Charged particle source

Patent metadata

Field	Value
Publication number	US-9799484-B2
Application number	US-201514964221-A
Country	US
Kind code	B2
Filing date	Dec 9, 2015
Priority date	Dec 9, 2014
Publication date	Oct 24, 2017
Grant date	Oct 24, 2017

Abstract

This invention provides a charged particle source, which comprises an emitter and means of generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

First claim

What is claimed is:

1. A charged particle source, comprising:
an emitter, providing a charged particle beam;
an extraction electrode, extracting charged particles away from the emitter; and
a means for providing a magnetic field having a magnetic field strength, wherein the magnetic field strength is zero at a tip of the emitter, and the magnetic field strength increases to a local maximum after the tip and before the extraction electrode along an optical axis of the charged particle beam.

2. The charged particle source according to claim 1 , wherein said charged particle source is an electron source.

3. The charged particle source according to claim 1 , wherein the extraction electrode is disposed below a top surface of a lower magnetic lens of the means for providing the magnetic field.

4. A charged particle source, comprising:
a charged particle emitter;
an extraction electrode, extracting a charged particle beam from a tip of the charged particle emitter; and
a magnetic field generator, positioned to provide a magnetic field having a magnetic field strength, wherein said magnetic field strength is zero at said tip and said magnetic field strength is a local maximum before the extraction electrode along an optical axis of the charged particle beam.

5. The charged particle source of claim 4 , wherein said charged particle emitter is a cathode electron source.

6. The charged particle source of claim 4 , further comprising a suppressor electrode disposed radially around said charged particle emitter and coaxial with said charged particle beam, wherein said suppressor electrode and said charged particle beam have a first electric polarity.

7. The charged particle source according to claim 4 , wherein the extraction electrode is disposed below a top surface of a magnetic lens of the means for providing the magnetic field.

Assignees

• Hermes Microvision Inc
• Hermes Microvision Inc

Inventors

• Li Shuai

Classifications

• H01J37/14

  magnetic · CPC title

• H01J2237/0653

  Intensity · CPC title

• H01J3/20

  Magnetic lenses · CPC title

• H01J2237/0453

  multiple apertures · CPC title

• H01J37/063

  Geometrical arrangement of electrodes for beam-forming · CPC title