Refractory object and process of forming a glass sheet using the refractory object
US-9249043-B2 · Feb 2, 2016 · US
US9796630B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9796630-B2 |
| Application number | US-201514873427-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 2, 2015 |
| Priority date | Mar 30, 2011 |
| Publication date | Oct 24, 2017 |
| Grant date | Oct 24, 2017 |
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A refractory object can include at least 10 wt % Al 2 O 3 . Further, the refractory object may contain less than approximately 6 wt % SiO 2 or may include a dopant that includes an oxide of Ti, Mg, Ta, Nb, or any combination thereof. In an embodiment, at least approximately 1% of the Al 2 O 3 in the refractory object can be provided as reactive Al 2 O 3 . In another embodiment, the refractory object may have a density of at least approximately 3.55 g/cc, a corrosion rate of no greater than approximately 2.69 mm/year, or any combination of the foregoing. In a particular embodiment, the refractory object can be used to form an Al—Si—Mg glass sheet. In an embodiment, the refractory object may be formed by a process using a compound of Ti, Mg, Ta, Nb, or any combination thereof.
Opening claim text (preview).
What is claimed is: 1. A refractory object used in forming a glass object, the refractory object comprising: at least 95 wt % Al 2 O 3 ; less than 0.009 wt % of SiO 2 ; less than 1.5 wt % TiO 2 ; a dopant including at least 0.5 wt % Nb 2 O 5 ; a porosity no greater than 9.0 vol %; and a corrosion rate no greater than 2.69 mm/year at an operating temperature of 1150° C. and a molten glass velocity of 27 cm/min. 2. The refractory object according to claim 1 , wherein the glass object is in a form of a glass sheet. 3. The refractory object according to claim 2 , wherein the glass sheet has a thickness of at least 20 μm. 4. The refractory object according to claim 2 , wherein the glass sheet has a thickness no greater than 5 mm. 5. The refractory object according to claim 4 , wherein the glass sheet has a width of at least 0.2 m. 6. The refractory object according to claim 2 , wherein the glass object includes an alkali glass. 7. The refractory object according to claim 1 , wherein the refractory object has a density of at least 3.55 g/cc. 8. The refractory object of claim 1 , wherein a content of the dopant is no greater than 5 wt %. 9. The refractory object of claim 1 , wherein at least 1% of the Al 2 O 3 in the refractory object is provided as reactive Al 2 O 3 . 10. The refractory object of claim 1 , wherein no greater than 99% of the Al 2 O 3 in the refractory object is provided as reactive Al 2 O 3 . 11. The refractory object of claim 1 , wherein the corrosion rate is no greater than 1.6 mm/year at an operating temperature of 1150° C. and a molten glass velocity of 27 cm/min. 12. The refractory object of claim 1 , wherein the porosity is at least 0.05 vol %. 13. The refractory object of claim 1 , wherein the refractory object has a porosity no greater than 9.0 vol %. 14. The refractory object of claim 1 , wherein the refractory object has a length of at least 0.5 m. 15. A refractory object used in forming a glass object, the refractory object comprising: at least 95 wt % Al 2 O 3 ; less than 0.05 wt % of SiO 2 ; less than 1.5 wt % TiO 2 ; at least 0.2 wt % of an oxide of Ta; a density of no greater than 3.9 g/cc. 16. The refractory object of claim 15 , wherein the refractory object has a porosity no greater than 9.0 vol %. 17. The refractory object of claim 15 , wherein at least 1% of the Al 2 O 3 in the refractory object is provided as reactive Al 2 O 3 . 18. The refractory object of claim 15 , wherein no greater than 99% of the Al 2 O 3 in the refractory object is provided as reactive Al 2 O 3 .
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