Field effect transistor (FET) structure with integrated gate connected diodes

US9799645B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9799645-B2
Application numberUS-201514947197-A
CountryUS
Kind codeB2
Filing dateNov 20, 2015
Priority dateNov 20, 2015
Publication dateOct 24, 2017
Grant dateOct 24, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A structure having: a plurality of field effect transistors (FETs) connected between a common input and a common output, each one of the field effect transistors comprises: a source region, a drain region, and a gate electrode for controlling carriers through a channel region of a transistor region of the structure between the source region and the drain region; a plurality of diodes, each one of the diodes being associated with a corresponding one of the plurality of FETs, each one of the diodes having an electrode in Schottky contact with a diode region of the corresponding one of the FETs. The gate electrode and the diode electrode extend along parallel lines. The source region, the drain region, the channel region, and a diode region having therein the diode are disposed along a common line.

First claim

Opening claim text (preview).

What is claimed is: 1. A structure, comprising: a plurality of field effect transistors (FETs) connected between a common input and a common output, each one of the field effect transistors comprises: a source region, a drain region, and a gate electrode for controlling carriers through a channel region of a transistor region of the structure between the source region and the drain region; a plurality of diodes, each one of the diodes being associated with a corresponding one of the plurality of FETs, each one of the diodes having an electrode in Schottky contact with a diode region of the corresponding one of the FETs; wherein each one of the diodes has an electrode in Schottky contact with a diode region of the structure; and wherein the gate electrode and a diode electrode extend along parallel lines. 2. A structure, comprising: a plurality of field effect transistors (FETs) connected between a common input and a common output, each one of the field effect transistors comprises: a source region, a drain region, and a gate electrode for controlling carriers through a channel region of a transistor region of the structure between the source region and the drain region; a plurality of diodes, each one of the diodes being associated with a corresponding one of the plurality of FETs, each one of the diodes having an electrode in Schottky contact with a diode region of the corresponding one of the FETs; and wherein the source region, the drain region, the channel region, and the diode region are disposed along a common line. 3. The structure recited in claim 2 wherein the gate electrode and the diode electrode extend along parallel lines and wherein the common line is perpendicular to the parallel lines. 4. A structure, comprising: a plurality of field effect transistors (FETs) connected between a common input and a common output, each one of the field effect transistors comprises: a source region, a drain region, and a gate electrode for controlling carriers through a channel region of a transistor region of the structure between the source region and the drain region; a plurality of diodes, each one of the diodes being associated with a corresponding one of the plurality of FETs, each one of the diodes having an electrode in Schottky contact with a diode region of the corresponding one of the FETs; wherein each one of the diodes is disposed proximate to the corresponding one of the FETs; and wherein the source region, the drain region, the channel region, and the diode region are disposed along a common line. 5. A structure, comprising: a plurality of field effect transistors (FETs) connected between a common input and a common output, each one of the field effect transistors comprises: a source region, a drain region, and a gate electrode for controlling carriers through a channel region of a transistor region of the structure between the source region and the drain region; a plurality of diodes, each one of the diodes being associated with a corresponding one of the plurality of FETs, each one of the diodes having an electrode in Schottky contact with a diode region of the corresponding one of the FETs, each one of the plurality of diodes providing a non-linear capacitance versus gate region to source region voltage at the gate region.

Assignees

Inventors

Classifications

  • A circuit being added at the input of an amplifier to adapt the input impedance of the amplifier · CPC title

  • A diode being coupled in a feedback path of an amplifier stage, e.g. active or passive diode · CPC title

  • in field-effect transistor amplifiers · CPC title

  • the amplifier stage being a common source configuration MOSFET · CPC title

  • using the nonlinearity inherent to components, e.g. a diode · CPC title

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What does patent US9799645B2 cover?
A structure having: a plurality of field effect transistors (FETs) connected between a common input and a common output, each one of the field effect transistors comprises: a source region, a drain region, and a gate electrode for controlling carriers through a channel region of a transistor region of the structure between the source region and the drain region; a plurality of diodes, each one …
Who is the assignee on this patent?
Raytheon Co
What technology area does this patent fall under?
Primary CPC classification H01L27/0629. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Oct 24 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).