Nozzle geometry for organic vapor jet printing

US9797039B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9797039-B2
Application numberUS-201414569129-A
CountryUS
Kind codeB2
Filing dateDec 12, 2014
Priority dateMar 25, 2009
Publication dateOct 24, 2017
Grant dateOct 24, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A first device is provided. The device includes a print head. The print head further includes a first nozzle hermetically sealed to a first source of gas. The first nozzle has an aperture having a smallest dimension of 0.5 to 500 microns in a direction perpendicular to a flow direction of the first nozzle. At a distance from the aperture into the first nozzle that is 5 times the smallest dimension of the aperture of the first nozzle, the smallest dimension perpendicular to the flow direction is at least twice the smallest dimension of the aperture of the first nozzle.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method, comprising: providing a first device, the first device comprising: a print head, further comprising a first nozzle hermetically sealed to a first source of gas and a second nozzle hermetically sealed to a second source of gas different from the first source of gas; wherein the first nozzle has an aperture having a smallest dimension of 0.5 to 500 microns in a direction perpendicular to a flow direction of the first nozzle; wherein the second nozzle has an aperture having a smallest dimension of 0.5 to 500 microns in a direction perpendicular to a flow direction of the second nozzle; wherein, at a distance from the aperture into the first nozzle that is 5 times the smallest dimension of the aperture of the first nozzle, the smallest dimension perpendicular to the flow direction is at least twice the smallest dimension of the aperture of the first nozzle; wherein, at a distance from the aperture into the second nozzle that is 5 times the smallest dimension of the aperture into the second nozzle, the smallest dimension perpendicular to the flow direction is at least twice the smallest dimension of the aperture of the second nozzle; wherein the gas provided by the first source of gas includes a first organic material having a first sublimation temperature; and wherein the gas provided by the second source of gas includes a second organic material having a second sublimation temperature at least 10 degrees Celsius different from the sublimation temperature of the first organic material; maintaining different and independently controllable temperatures at the print head, the first source, of gas, and the second source of gas; and ejecting a jet of gas from the first nozzle. 2. The method of claim 1 further comprising: ejecting a jet of gas from the second nozzle. 3. The method of claim 1 , wherein the first device further comprises a third nozzle hermetically sealed to a third source of gas different from the first and second source of gas; wherein the third nozzle has an aperture having a smallest dimension of 0.5 to 500 microns in a direction perpendicular to a flow direction of the third nozzle; wherein, at a distance from the aperture into the third nozzle that is 5 times the smallest dimension of the aperture into the third nozzle, the smallest dimension perpendicular to the flow direction is at least twice the smallest dimension of the aperture of the third nozzle. 4. The method of claim 3 further comprising: ejecting a jet of gas from the third nozzle. 5. The method of claim 1 further comprising: mixing multiple organic sources to form the first gas source. 6. The method of claim 1 further comprising: continuously varying a mixture of gasses to form the first gas source. 7. The method of claim 1 , wherein the first nozzle has a constant cross section from the aperture to a distance from the aperture into the first nozzle that is 2 times the smallest dimension of the aperture of the first nozzle. 8. The method of claim 1 , wherein the smallest dimension of the first nozzle in a direction perpendicular to a flow direction of the first nozzle continuously increases with distance from the aperture of the first nozzle for distances in the range of zero to 2 times the smallest dimension of the aperture of the first nozzle. 9. The method of claim 1 , wherein the smallest dimension of the first nozzle in a direction perpendicular to a flow direction of the first nozzle increases linearly with distance from the aperture of the first nozzle for distances in the range of zero to 2 times the smallest dimension of the aperture of the first nozzle. 10. The method of claim 1 , wherein the first nozzle is formed from a metal or a ceramic. 11. The method of claim 1 , wherein the first nozzle is formed of silicon. 12. The method of claim 1 , wherein the first nozzle has an aperture having a smallest dimension of 100 to 500 microns in a direction perpendicular to a flow direction of the first nozzle. 13. The method of claim 1 , wherein the first nozzle has an aperture having a smallest dimension of 20 to 100 microns in a direction perpendicular to a flow direction of the first nozzle. 14. The method of claim 1 , wherein the first nozzle has an aperture having a smallest dimension of 0.5 to 20 microns in a direction perpendicular to a flow direction of the first nozzle. 15. The method of claim 1 , wherein the cross section of the first nozzle perpendicular to the flow direction of the first nozzle is circular. 16. The method of claim 1 , wherein the cross section of the first nozzle perpendicular to the flow direction of the first nozzle is rectangular. 17. The method of claim 1 , wherein the aperture is formed in a protrusion from the print head. 18. A display manufactured according to the method of claim 1 .

Assignees

Inventors

Classifications

  • C23C14/12Primary

    Organic material · CPC title

  • Gas flow assisted PVD deposition · CPC title

  • Controlling or regulating the coating process · CPC title

  • characterised by bringing liquid or particles selectively into contact with a printing material (printing by selective application of impact or pressure on a printing or impression-transfer material B41J2/22) · CPC title

  • C23C14/04Primary

    Coating on selected surface areas, e.g. using masks · CPC title

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What does patent US9797039B2 cover?
A first device is provided. The device includes a print head. The print head further includes a first nozzle hermetically sealed to a first source of gas. The first nozzle has an aperture having a smallest dimension of 0.5 to 500 microns in a direction perpendicular to a flow direction of the first nozzle. At a distance from the aperture into the first nozzle that is 5 times the smallest dimens…
Who is the assignee on this patent?
Univ Michigan Regents
What technology area does this patent fall under?
Primary CPC classification C23C14/12. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Oct 24 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).