Orientation control layer formed on a free top surface of a first block copolymer from a mixture of first and second block copolymers

Patent metadata

Field	Value
Publication number	US-9802400-B2
Application number	US-201313925061-A
Country	US
Kind code	B2
Filing date	Jun 24, 2013
Priority date	Jun 24, 2013
Publication date	Oct 31, 2017
Grant date	Oct 31, 2017

Abstract

Disclosed herein is a method comprising disposing a first composition comprising a first block copolymer upon a substrate; where the first block copolymer comprises a first segment and a second segment that are covalently bonded to each other and that are chemically different from each other; where the first segment has a first surface free energy and where the second segment has a second surface free energy; and disposing a second composition comprising an second copolymer upon a free surface of the first block copolymer; where the second copolymer comprises a surface free energy reducing moiety; where the surface free energy reducing moiety has a lower surface free energy than the first surface free energy and the second surface free energy; the second copolymer further comprising one or more moieties having an affinity to the first block copolymer; where the surface free energy reducing moiety is chemically different from the first segment and from the second segment.

First claim

What is claimed is:

1. A method comprising:
disposing a first composition comprising a first block copolymer and a second copolymer upon a substrate; where the first block copolymer comprises a first segment and a second segment that are covalently bonded to each other and that are chemically different from each other; where the first segment has a first surface free energy and where the second segment has a second surface free energy; and
where the second copolymer comprises a surface free energy reducing moiety; where the surface free energy reducing moiety has a lower surface free energy than the first surface free energy and the second surface free energy; the second copolymer further comprising one or more moieties having an affinity to the first block copolymer; where the surface free energy reducing moiety is chemically different from the first segment and from the second segment; and where the second copolymer contacts the top free surface of the first block copolymer.

2. The method of claim 1 , where the second copolymer is operative to form an orientation control layer on a surface of the composition and to facilitate formation of microdomains in the first block copolymer that are perpendicular to a surface of the substrate that the composition is disposed on.

3. The method of claim 1 , where the surface free energy reducing moiety is covalently bonded to a plurality of the same monomers that comprise the first segment and/or to the same monomers that comprise the second segment.

4. The method of claim 1 , where the second copolymer comprises a blend of copolymers, each of which comprises a surface free energy reducing moiety that is covalently bonded to a plurality of the same monomers that comprise the first segment and/or to the same monomers that comprise the second segment.

5. The method of claim 1 , where the first composition further comprises a solvent that is immiscible with the first block copolymer.

6. The method of claim 1 , further comprising an annealing step.

7. The method of claim 2 , further comprising removing the orientation control layer to expose the underlying block copolymer.

8. The method of claim 7 , further comprising selectively removing portions of the block copolymer to form a patterned resist layer.

Assignees

• Dow Global Technologies Llc
• Rohm & Haas Elect Mat

Inventors

• Trefonas Iii Peter
• Wang Deyan
• Sharma Rahul
• Hustad Phillip D
• Li Mingqi

Classifications

• C08L53/00

  Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers · CPC title

• B32B27/08

  of synthetic resin · CPC title

• G03F7/0002

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title

• B05D7/52

  Two layers · CPC title

• B05D1/185 Primary

  applying monomolecular layers (B05D1/204 takes precedence) · CPC title