Production process monitoring system and control method therefor

Patent metadata

Field	Value
Publication number	US-9798304-B2
Application number	US-201114353181-A
Country	US
Kind code	B2
Filing date	Oct 28, 2011
Priority date	Oct 28, 2011
Publication date	Oct 24, 2017
Grant date	Oct 24, 2017

Abstract

A production process monitoring system is used to monitor a set of production parameters in a production process of a plurality of production units that perform parallel production operation. The production units comprise at least one reference production unit and at least one distribution production unit. The reference production unit comprises a first sensor, a second sensor, and a reference control unit. The distribution production unit comprises a second sensor and a distribution controller. The first and second sensors of the reference production unit is configured to monitor a first and second parameters in the production parameters in the reference production unit and output a first and second signals corresponding to the first and second parameters. The second sensor of the distribution production unit is configured to monitor the second parameter in the distribution production unit and output a second parameter distribution signal corresponding to the second parameter.

First claim

The invention claimed is:

1. A production process monitoring system for monitoring a set of production parameters in a production process of a plurality of production units which perform in a parallel production operation to culture algae in the production units, said production units comprising at least one reference production unit and at least one distribution production unit, the production process monitoring system comprising:
a first sensor and a second sensor installed on said at least one reference production unit, the first sensor being configured to monitor a first parameter in the set of production parameters in the at least one reference production unit and output a first signal corresponding to the first parameter of the at least one reference production unit, and the second sensor being configured to monitor a second parameter in the at least one reference production unit and output a second parameter reference signal corresponding to the second parameter of the at least one reference production unit;
a reference control unit installed on said at least one reference production unit, said reference control unit being configured to receive a set value and the first signal, and being configured to output a first control amount for controlling the first parameter in the at least one reference production unit to the at least one reference production unit according to the set value and the first signal;
a further second sensor installed on said at least one distribution production unit, said further second sensor being configured to monitor a second parameter in the at least one distribution production unit and output a second parameter distribution signal corresponding to the second parameter of the at least one distribution production unit; and
a distribution controller installed on said at least one distribution production unit, said distribution controller being configured to receive an input signal comprising the first control amount, the second parameter reference signal and the second parameter distribution signal being configured to output a distribution control amount to the at least one distribution production unit, and being configured to control a ratio of the distribution control amount to the first control amount to change said ratio of the distribution control amount to the first control amount according to a ratio of the second parameter distribution signal to the second parameter reference signal.

2. The monitoring system of claim 1 , wherein the at least one reference production unit further comprises:
at least one correction production unit having a further first sensor and another second sensor, wherein the further first sensor of the at least one correction production unit is further configured to monitor a first parameter in the at least one correction production unit and output a third signal corresponding to the first parameter, and wherein the other second sensor of the at least one correction production unit is further configured to monitor a second parameter in the at least one correction production unit and output a second parameter correction signal corresponding to the second parameter, and
wherein the monitoring system further comprises:
a correction unit configured to output a correction signal according to the received third signal and the set value; and
a correction controller configured to output a correction control amount to the at least one correction production unit according to the correction signal, the first control amount, the second parameter reference signal and the second parameter correction signal, and further configured to control a ratio of the correction control amount to the first control amount to change said ratio of the correction control amount to the first control amount according to a ratio of the second parameter correction signal to the second parameter reference signal.

3. The monitoring system of claim 2 , wherein a computational formula of the correction control amount (C C ) is in accordance with the following relationship:
C C =( K m ×S 2C /S 2S )× C 1 ; and

a computational formula of the distribution control amount (C D ) is in accordance with the following relationship:
C D =( K m ×S 2D /S 2S )× C 1 ,

where K m represents the correction signal, S 2C represents the second parameter correction signal, S 2S represents the second parameter reference signal, S 2D represents the second parameter distribution signal, and C 1 represents the first control amount.

4. The monitoring system of claim 1 , wherein the reference control unit comprises:
a reference comparator configured to output a first difference signal of the difference between the set value and the received first signal; and
a reference controller configured to determine the first control amount based on the first difference signal.

5. The monitoring system of claim 2 , wherein the correction unit comprises:
a correction comparator configured to output a third difference signal of the difference between the set value and the third signal; and
a corrector configured to determine the correction control amount based on the third difference signal.

6. The monitoring system of claim 3 , wherein a computational formula of the correction signal (K m ) is in accordance with the following relationship:

K
m

=

K

m
-
1

+

K
C

⁡

(

(

e
m

-

e

m
-
1

)

+

Δ
⁢

⁢
t

τ
I

⁢

e
m

)

,

where subscript ‘m’ represents the m th control loop in which the monitoring system is located, Δt represents control cycle, ‘e’ is the difference between the set value and the third difference signal, and K C and τ 1 are set constants that are dependent on the correction production unit.

7. The monitoring system of claim 1 , wherein the production proc

Assignees

• Fan Shun Jie
• Meng Xian Tao
• Siemens Ag

Inventors

• Fan Shun Jie
• Meng Xian Tao

Classifications

• C12M41/26

  of pH · CPC title

• C12M41/34

  of gas · CPC title

• G05B15/02 Primary

  electric · CPC title

• C12M41/36

  of biomass, e.g. colony counters or by turbidity measurements (electrooptical investigation of individual particles G01N15/14, flow cytometers G01N15/1404) · CPC title

• C12M41/48 Primary

  Automatic or computerized control (automatic analysis G01N35/00) · CPC title