Medical ablation system and method of use
US-9592085-B2 · Mar 14, 2017 · US
US9795434B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9795434-B2 |
| Application number | US-201715418495-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 27, 2017 |
| Priority date | Sep 28, 2011 |
| Publication date | Oct 24, 2017 |
| Grant date | Oct 24, 2017 |
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A probe for ablating tissue comprises an electrosurgical working end configured to provide a first plasma about a first surface location and a second plasma about a second surface location, the first plasma having first ablation parameters and the second plasma having second ablation parameters. The probe has a working end with a thickness below 3 mm and produces a low temperature plasma.
Opening claim text (preview).
What is claimed is: 1. A method for ablating tissue, said method comprising: providing an electrosurgical probe having a working end with an opening and a gap; generating a plasma at at least one of said opening and said gap, wherein a plasma generated at the gap will have a temperature of 80° C. or below and a plasma generated at the opening will have a temperature of 100° C. or above; generating the plasma at said gap and projecting the plasma generated at the gap outwardly through the gap; and wherein the gap is sufficiently fluid-tight to prevent liquid flow therethrough but permit propagation of the plasma generated at the gap therethrough. 2. A method as in claim 1 wherein the gap is an annular gap formed in a dielectric body configured for the outflow of the plasma. 3. A method as in claim 2 wherein the opening is an aperture configured for the inflow of plasma. 4. A method as in claim 2 , further comprising positioning an electrode relative to the opening to control generation of plasma. 5. A method as in claim 1 wherein generating the plasma at said gap comprises producing RF current to gas flowing through the gap. 6. A method as in claim 5 wherein the RF current is generated by first and second electrodes disposed upstream of the gap. 7. A method as in claim 6 wherein the RF current is generated by a third electrode exposed to a surface near the gap. 8. A method as in claim 1 wherein the plasma generated at the gap will have a temperature of less than 70° C., 60° C., or 50° C. 9. A method as in claim 1 wherein a thickness of the working end is less than 3.0 mm, less than 2.5 mm, or less than 2.0 mm. 10. A method as in claim 1 wherein the electrosurgical probe comprises an interior chamber having the gap. 11. A method as in claim 10 further comprising coupling the interior chamber with one or more of a positive pressure source, a pressurized fluid source, or a negative pressure source. 12. A method as in claim 1 further comprising rotating the working end about an introducer of the electrosurgical probe, the introducer being coupled to the working end. 13. A method as in claim 1 further comprising flexing a distal flex portion of an introducer of the electrosurgical probe, the introducer being coupled to the working end. 14. A method as in claim 13 wherein the distal flex portion is flexed in at least one plane relative to an axis of the electrosurgical probe. 15. A method as in claim 1 further comprising locking a distal flex portion of an introducer of the electrosurgical probe from flexing. 16. A method as in claim 1 wherein the working end comprises a dielectric or non-conductive body, the dielectric or non-conductive body comprising a polymeric or ceramic material. 17. A method as in claim 1 further comprising providing an observable indicator to indicate a plasma-on or a plasma-off condition. 18. A method as in claim 17 wherein the observable indicator comprises one or more of a window exposed to the plasma at an interior of the working end or a thermochromic element exposed to the plasma at an interior of the working end.
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