Semiconductor light-emitting device

US9793436B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9793436-B2
Application numberUS-201615332730-A
CountryUS
Kind codeB2
Filing dateOct 24, 2016
Priority dateJan 16, 2015
Publication dateOct 17, 2017
Grant dateOct 17, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A semiconductor light-emitting device comprises an epitaxial structure for emitting a light and comprises an edge, a first portion and a second portion surrounding the first portion, wherein a concentration of a doping material in the second portion is higher than that of the doping material in the first portion, a main light-extraction surface on the epitaxial structure and comprises a first light-extraction region corresponding to the first portion and a second light-extraction region corresponding to the second portion and an edge, wherein the second portion is between the edge and the first portion.

First claim

Opening claim text (preview).

What is claimed is: 1. A semiconductor light-emitting device comprising: an epitaxial structure for emitting a light and comprises an edge, a first portion and a second portion surrounding the first portion, wherein a concentration of a doping material in the second portion is higher than that of the doping material in the first portion; and a main light-extraction surface on the epitaxial structure and comprises a first light-extraction region corresponding to the first portion and a second light-extraction region corresponding to the second portion; wherein the second portion is between the edge and the first portion. 2. The semiconductor light-emitting device according to claim 1 , wherein, as the light passes through the main light-extraction surface, a near-field luminous intensity in the first light-extraction region is larger than a near-field luminous intensity in the second light-extraction region. 3. The semiconductor light-emitting device according to claim 1 , wherein the epitaxial structure comprising a first semiconductor stack, a second semiconductor stack, and an active layer between the first semiconductor stack and the second semiconductor stack for emitting the light, and the main light-extraction surface is on the first semiconductor stack. 4. The semiconductor light-emitting device according to claim 2 , wherein the main light-extraction surface further comprises a maximum near-field luminous intensity, and the near-field luminous intensity distributing in the first light-extraction region is between 70% and 100% of the maximum near-field luminous intensity, the near-field luminous intensity distributing in the second light-extraction region is between 0% and 70% of the maximum near-field luminous intensity, and a ratio of an area of the first light-extraction region to an area of the second light-extraction region is between 0.25 and 0.45. 5. The semiconductor light-emitting device according to claim 3 , wherein the epitaxial structure further comprises a lower surface opposite to the main light-extraction surface, and a side surface connecting the lower surface and the main light-extraction surface. 6. The semiconductor light-emitting device according to claim 5 , wherein the second portion surrounds the first portion and exposes on the side surface. 7. The semiconductor light-emitting device according to claim 5 , wherein the epitaxial structure further comprises a control layer, and the second portion is between the control layer and the lower surface. 8. The semiconductor light-emitting device according to claim 1 , wherein the doping material comprises Zn, Te or Sb. 9. The semiconductor light-emitting device according to claim 8 , wherein the concentration of the doping material in the second portion decreases along a direction from the lower surface to the control layer. 10. The semiconductor light-emitting device according to claim 3 , wherein an area of the first semiconductor stack is the same as an area of the second semiconductor stack. 11. The semiconductor light-emitting device according to claim 1 , wherein the second light-extraction region is between the first light-extraction region and the edge. 12. The semiconductor light-emitting device according to claim 1 , wherein a shape of the first light-extraction region is the same as a shape of the main light-extraction surface. 13. The semiconductor light-emitting device according to claim 1 , wherein a shape of the main light-extraction surface comprises a circle or a regular polygon. 14. The semiconductor light-emitting device according to claim 5 , further comprising an upper electrode connecting the main light-extraction surface and a second ohmic contact structure connecting the lower surface. 15. The semiconductor light-emitting device according to claim 14 , wherein the upper electrode, the second ohmic contact structure, and the first portion are overlapped in a vertical direction. 16. The semiconductor light-emitting device according to claim 14 , wherein an area of the upper electrode is between 1% and 10% of an area of the main light-extraction surface, and an area of the second ohmic contact structure is between 1% and 10% of the area of the lower surface. 17. The semiconductor light-emitting device according to claim 14 , wherein a material of the second ohmic contact structure comprises transparent conductive material. 18. The semiconductor light-emitting device according to claim 14 , further comprising a reflective stack covering the second ohmic contact structure and the second semiconductor stack. 19. The semiconductor light-emitting device according to claim 18 , further comprising a conductive substrate and an adhesive layer between the reflective stack and the conductive substrate. 20. The semiconductor light-emitting device according to claim 1 , wherein the main light-extraction surface comprises a circumference and a ratio of a thickness of the epitaxial structure to the circumference is between 2% and 20%.

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What does patent US9793436B2 cover?
A semiconductor light-emitting device comprises an epitaxial structure for emitting a light and comprises an edge, a first portion and a second portion surrounding the first portion, wherein a concentration of a doping material in the second portion is higher than that of the doping material in the first portion, a main light-extraction surface on the epitaxial structure and comprises a first l…
Who is the assignee on this patent?
Epistar Corp
What technology area does this patent fall under?
Primary CPC classification H01L33/22. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Oct 17 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 6 related publications on this page (citations in our corpus or others sharing the same primary CPC).