Holding device, method of determining attraction abnormality in holding device, lithography apparatus, and method of manufacturing article
US-2024393682-A1 · Nov 28, 2024 · US
Multiple copolymer systems as templates for block copolymer nanolithography
US9798232B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9798232-B2 |
| Application number | US-201414516626-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 17, 2014 |
| Priority date | Nov 7, 2013 |
| Publication date | Oct 24, 2017 |
| Grant date | Oct 24, 2017 |
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- Title
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- Abstract
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Abstract
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Methods are generally provided for preparing a polymeric composition that includes a grafted block copolymer. Methods are also generally provided for preparing a polymeric composition that includes a star block copolymer prepared from a central core molecule that includes a plurality of attachment moieties. Methods are also generally provided for preparing a polymeric composition that includes a linear block copolymer. Block copolymers are also generally provided. Multi-segmented linear block copolymers are also generally provided.
First claim
Opening claim text (preview).
What is claimed: 1. A block copolymer, comprising: a central core molecule covalently attached to a plurality of side chains, wherein each side chain comprises an A-B block copolymer, wherein the A-B block copolymer includes a first block comprising styrene and a second block comprising polyethylene oxide, wherein the A-B block copolymer comprises greater than 90% of the volume fraction of the block copolymer. 2. The block copolymer of claim 1 , wherein the central core molecule is a backbone polymer. 3. The block copolymer of claim 1 , wherein the side chains form a non-covalent linkage with other side chains to form a polymeric composition. 4. The block copolymer of claim 3 , wherein the non-covalent linkages comprise hydrogen bonding, ionic bonding, ion pairing, or metal-ligand interactions.
Assignees
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Classifications
acyclic · CPC title
Ring opening metathesis polymerisation [ROMP] · CPC title
- G03F7/0002Primary
Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title
Atom Transfer Radical Polymerization [ATRP] or reverse ATRP · CPC title
block · CPC title
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Frequently asked questions
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- What does patent US9798232B2 cover?
- Methods are generally provided for preparing a polymeric composition that includes a grafted block copolymer. Methods are also generally provided for preparing a polymeric composition that includes a star block copolymer prepared from a central core molecule that includes a plurality of attachment moieties. Methods are also generally provided for preparing a polymeric composition that includes …
- Who is the assignee on this patent?
- Tang Chuanbing, Hardy Christopher G, Nese Alper, and 2 more
- What technology area does this patent fall under?
- Primary CPC classification G03F7/0002. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Oct 24 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).