Semiconductor Device and a Method for Manufacturing a Semiconductor Device Having a Semi-Insulating Region
US-2015014815-A1 · Jan 15, 2015 · US
US9799554B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9799554-B2 |
| Application number | US-201615093834-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 8, 2016 |
| Priority date | Apr 8, 2015 |
| Publication date | Oct 24, 2017 |
| Grant date | Oct 24, 2017 |
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A method for coating substrates provided with vias uses a first step in which the substrate is conditioned and a second step in which the substrate is coated with an electrically insulating material such that the vias are filled up completely.
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The invention claimed is: 1. A method for coating a substrate provided with vias, wherein the following steps are carried out: the substrate is conditioned to improve flowability of an electrically insulating material to be filled into the vias; the substrate is coated with the electrically insulating material such that the vias are filled up completely with the electrically insulating material in such a way that the electrically insulating material has as a flat surface, wherein the vias connect electrically conductive structures on a first side of the substrate to electrically conductive structures arranged on a second side of the substrate. 2. The method of claim 1 wherein said conditioning step takes place at atmospheric pressure. 3. The method of claim 1 wherein said substrate is plasma-treated to condition it. 4. The method of claim 1 wherein said substrate is oxidised to condition it. 5. The method of claim 1 wherein a solvent is applied to the substrate to condition it. 6. The method of claim 5 wherein said substrate is subjected to a combination of a plasma-treatment and an application of a solvent. 7. The method of claim 5 wherein said substrate is subjected to a combination of an oxidation-treatment and an application of a solvent. 8. The method of claim 5 wherein said solvent is applied by spin-coating. 9. The method of claim 5 wherein said substrate provided with said solvent is introduced into a vacuum chamber, a pressure in said vacuum chamber being reduced, and said vacuum chamber being ventilated again after a holding time. 10. The method of claim 9 wherein said pressure in the vacuum chamber is reduced by 0.1 to 0.9 bar from an atmospheric pressure. 11. The method of claim 9 wherein said holding time is approximately 10 s to 60 s. 12. The method of claim 9 wherein said substrate is heated in said vacuum chamber. 13. The method of claim 12 wherein said substrate is heated to a temperature of >30° C. 14. The method of claim 5 wherein after said solvent has been applied, said substrate is transported into a different chamber, said substrate being coated within said different chamber with said electrically insulating material. 15. The method of claim 1 wherein said electrically insulating material is applied by spin-coating. 16. The method of claim 1 wherein said electrically insulating material is at least one of a dielectric, a resist and an epoxy resin. 17. The method of claim 1 wherein said electrically insulating material is cured after being applied. 18. A method for coating a substrate provided with vias, wherein the following steps are carried out: the substrate is conditioned to improve flowability of an electrically insulating material to be filled into the vias by applying a solvent to the substrate; the substrate is coated with an electrically insulating material such that the vias are filled up completely with the electrically insulating material in such a way that the electrically insulating material has as a flat surface, wherein the vias connect electrically conductive structures on a first side of the substrate to electrically conductive structures arranged on a second side of the substrate. 19. A method for coating a substrate provided with vias, wherein the following steps are carried out: the substrate is conditioned to improve flowability of an electrically insulating material to be filled into the vias by applying a solvent to the substrate; the substrate is coated with an electrically insulating material such that the vias are filled up completely with the electrically insulating material in such a way that the electrically insulating material has as a flat surface, wherein the vias connect electrically conductive structures on a first side of the substrate to electrically conductive structures arranged on a second side of the substrate, and wherein said substrate provided with said solvent is introduced into a vacuum chamber, a pressure in said vacuum chamber being reduced, and said vacuum chamber being ventilated again after a holding time.
Apparatus for applying a liquid, a resin, an ink or the like · CPC title
by exposure to a plasma · CPC title
by exposure to a liquid · CPC title
Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating · CPC title
carbon-based polymeric organic materials, e.g. polyimides, poly cyclobutene or PVC · CPC title
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