim 7 , wherein the laser is operated during the irradiating step at repetition rate in the range of from 10 to 20 kHz. 9. The method according to claim 8 , wherein the laser is operated during the irradiating step at repetition rate in the range of from 12-18 kHz. 10. The method according to claim 1 , wherein the step of irradiating comprises irradiating the front surface of the glass piece with a UV laser beam for a duration in the range of from 8 to 150 milliseconds per hole. 11. The method according to claim 1 , wherein the step of irradiating comprises irradiating the front surface of the glass piece with a UV laser beam for a duration in the range of about 10 milliseconds per hole for glass having a thickness of about 0.1 mm. 12. The method according to claim 1 , wherein the step of irradiating comprises irradiating the front surface of the glass piece with a UV laser beam for a duration of about 10 milliseconds per 1/10 mm of glass thickness. 13. The method according to claim 1 , wherein the piece of glass is a glass sheet, and wherein the step of irradiating comprises irradiating the front surface of the glass sheet with a UV laser beam for a duration determined by experiment or calculation to be that duration which will cause the resulting hole to extend just up to a back surface of the glass sheet. 14. The method according to claim 1 , wherein the step of irradiating comprises irradiating the front surface of the piece of glass with a UV laser beam for a duration determined by experiment or calculation to be that duration which will cause the resulting hole to extend up to a location within the piece of glass. 15. The method according claim 1 , wherein the step of irradiating comprises irradiating with a laser beam having other than circular shape. 16. The method according to claim 1 , wherein the step of irradiating comprises irradiating with a laser beam oriented at an angle other than 90 degrees to the front surface of the piece of glass. 17. The method according to claim 1 , wherein the method further comprises etching the glass piece in acid. 18. The method according to claim 17 , wherein the step of etching in acid further comprises etching in an acid blend. 19. The method according to claim 18 , wherein the acid blend comprises a solution of 20% HF+10% HNO 3 . 20. The method according to claim 1 , further comprising, after irradiating and before etching, polishing the front surface of the glass piece.
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